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US20110001954 |
CHUCKING SYSTEM WITH RECESSED SUPPORT FEATURE
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward...
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US20120069317 |
LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION
The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is...
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US20100328635 |
Pellicle
There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space...
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US20110122375 |
MULTICOLOR HOLGRAPHIC REPLICATION BY MASKING
A multicolor hologram (e.g., a two-color hologram) is replicated (copied) into a photosensitive layer by masking to produce a copy (replicate) of the hologram in a manner such that the copy is an...
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US20100328641 |
PELLICLE FRAME AND LITHOGRAPHIC PELLICLE
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an...
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US20120127442 |
DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTION VERIFICATION SIMULATION
The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method...
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US20110063601 |
PELLICLE FRAME, PELLICLE, LITHOGRAPHY APPARATUS, AND METHOD OF FABRICATING THE PELLICLE FRAME
A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
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US20110300490 |
HIGH-RESOLUTION MICROSCOPY AND PHOTOLITHOGRAPHY DEVICES USING FOCUSING MICROMIRRORS
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.
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US20110216299 |
ELECTROSTATIC LENS STRUCTURE
An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first...
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US20060077361 |
Means of removing particles from a membrane mask in a vacuum
A method of removing particles from a membrane reticle by a laser beam or beams. The particles on the bottom of the reticle are knocked off and fall away and particles on the top are removed a...
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US20110123937 |
COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for...
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US20100328636 |
Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus
In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is...
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US20120013881 |
Method and Apparatus for Determining an Overlay Error
A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the...
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US20120050711 |
CHUCK ASSEMBLY BACK SIDE RETICLE CLEANER
An improved technique for fixedly holding a reticle in a reticle chuck of the reticle simplifies the process of cleaning the back surface of the reticle by exposing the entire back surface. The...
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US20110051114 |
OPTIMIZED POLARIZATION ILLUMINATION
Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an...
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US20110141450 |
Method and Apparatus for Overlay Measurement
A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a...
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US20070109520 |
Modular illuminator for a scanning printer
Disclosed herewith is a system and method for building an illuminator for a scanning printer. The design is modular enabling any of a number of different sources to be used with common partial...
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US20110069288 |
Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle...
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US20110235016 |
PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK
A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive...
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US20090059193 |
Image production apparatus
Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning...
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US20090153814 |
SELF-CLEANING SCAN HEAD ASSEMBLY
A scan head assembly for use in an imaging device for scanning media that uses fluid particles from the atmosphere for cooling an optical system, cleaning existing contamination particles in the...
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US20120107743 |
LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
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US20110261329 |
METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS
The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system....
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US20110032502 |
POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD
Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion...
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US20120069316 |
METHODS FOR LIMITING COUNTER-MASS TRIM-MOTOR FORCE AND STAGE ASSEMBLIES INCORPORATING SAME
An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a...
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US20080266534 |
PHOTOMASK HAZE REDUCTION VIA VENTILATION
Where a framed pellicle is mounted on a photomask, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second...
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US20050275823 |
PHOTOSENSITIVE MEDIA CASSETTE FOR AN IMAGING DEVICE
A cassette arrangement includes a light-tight, moisture proof pouch that is adapted to hold a stack of photosensitive sheets such as microencapsulated media and load the sheets into an...
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US20110122385 |
Homogenizer
A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The...
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US20100328638 |
LED LIGHT SOURCE, ITS MANUFACTURING METHOD, AND LED-BASED PHOTOLITHOGRAPHY APPARATUS AND METHOD
This invention provides a structurally-simple LED light source that is capable of preventing temperature variations among its multiple LED elements arranged densely on its LED-mounting substrate...
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US20090073403 |
Methods of characterizing similarity or consistency in a set of entities
A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining...
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US20120044473 |
OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY
To reduce deformations which may be caused by a functional coating on a substrate in an optical element for UV or EUV lithography, an optical element is suggested comprising a functional coating...
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US20110019173 |
Diffraction Elements for Alignment Targets
A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered...
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US20080285003 |
Linear motor driven automatic reticle blind
A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle...
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US20110080566 |
METHOD FOR REPLICATING PRODUCTION OF 3D PARALLAX BARRIER
A method for replicating production of a 3D parallax barrier is capable of transfer-printing a 3D parallax barrier pattern on a planar transparent substrate mainly with a glass photo mask having...
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US20090231568 |
METHOD OF MEASURING WAVEFRONT ERROR, METHOD OF CORRECTING WAVEFRONT ERROR, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
A method of measuring a wavefront error of an exposure light that occurs when the exposure light passes through an optical system that is used in an exposure apparatus is proposed. The method...
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US20090296064 |
ILLUMINATION SYSTEM FOR SIZING FOCUSED SPOTS OF A PATTERNING SYSTEM FOR MASKLESS LITHOGRAPHY
An optical system for producing a pattern of focused spots, such as a maskless lithographic projection system, includes an illuminator, a pattern generator, and an imager. The illuminator includes...
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US20080212045 |
OPTICAL SYSTEM WITH AT LEAST A SEMICONDUCTOR LIGHT SOURCE AND A METHOD FOR REMOVING CONTAMINATIONS AND/OR HEATING THE SYSTEMS
A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light...
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US20080224251 |
Optimal Rasterization for Maskless Lithography
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to...
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US20080148978 |
Assembly for blocking a beam of radiation and method of blocking a beam of radiation
An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an...
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US20050174548 |
Finishing apparatus for photographic laboratories
A finishing apparatus for photographic laboratories having at least two elements for advancing separate strips of photographic paper, carrying images printed thereon, towards two corresponding...
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US20070148561 |
Exposure equipment having auxiliary photo mask and exposure method using the same
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart...
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US20050221238 |
Use of a reticle absorber material in reducing aberrations
A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a...
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US20080079927 |
Holder for carrying a photolithography mask in a flattened condition
A holder is described for carrying a photolithography mask in a flattened condition. The holder may include a mask chuck and may be able to flatten a mask for use in photolithography. In one...
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US20060141209 |
Pellicle for photolithography and pellicle frame
There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is...
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US20090233189 |
DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution,...
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US20080024752 |
Contact printing oxide-based electrically active micro-features
Contact printing can be used to form electrically active micro-features on a substrate. An ink formulation containing an oxide precursor is used to form the micro-features, which are heat cured to...
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US20120092640 |
Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage
Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle...
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US20090268187 |
EXPOSURE SYSTEM
An exposure system includes a light source for generating an exposure light, a mask, a lens system, and a bandwidth-filtering module for narrowing bandwidth of the exposure light. The mask, the...
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US20090029270 |
Projection exposure device and method of separate exposure
A projection exposure device which can perform high accurate alignment and separate exposures wherein the mask marks 20 overlap with the corresponding board marks 30 in exposure, the mask marks 20...
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US20080266535 |
Printing system and order-sheet-based batch printing method
A printing system includes an optical sensor that reads a plurality of order sheets at least selecting images to be printed and printing sheet types, a printing specifying unit that specifies the...
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