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US20090268181 |
MEASUREMENT METHOD AND EXPOSURE APPARATUS
A method of measuring an optical characteristic of an optical system using a measurement apparatus, comprises determining a position of each of object points by arranging, on a side of the object...
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US20090262323 |
MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
A measurement apparatus which measures a surface position of an object comprises a first measurement device configured to make measurement light from the object and reference light from a reference...
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US20090262362 |
INTERFEROMETER FOR OVERLAY MEASUREMENTS
In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to...
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US20090223634 |
Method and means for assembly of high precision ultra- high speed crystal scanning heads
Demand is growing for affordable advanced sensor systems for use in counter-terrorism, criminal forensic analysis, and medical diagnosis. Next generation, million RPM class laser interferometry and...
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US20090153822 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
Two X encoder heads (X heads) and one Y head are mounted on one wafer stage, and an X scale and a Y scale corresponding to these heads are arranged on a surface facing the wafer stage so that the...
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US20090116035 |
Structure and method for overlay measurement
A structure for overlay measurement is provided in the present invention, using the diffraction characteristics on the boundary portion between two microstructures formed on each of two material...
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US20080218692 |
Reflectometry/Interferometry System and Method for Corneal Plane Positioning
A system for positioning an eye of a patient, for example, for laser ophthalmic surgery includes a reflectometer adapted to receive as input a reflected beam from an anterior surface of a cornea of...
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US20080055607 |
NANOMETER-LEVEL MIX-AND-MATCH SCANNING TIP AND ELECTRON BEAM LITHOGRAPHY USING GLOBAL BACKSIDE POSITION REFERENCE MARKS
An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in the substrate wafer. The alignment configuration uses a...
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