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US20110033801 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition...
US20100297557 Coating compositions suitable for use with an overcoated photoresist  
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development...
US20120237872 BLACK AND WHITE SILVER HALIDE PHOTOSENSITIVE MATERIAL  
A black and white silver halide photosensitive material, having: a support; at least one silver halide emulsion layer; and at least one non-photosensitive layer, wherein both of the silver halide...
US20110250544 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS  
Antireflective coating compositions are discussed.
US20120034562 COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST  
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating...
US20100297556 Coating compositions suitable for use with an overcoated photoresist  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the...
US20110311916 THERMALLY ABLATABLE LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A lithographic printing plate precursor can be used to prepare a printing plate using thermal ablation. The precursor has a non-thermally ablatable first layer on a substrate. Over the first layer...
US20110003250 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST  
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect,...
US20100092894 Bottom Antireflective Coating Compositions  
Antireflective coating compositions are discussed.
US20110091811 DOUBLE-LAYERED PATTERNABLE ADHESIVE FILM, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERNABLE ADHESIVE LAYER USING THE SAME  
A patternable adhesive film is formed in a double-layered structure of an adhesive layer having patternability and an adhesive layer having both adhesion and developability. Thus, the...
US20110033800 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates...
US20100015550 DUAL DAMASCENE VIA FILLING COMPOSITION  
Compositions for use in dual damascene process are disclosed.
US20130040238 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS  
A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC...
US20140239462 PECVD FILMS FOR EUV LITHOGRAPHY  
Provided herein are multi-layer stacks for use in extreme ultraviolet lithography tailored to achieve optimum etch contrast to shrink features and smooth the edges of features while enabling use...
US20050069818 Absorptive resists in an extreme ultraviolet (EUV) imaging layer  
An embodiment of the present invention includes a technique to provide a highly absorptive resist. A resist is formed using a highly absorbing material. The resist is thinned to a pre-determined...
US20090208867 Resist Composition, Resist Protective Coating Composition, and Patterning Process  
A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as...
US20080166658 Polyester film for flexographic printing plate  
Disclosed herein is a polyester film for flexographic printing plates, which comprises: a polyester base layer (B); a detachable adhesive layer (A) formed on one surface of the polyester base...
US20100055610 HEAT SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR  
A heat-sensitive positive-working lithographic printing plate precursor comprising (1) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (2) a heat-sensitive...
US20080318153 PHOTOSENSITIVE LAYER STACK  
A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon...
US20080241400 VACUUM ASSIST METHOD AND SYSTEM FOR REDUCING INTERMIXING OF LITHOGRAPHY LAYERS  
Embodiments of an apparatus and methods for curing a plurality of lithography layers while reducing the level of intermixing are generally described herein. Other embodiments may be described and...
US20090098490 Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing  
The present invention is directed to novel radiation-sensitive, wet developable bottom antireflective coating (DBARC) compositions and their use in semiconductor device manufacturing. The DBARC...
US20080073754 Coating compositions for photolithography  
Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective...
US20070117040 Water castable-water strippable top coats for 193 nm immersion lithography  
A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises a polymer which is sparingly soluble or insoluble in water at a temperature of about...
US20080176167 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND OBTAINED USING THE SAME, ADHESIVE FILM, ADHESIVE SHEET, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND ELECTRONIC PART  
A photosensitive adhesive composition comprising: (A) a polyimide having a carboxyl group as a side chain, whereof the acid value is 80 to 180 mg/KOH; (B) a photo-polymerizable compound; and (C) a...
US20120103507 Photosensitive composite and build-up insulation film with the photosensitive composite, and method for manufacturing circuit board using the build-up insulation film  
Disclosed herein is a method for manufacturing a circuit board. The method for manufacturing a circuit board includes: preparing a photosensitive composite; preparing a build-up insulating film by...
US20060275676 Pigment-containing heat-curable composition, color filter, image-recording material, and method of producing color filter  
The invention provides a pigment-containing heat-curable composition includeing a pigment dispersion solution obtained by dispersing a composition containing a heat-curable resin, a solvent, and a...
US20090087799 ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS  
A composition comprising (A) a polymer having an alcohol structure with plural fluorine atoms substituted at α- and α′-positions and having k=0.01-0.4 and (B) an aromatic ring-containing polymer...
US20080292995 Antireflective Coating Composition Comprising Fused Aromatic Rings  
The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone...
US20080063953 PROCESS FOR PRODUCING DYE-CONTAINING NEGATIVE CURABLE COMPOSITION, COLOR FILTER, AND COLOR FILTER PRODUCTION PROCESS  
According to an aspect of the invention, there is provided a process for producing a dye-containing negative curable composition, the process including passing a mixture containing a dye, a...
US20110300488 Antireflective Coating Composition and Process Thereof  
The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one...
US20090258321 Light absorbent and organic antireflection coating composition containing the same  
The present invention relates to a light absorbent for organic anti-reflection coating formation, and an organic anti-reflection film composition containing the same. The light absorbent for...
US20100159691 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE  
Disclosed is a photosensitive resin composition showing excellent contrast performance after exposure to light. Also disclosed is a photosensitive resin laminate using the composition. The...
US20110262863 NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM  
A near-infrared absorptive layer is formed from a composition comprising (A) an acenaphthylene polymer, (B) a near-infrared absorbing dye, and (C) a solvent. When a multilayer film comprising the...
US20050100820 Surface protective film  
Provided is a surface protective film capable of effectively suppressing formation of a scratch or a recess on an optical film and formation of an indentation on a pressure-sensitive adhesive...
US20090093114 METHOD OF FORMING A DUAL-DAMASCENE STRUCTURE USING AN UNDERLAYER  
A method of forming a dual-damascene wire. The method includes forming a via opening in a dielectric layer, filling the via opening with a polymeric formation including at least about 6% by weight...
US20110200938 Antireflective Compositions and Methods of Using Same  
A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer,...
US20060177774 Process of imaging a photoresist with multiple antireflective coatings  
A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the...
US20090130594 Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating  
There is provided an underlayer coating that is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in...
US20070275330 BOTTOM ANTI-REFLECTIVE COATING  
Disclosed are embodiments of a bi-layer bottom anti-reflective coating (BARC) with graded optical properties (i.e., a graded refractive index) and a method of forming the BARC. The BARC is formed...
US20120076982 STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANTI-REFLECTIVE COATING)  
A structure. The structure includes: a hole layer; a hole layer including a top hole layer surface, wherein the hole layer has a thickness in a first direction that is perpendicular to the hole...
US20110311915 PHOTOSENSITIVE RESIST UNDERLAYER FILM FORMING COMPOSITION  
A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or...
US20140178814 DRY FILM PHOTORESIST HAVING OXYGEN PERMEABLE BARRIER LAYER AND MANUFACTURING METHOD THEREOF  
There is provided a dry film photoresist including: a base film having an oxygen permeable barrier layer formed thereon; a photosensitive resin layer formed on the oxygen permeable barrier layer;...
US20090176165 Polymer composition, hardmask composition having antireflective properties, and associated methods  
A polymer composition includes an aromatic ring-containing polymer represented by Formula 1: wherein m and n satisfy the relations 1≦m<190, 0≦n<190, and 1≦m+n<190.
US20090117493 Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound  
There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound....
US20100209846 NEGATIVE-WORKING IMAGEABLE ELEMENTS  
Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a λmax in the range of from about 450 to about...
US20080038661 Copolymer and Top Coating Composition  
A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted...
US20140295349 BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS  
The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel...
US20090111057 PHOTOIMAGEABLE BRANCHED POLYMER  
Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a...
US20130186851 NONPOLYMERIC ANTIREFLECTION COMPOSITIONS CONTAINING ADAMANTYL GROUPS  
Nonpolymeric compounds, compositions, and methods for forming microelectronic structures, and the structures formed therefrom are provided. The nonpolymeric compounds are ring-opened,...
US20060234156 Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound  
There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry...

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