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US20110001954 CHUCKING SYSTEM WITH RECESSED SUPPORT FEATURE  
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward...
US20120140199 MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK  
A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the...
US20130176549 Reticle Operation System  
A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask...
US20130265557 TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL  
An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to...
US20120069317 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION  
The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is...
US20100328635 Pellicle  
There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space...
US20110122375 MULTICOLOR HOLGRAPHIC REPLICATION BY MASKING  
A multicolor hologram (e.g., a two-color hologram) is replicated (copied) into a photosensitive layer by masking to produce a copy (replicate) of the hologram in a manner such that the copy is an...
US20130286365 METHOD AND STRUCTURE FOR AUTOMATED INERT GAS CHARGING IN A RETICLE STOCKER  
At least a first reticle is stored in a housing of a stocker. A first gas is delivered to the housing. At least one reticle pod having an additional reticle is delivered into a enclosure within the...
US20140307237 PELLICLE FRAME AND PELLICLE WITH THIS  
A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of 99.7%...
US20130070226 MARKER STRUCTURE AND METHOD OF FORMING THE SAME  
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting...
US20100328641 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE  
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an...
US20120127442 DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTION VERIFICATION SIMULATION  
The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method...
US20110063601 PELLICLE FRAME, PELLICLE, LITHOGRAPHY APPARATUS, AND METHOD OF FABRICATING THE PELLICLE FRAME  
A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
US20140078478 METHOD OF OPTIMIZING LITHOGRAPHY TOOLS UTILIZATION  
A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography...
US20140362363 METHODS FOR MONITORING SOURCE SYMMETRY OF PHOTOLITHOGRAPHY SYSTEMS  
A method for monitoring the source symmetry of a photolithography system is provided. The method includes providing a first reticle; and providing a second reticle. The method also includes forming...
US20110300490 HIGH-RESOLUTION MICROSCOPY AND PHOTOLITHOGRAPHY DEVICES USING FOCUSING MICROMIRRORS  
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.
US20140085618 PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD  
A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal...
US20110216299 ELECTROSTATIC LENS STRUCTURE  
An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first...
US20120200835 RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE AND METHOD FOR CARRYING RETICLE  
A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement...
US20060077361 Means of removing particles from a membrane mask in a vacuum  
A method of removing particles from a membrane reticle by a laser beam or beams. The particles on the bottom of the reticle are knocked off and fall away and particles on the top are removed a...
US20130182236 IMPRINT LITHOGRAPHY  
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame,...
US20120176588 Immersion Lithography Apparatus and Tank Thereof  
A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of the...
US20120162628 Actuator  
An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the...
US20120224156 METHOD OF CORRECTING FLARE AND METHOD OF PREPARING EXTREME ULTRA VIOLET MASK  
A method of correcting flare includes measuring flare of a test pattern, calculating point spread functions (PSFs) of the flare as a function of distance, and correcting the flare using...
US20130114061 DOUBLE PASS INTERFEROMETRIC ENCODER SYSTEM  
An encoder head includes one or more components arranged to: i) direct a first incident beam to the diffractive encoder scale at a first incident angle with respect to the encoder scale; ii)...
US20110123937 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for...
US20100328636 Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus  
In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is...
US20130229638 SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING  
Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an...
US20120013881 Method and Apparatus for Determining an Overlay Error  
A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the...
US20130038852 RETICLE REMOVING APPARATUS AND RETICLE REMOVING METHOD USING THE SAME  
A reticle removing apparatus adapted to remove a reticle in a reticle library of an exposure apparatus is provided. The reticle removing apparatus includes a bracket and a reticle removing module...
US20120050711 CHUCK ASSEMBLY BACK SIDE RETICLE CLEANER  
An improved technique for fixedly holding a reticle in a reticle chuck of the reticle simplifies the process of cleaning the back surface of the reticle by exposing the entire back surface. The...
US20110051114 OPTIMIZED POLARIZATION ILLUMINATION  
Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an...
US20130128254 Thermally Stable Optical Sensor Mount  
Disclosed is an apparatus including a mechanical reference frame and a rigid object mechanically coupled to the reference frame by two or more constraints. The stiffnesses of at least two of the...
US20130100428 MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPTIMISING THE IMAGING OF A MASK  
A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108)...
US20110141450 Method and Apparatus for Overlay Measurement  
A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a...
US20140268092 Extreme Ultraviolet Lithography Process and Mask  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. These different states of the EUV mask...
US20070109520 Modular illuminator for a scanning printer  
Disclosed herewith is a system and method for building an illuminator for a scanning printer. The design is modular enabling any of a number of different sources to be used with common partial...
US20110069288 Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method  
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle...
US20110235016 PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK  
A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive...
US20090059193 Image production apparatus  
Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning...
US20140049761 DESIGN RULES FOR REDUCING THE SENSITIVITY OF FRINGE PROJECTION AUTOFOCUS TO AIR TEMPERATURE CHANGES  
Fringe projection autofocus systems are provided with variable pitch diffraction gratings or multiple diffraction gratings so that a reference beam and a measurement beam propagate along a common...
US20090153814 SELF-CLEANING SCAN HEAD ASSEMBLY  
A scan head assembly for use in an imaging device for scanning media that uses fluid particles from the atmosphere for cooling an optical system, cleaning existing contamination particles in the...
US20120244477 PELLICLE FOR LITHOGRAPHY  
The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic...
US20120107743 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20110261329 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS  
The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system....
US20110032502 POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD  
Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion...
US20140141536 Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change  
A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the...
US20120320348 REFLECTIVE MASK FOR EUV LITHOGRAPHY  
To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate...
US20120069316 METHODS FOR LIMITING COUNTER-MASS TRIM-MOTOR FORCE AND STAGE ASSEMBLIES INCORPORATING SAME  
An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a...
US20140192339 COLLECTOR  
A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during...