Matches 1 - 50 out of 230 1 2 3 4 5 >


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US20100086194 ALIGNMENT MARK OF MASK  
A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and...
US20110085723 Mask Program Defect Test  
A method and programmed defect test database for designing and building programmed defect test masks. The method uses a defect free mask that is compared to a ‘defective’ database. A variety of...
US20110081069 Optical Simulation Site Determination  
The length of an optical simulation site for an edge fragment may be determined based on the maximum and minimum intensity locations near the edge fragment. The width/space centerline's location...
US20120207381 Systems and Methods Eliminating False Defect Detections  
A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect...
US20130156939 METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK DEFECT  
The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least...
US20120269421 System and Method for Lithography Simulation  
In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs,...
US20050226492 Acceptable defect positioning and manufacturing method for large-scaled photomask blanks  
Disclosed is an acceptable defect positioning and manufacturing method for large-scaled photomask blanks, where the defective information of the entire large-scaled photomask blanks or etched and...
US20140247975 SOURCE AND MASK OPTIMIZATION BY CHANGING INTENSITY AND SHAPE OF THE ILLUMINATION SOURCE AND MAGNITUDE AND PHASE OF MASK DIFFRACTION ORDERS  
An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation...
US20130336572 Focus Monitoring Method Using Asymmetry Embedded Imaging Target  
A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation...
US20120039523 Method for matching high-numerical aperture scanners  
A method for matching characterizing features of an optical scanner against target characterizing features is provided. The characterizing features are produced from characterizing data (also...
US20060285739 Evaluation pattern generating method and computer program product  
An evaluation pattern generating method includes generating plural types of unit patterns based on a seed pattern group and a unit frame, the seed pattern group including plural types of seed...
US20080247632 Method for Mask Inspection for Mask Design and Mask Production  
The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to...
US20080232671 MASK PATTERN VERIFYING METHOD  
A mask pattern verifying method include obtaining first information about a hot spot from design data of a mask pattern, obtaining second information about the mask pattern actually formed on a...
US20080096113 EXPOSURE MASK, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND CHECKING METHOD OF EXPOSURE MASK  
According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first...
US20060266833 System, method and computer software product for inspecting charged particle responsive resist  
A system, computer software product and a method for evaluating a mask, the method includes the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition...
US20060105249 Exposure mask and method of manufacturing the same  
A method of manufacturing an exposure mask, which has the steps of: obtaining the form data D1 of device exposure patterns by applying optical proximity effect correction to the form data D0 of...
US20100075443 TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE  
A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat...
US20090185740 CALCULATING IMAGE INTENSITY OF MASK BY DECOMPOSING MANHATTAN POLYGON BASED ON PARALLEL EDGE  
A method, system, computer program product and table lookup system for calculating image intensity for a mask used in integrated circuit processing are disclosed. A method may comprise:...
US20060036979 Computer-implemented methods for generating input for a simulation program or generating a simulated image of a reticle  
Various computer-implemented methods are provided. One computer-implemented method for generating input for a simulation program includes combining information about a defect detected on a...
US20080089575 Alternating phase shift mask inspection using biased inspection data  
An inspection system uses inspection data biased to compensate for mismatches that occur as a result of using an optical lithography system to print an alternating phase shift mask that operates...
US20130163850 MASK PATTERN AND CORRECTING METHOD THEREOF  
A mask pattern and a correcting method thereof are provided. The correcting method includes the following steps. An original pattern having a first original contour and a second original contour...
US20080118142 MONITORING SYSTEM FOR MANUFACTURING SEMICONDUCTOR WAFERS  
A monitoring system for manufacturing semiconductor wafers is described. The monitoring system includes a first monitoring picture and a second monitoring picture to display manufacture...
US20140254915 METHOD FOR ANALYZING A PHOTOMASK  
A method for analyzing a photomask comprises the determination of a Bossung plot.
US20090232384 Mask Making Decision for Manufacturing (DFM) on Mask Quality Control  
The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a...
US20090034830 PSEUDO LOW VOLUME RETICLE (PLVR) DESIGN FOR ASIC MANUFACTURING  
A Pseudo Low Volume Reticle (PLVR) which consists of multiple design layers on a single reticle. Specifically, the reticle can include two instances of each layer in order to facilitate die-to-die...
US20080175467 SYSTEM FOR ACCUMULATING EXPOSURE ENERGY INFORMATION OF WAFER AND MANAGEMENT METHOD OF MASK FOR EXPOSURE UTILIZING EXPOSURE ENERGY INFORMATION OF WAFER ACCUMULATED WITH THE SYSTEM  
Disclosed is a management method of a mask for exposure utilizing exposure energy information of a wafer. According to the present invention, in case of exposing wafers in exposure apparatuses,...
US20130004056 Determining Calibration Parameters For a Lithographic Process  
A technique for determining a set of calibration parameters for use in a model of a photo-lithographic process is described. In this calibration technique, images of a test pattern that was...
US20060018529 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure  
In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in...
US20130058558 DEFECT INSPECTION SYSTEM  
A defect inspection system is disclosed for easily setting inspection conditions and providing an inspection condition and a defect signal intensity to an operator. The defect inspection system...
US20060008707 Mask and inspection method therefor and production method for semiconductor device  
To provide a mask that it becomes possible to perform destructive inspection without a mask for inspection or to perform more accurately non-destructive inspection and a method of inspecting the...
US20100054577 PHOTOMASK INSPECTION METHOD, SEMICONDUCTOR DEVICE INSPECTION METHOD, AND PATTERN INSPECTION APPARATUS  
A plurality of photomasks used to manufacture the same semiconductor device, each of the photomasks having a plurality of mutually replaceable unit regions set therein, are inspected to detect a...
US20100092876 METHOD FOR REPAIRING PHOTO MASK, SYSTEM FOR REPAIRING PHOTO MASK AND PROGRAM FOR REPAIRING PHOTO MASK  
There is provided a method for repairing a photo mask in this invention, including, obtaining a first image being a photo mask image including a defect area of the photo mask by a repair...
US20080050010 Apparatus for correcting defects in a reticle pattern and correcting method for the same  
A reticle pattern defect correcting apparatus comprises a lithographic emulation system including an optical emulation system and a micromachining defect correcting system including a reticle...
US20120128228 Method for Matching of Patterns  
A method for matching of two detailed patterns is disclosed in which abstracts of each of the detailed patterns are created, where the abstracts are less complex than the detailed patterns. The...
US20090028421 IMAGING CHARACTERISTICS FLUCTUATION PREDICTING METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A method for predicting imaging characteristics fluctuation of a projection optical system in an exposure apparatus which projects a pattern formed on a mask onto a photosensitive substrate...
US20060269118 Method of inspecting defects in photomask having a plurality of dies with different transmittances  
Provided is a method of inspecting defects in a photomask having dies with different transmittances from each other due to correction treatments. A method of inspecting defects corrects light...
US20130182938 DEFECT INSPECTION METHOD FOR WAFER AND WAFER DEFECT INSPECTION SYSTEM USING THE SAME  
A defect inspection method for a wafer is provided. The wafer comprises a component pattern. The method comprises the following steps: providing a defect inspection apparatus for inspecting the...
US20050250022 Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method  
A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design...
US20120070064 METHOD FOR DETERMINING MASK OPERATION ACTIVITIES  
A method and system arrangement for controlling and determining mask operation activities. Upon obtaining chip physical layout design data and running resolution enhancement technology on the chip...
US20100111401 MASK INSPECTION SYSTEM AND MASK INSPECTION METHOD  
A mask inspection system comprises a mask inspection device for detecting defects on a mask according to a plurality of defect detection algorithms for each of which a threshold value is set; and...
US20110194751 PATTERN VERIFICATION METHOD, PATTERN GENERATING METHOD, DEVICE FABRICATION METHOD, PATTERN VERIFICATION PROGRAM, AND PATTERN VERIFICATION SYSTEM  
A pattern verification method and the like for forming a desired pattern by using the imprint method are provided. A pattern verification method for a pattern forming method in which a template...
US20140254913 MULTISTAGE EXTREME ULTRA-VIOLET MASK QUALIFICATION  
A technique for inspecting, qualifying and repairing photo-masks for use at extreme ultra-violet (EUV) wavelengths is described. In this technique, multiple images of a substrate and/or a blank...
US20100008562 LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION METHOD, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE AND LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION PROGRAM  
A latent image intensity distribution calculating unit calculates a latent image intensity distribution in the thickness direction of a resist film based on an exposure condition and a mask...
US20090268021 Imaging Position Correction Method, Imaging Method, and Substrate Imaging Apparatus  
An imaging method for imaging an image on a substrate at an accurate position while relatively moving the substrate and the imaging unit. The imaging method includes the steps of taking an image...
US20060187719 Semiconductor package, ID generating system thereof, ID recognizing system thereof, ID recognition method thereof, semiconductor integrated circuit chip, ID generating system thereof, ID recognizing system thereof, and ID recognition method thereof  
In ID generation for a semiconductor package or a semiconductor integrated circuit chip, a topographic characteristic to be utilized as specific information is selected from at least one...
US20050289488 System and method for mask defect detection  
A mask defect detection system. The mask defect detection system comprises a first processing device, a second processing device, a third processing device, and a storage device. The first...
US20070275310 Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout  
A method and apparatus is provided for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout. The method begins by specifying a wafer target CD and...
US20080205743 MASK DEFECT ANALYSIS  
A method of inspecting a photomask includes directing radiation from a radiation source onto a photomask so that at least a portion of the radiation is transmitted through the photomask. A first...
US20140086475 Model-Based Registration and Critical Dimension Metrology  
A method and system for performing model-based registration and critical dimension measurement is disclosed. The method includes: utilizing an imaging device to obtain at least one optical image...
US20080220376 LITHOGRAPHY SIMULATION METHOD, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PROGRAM  
A lithography simulation method of obtaining a resist image by simulation using first and second functions, obtaining the resist image by the simulation includes determining a mask transmission...

Matches 1 - 50 out of 230 1 2 3 4 5 >