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US20110287365 LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A backside coating is applied to lithographic printing plate precursors and this coating provides sufficient protection so that adjacent precursors are not scratched or otherwise damaged when...
US20150093690 WHITE CURABLE COMPOSITION FOR PRINTED CIRCUIT BOARD, CURED COATING FILM USING THE SAME, AND PRINTED CIRCUIT BOARD  
An object of the present invention is to obtain a white curable composition that can yield a highly reflective cured coating film without requiring a complicated step and show good dispersion even...
US20130108957 PRODUCTION METHOD OF RESIST COMPOSITION FOR LITHOGRAPHY  
The present invention provides a production method of a resist composition for lithography, comprising, at least: a filtering step for filtering a resist composition for lithography by a filter...
US20130108958 PRODUCTION METHOD OF RESIST COMPOSITION FOR LITHOGRAPHY  
A production method of a resist composition for lithography, including, at least: a filtering step for filtering a resist composition for lithography by a filter therethrough, wherein in the...
US20150185616 RESISTS FOR LITHOGRAPHY  
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide...
US20130136897 RESISTS FOR LITHOGRAPHY  
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide...
US20150212414 IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS  
New ionic thermal acid generator compounds are provided. Also provided are photoresist compositions, antireflective coating compositions, and chemical trim overcoat compositions, and methods of...
US20120171433 FLUORINATED COATING AND PHOTOTOOLS MADE THEREWITH  
A coating is disclosed, comprising the reaction product of: an epoxy silane; and an oligomer comprising MFMEMS wherein MF comprises a fluorinated (meth)acrylate, ME comprises an...
US20120040288 Epoxy formulations with controllable photospeed  
The present invention is directed to an epoxy film composition, comprising: novolac resin; solvent; a photoacid generator having the structure A+B− and having a pKa of −5 or less; and a...
US20090274974 SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING  
Graded absorption silicon based antireflective coating compositions are described.
US20140065541 Method of Stabilizing Fluorine-Containing Acid Amplifier  
A method of stabilizing a fluorine-containing acid amplifier. The method is provided to include the step of dissolving a fluorine-containing acid amplifier in an organic solvent thereby producing...
US20140038103 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20120107743 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20130171560 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME  
Provided are an additive for resist represented by the following formula (1), and a resist composition containing the additive. The additive according to the present invention can suppress...
US20120107742 METHOD AND PHOTORESIST WITH ZIPPER MECHANISM  
The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first...
US20080166657 Resist composition for bulkhead formation, bulkhead of EL display device and EL display device  
Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used...
US20070287094 Planographic Printing Plate, Planographic Printing Plate Material, Support for Planographic Printing Plate Material, and Planographic Printing Method  
An objective is to provide a planographic printing plate material exhibiting excellent properties such as printing durability, resistance to chemicals and anti-stain at the beginning of printing...
US20140030653 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY  
Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective...
US20080224251 Optimal Rasterization for Maskless Lithography  
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern...
US20130216949 WATER MARK DEFECT PREVENTION FOR IMMERSION LITHOGRAPHY  
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in...
US20150072290 COATING COMPOSITIONS  
In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium,...
US20150241775 PRETREATMENT METHOD FOR PARTIAL PLATING, PARTIAL PLATING METHOD FOR ALUMINUM MATERIALS, AND RESIST FOR PLATING ALUMINUM MATERIALS  
A self-assembled monolayer is formed, as a resist, from a mixture of nonafluorohexyltrimethoxysilane and trifluoropropyltrimethoxysilane on a substrate constituted by an aluminum material. A...
US20140199518 Facile Large Area Periodic Sub-Micron Photolithography  
Disclosed herein are articles and methods useful for the lithographic applications. The articles comprise a wrinkling structure and a photosensitive material. The articles and methods provide low...
US20140295348 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20110084787 PHOTOSENSITIVE RESIN COMPOSITION, METAL-BASE-CONTAINING CIRCUIT BOARD PRODUCTION METHOD EMPLOYING THE PHOTOSENSITIVE RESIN COMPOSITION, AND METAL-BASE-CONTAINING CIRCUIT BOARD  
A photosensitive resin composition which is capable of reducing stress occurring due to thermal history, such as a heat treatment, a metal-base-containing circuit board production method which...
US20110003123 SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES  
The radiation-sensitive composition and the negative working imageable element include a cationic IR absorber with tetraarylborate counteranion and an onium initiator with tetraarylborate...
US20070196761 Barrier rib and black top for plasma display panel and method of fabricating the same  
A method of fabricating barrier ribs and black tops for a plasma display panel including sequentially laminating a photosensitive barrier rib material and a photosensitive black top material on a...
US20110229821 Method of Photochemical Hydrolysis-Polycondensation of Cross-Linkable Chromophores with Steric Hindrance, Catalysed by a Photogenerated Acid, and the Applications Thereof  
The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with...
US20110287361 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more...
US20150044609 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
US20130065178 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
US20110053085 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND STACKS  
Lithographic printing plate precursors have been designed so that they can be stored, shipped, and used in stacks without interleaf paper between individual precursors. This is achieved by...
US20070254239 Resist for printing and patterning method using the same  
A resist for printing that is coated on a printing roll and is then sequentially transcribed on a printing plate and a substrate including: a material wherein a cohesive energy between the resist...
US20130044795 SYSTEM AND METHOD FOR AUTOMATIC BAUD RATE SELECTION FOR FACSIMILE TRANSMIT AND RECEIVE  
A system for automatic data rate selection. A transmit rate control selects a transmit baud rate and a transmit modulation protocol and modifies the transmit baud rate and the transmit modulation...
US20110086202 NEGATIVE-WORKING IMAGEABLE ELEMENTS  
Negative-working imageable elements can be imaged and processed to provide lithographic printing plates. These imageable elements are sensitive to infrared radiation but are insensitive to “white”...
US20120237872 BLACK AND WHITE SILVER HALIDE PHOTOSENSITIVE MATERIAL  
A black and white silver halide photosensitive material, having: a support; at least one silver halide emulsion layer; and at least one non-photosensitive layer, wherein both of the silver halide...
US20150241779 REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES  
A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is described.
US20120034558 PHOTOLITHOGRAPHY MATERIAL FOR IMMERSION LITHOGRAPHY PROCESSES  
A photolithography material is provided. The photolithography material is a surface modifying material. The photolithography material includes a polymer (e.g., fluorine polymer) that includes less...
US20060263706 Overlay vernier and method for manufacturing semiconductor device using the same  
An overlay vernier comprises overlay vernier patterns having a layout identical to that of patterns disposed within a real cell. A lower overlay vernier pattern is formed within a scribe line...
US20150010864 Meta-Photoresist for Lithography  
Provided are a meta-photoresist capable of transferring mask patterns on which fine patterns having a diffraction limit or less are formed, on a substrate, and a lithography method using the same,...
US20140322648 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20110255069 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20110151379 BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES  
The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display...
US20130004893 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred...
US20080286692 Photosensitve Laminate  
A photoresist laminate structure comprising at least one photosensitive resist layer and a polymeric layer bound to the photosensitive resist layer is disclosed, wherein the polymeric layer is...
US20110123925 POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME  
A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical...
US20130177847 PHOTORESIST FOR IMPROVED LITHOGRAPHIC CONTROL  
Methods and corresponding photoresists are described for fine linewidth lithography using x-rays, e-beams, visible spectrum optical lithography, ultra-violet optical lithography or extreme...
US20140080043 SILOXANE-BASED COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PHOTOSENSITIVE MATERIAL  
The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.
US20070020556 PHOTOSENSITIVE ARTICLES AND RELATED MANUFACTURING PROCESS  
A decorative photosensitive article having a design formed of a plurality of polyvinyl chloride plasticizers. At least one of the polyvinyl chloride plasticizers includes a photochromic pigment...
US20120214099 PHOTORESIST COMPOSITIONS  
A composition. The composition includes a polymer and a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and a second amount of...