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US20060046211 Effectively water-free immersion lithography  
A method and system is disclosed for conducting immersion photolithography. The system includes at least one lens for transmitting a predetermined radiation on a predetermined substrate with a...
US20080137049 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle  
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The...
US20070285632 EUVL reticle stage and reticle protection system and method  
Apparatuses for and methods of maximizing particle protection while enabling temporary concurrent illumination of a reticle with exposure radiation through an aperture and auto focus beams or...
US20120162622 FIELD EXTENSION TO REDUCE NON-YIELDING EXPOSURES OF WAFER  
Techniques are provided for efficient lithography processing and wafer layout. In particular, the techniques can be used to reduce the number of sacrificial exposures along the wafer perimeter...
US20100091261 OPERATING VALVE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening...
US20120307215 Flow Through MEMS Package  
A flow through Micro-Electromechanical Systems (MEMS) package and methods of operating a MEMS packaged using the same are provided. Generally, the package includes a cavity in which the MEMS is...
US20070267804 SHEET FEEDING DEVICE AND IMAGE FORMING APPARATUS  
A sheet feeding device includes: an arm member that is provided with a drive shaft at a base end thereof, the arm member being configured to swingably rotate around the drive shaft; a feed roller...
US20110261336 SYSTEM FOR PATTERNING FLEXIBLE FOILS  
According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This...
US20090268186 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS  
A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an...
US20080241760 PEB EMBEDDED EXPOSURE APPARATUS  
The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed...
US20080111981 Radiation Beam Pulse Trimming  
A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam...
US20140248554 SUB-RESOLUTION ASSIST DEVICES AND METHODS  
Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive...
US20110235009 SUB-RESOLUTION ASSIST DEVICES AND METHODS  
Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive...
US20110242514 1.5D SLM FOR LITHOGRAPHY  
This invention relates to an improved micro lithographic writer that sweeps a modulated pattern across the surface of a workpiece. The SLM disclosed works in a diffractive mode with a continuous...
US20090079952 SIX-MIRROR EUV PROJECTION SYSTEM WITH LOW INCIDENCE ANGLES  
The invention relates to a projection system for guiding light with wavelengths ≦193 nm from an object plane to an image plane, comprising at least a first mirror (M1), a second mirror (M2), a...
US20060216615 Wavefront engineering with off-focus mask features  
An imaging part such as a mask or reticle includes a patterned layer in an on-axis plane of the imaging part. The imaging part further includes another layer including sub-resolution features,...
US20070091292 System, medium, and method controlling operation according to instructional movement  
A system, medium, and method for controlling an operation according to movement. A movement model can be generated based on at least one movement and stored corresponding to a predetermined...
US20120008121 ACTUATOR INCLUDING MAGNET FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING A MAGNET  
The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by...
US20080304033 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
US20140176930 MICROLITHOGRAPHIC ILLUMINATION SYSTEM  
A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of...
US20120194795 OPTICAL ELEMENT  
An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.
US20090027643 COMPENSATION OF RETICLE FLATNESS ON FOCUS DEVIATION IN OPTICAL LITHOGRAPHY  
A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate...
US20060028628 Lens cleaning module  
A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer...
US20140117488 PATTERN DECOMPOSITION LITHOGRAPHY TECHNIQUES  
Techniques are disclosed for realizing a two-dimensional target lithography feature/pattern by decomposing (splitting) it into multiple unidirectional target features that, when aggregated,...
US20050153424 Fluid barrier with transparent areas for immersion lithography  
A fluid supply system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid source (372) and a fluid barrier (256). The fluid...
US20150212419 Lithography System And Method For Haze Elimination  
The present disclosure provides an apparatus in semiconductor manufacturing. The apparatus includes a mask, a pellicle frame attached to the mask, and a pellicle joined to the pellicle frame...
US20070273850 Extreme Ultra Violet Lithography Apparatus  
Lithography apparatus comprises a lithography tool housed in a first chamber, and a source of radiation at or below ultra violet wavelengths housed in a second chamber connected to the first...
US20090059189 PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS  
A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the...
US20120320351 IMMERSION LITHOGRAPHY SYSTEM USING A SEALED WAFER BATH  
Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a...
US20150205197 METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS  
A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then...
US20140176932 RETICLE, EXPOSURE APPARATUS INCLUDING THE SAME, AND EXPOSURE METHOD  
A reticle including exposure monitoring keys. The reticle includes an exposure region that is to be exposed to light during an exposure process, and a non-exposure region surrounding the exposure...
US20110019171 OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE  
The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device...
US20050270516 System for magnification and distortion correction during nano-scale manufacturing  
The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to...
US20100039636 ILLUMINATION OPTICS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The...
US20100321654 Method of Overlay Measurement, Lithographic Apparatus, Inspection Apparatus, Processing Apparatus and Lithographic Processing Cell  
In order to improve overlay measurement, product marker gratings on a substrate are measured in a lithographic apparatus by an alignment sensor using scatterometry. Then information relating to...
US20150227038 MASK OVERLAY CONTROL  
In some embodiments, a mask patterning system includes an electronic memory configured to store an integrated circuit mask layout. A computation tool determines a number of radiation shots to be...
US20140333914 Reflective Lithography Masks and Systems and Methods  
Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a...
US20130244139 Reflective Lithography Masks and Systems and Methods  
Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a...
US20090155730 METHOD FOR MANUFACTURING STORAGE MEDIUM AND APPARATUS FOR MANUFACTURING INFORMATION STORAGE MASTER DISC  
A method for manufacturing an information storage medium in which information is stored as a concave-convex pattern includes forming an inorganic-resist master disc by depositing on a substrate an...
US20130293865 Linear Stage for Reflective Electron Beam Lithography  
A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast...
US20080198351 Lithography Scanner Throughput  
A method for use in the manufacture of a microelectronic apparatus, the method comprising exposing a dummy field on a substrate by utilizing a lithographic scanner at a first speed, and exposing a...
US20060170895 Projection exposure apparatus  
The invention relates to a projection exposure apparatus, in particular for the field of microlithography. The projection exposure apparatus includes at least one treatment device for treating at...
US20100188646 DRAWING METHOD AND DRAWING APPARATUS  
A drawing method includes the steps of: moving a plurality of drawing heads relative to a drawing surface in a predetermined scanning direction, each of the drawing heads being equipped with a...
US20130088703 REACTION ASSEMBLY FOR A STAGE ASSEMBLY  
A reaction assembly 18 for a stage assembly 10 that moves a device 26 along a first axis includes a base countermass 40 and a first transverse countermass 42. The stage assembly 10 includes a...
US20070070311 Contacts to microdevices  
Provided are microdevices, e.g. integrated circuits, with contact bumps and processes for making the same. The microdevices may have contact bumps on two or more sides of the microdevices. Also...
US20150080802 Novel Method To Fabricate Polymeric Microneedles  
The present disclosure relates generally to microneedle devices and methods for fabricating microneedles from a biocompatible polymer using photolithography. More particularly, aspects of the...
US20140118712 MEASURING SYSTEM  
An objective for a projection exposure apparatus includes a metrology stage arranged on the frame of the objective. The objective includes at least one optical component, an objective mount for...
US20100064274 PROXIMITY CORRECTION METHOD AND SYSTEM  
A proximity correction method includes creating a first proximity correction model having a focus value and creating a second proximity correction model having a first defocus value. One of the...
US20090262319 MASKLESS EXPOSURE METHOD  
A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a...
US20130201461 METHOD AND APPARATUS TO CHARACTERIZE PHOTOLITHOGRAPHY LENS QUALITY  
Provided is a method of characterizing photolithography lens quality. The method includes selecting an overlay pattern having a first feature with a first pitch and a second feature with a second...