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US20070091292 |
System, medium, and method controlling operation according to instructional movement
A system, medium, and method for controlling an operation according to movement. A movement model can be generated based on at least one movement and stored corresponding to a predetermined...
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US20120008121 |
ACTUATOR INCLUDING MAGNET FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING A MAGNET
The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by...
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US20080304033 |
PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
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US20120194795 |
OPTICAL ELEMENT
An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.
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US20090027643 |
COMPENSATION OF RETICLE FLATNESS ON FOCUS DEVIATION IN OPTICAL LITHOGRAPHY
A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate...
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US20060028628 |
Lens cleaning module
A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer...
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US20050153424 |
Fluid barrier with transparent areas for immersion lithography
A fluid supply system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid source (372) and a fluid barrier (256). The fluid source...
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US20070273850 |
Extreme Ultra Violet Lithography Apparatus
Lithography apparatus comprises a lithography tool housed in a first chamber, and a source of radiation at or below ultra violet wavelengths housed in a second chamber connected to the first...
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US20090059189 |
PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS
A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle...
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US20120320351 |
IMMERSION LITHOGRAPHY SYSTEM USING A SEALED WAFER BATH
Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a...
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US20110019171 |
OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE
The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device...
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US20050270516 |
System for magnification and distortion correction during nano-scale manufacturing
The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to...
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US20100039636 |
ILLUMINATION OPTICS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The...
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US20100321654 |
Method of Overlay Measurement, Lithographic Apparatus, Inspection Apparatus, Processing Apparatus and Lithographic Processing Cell
In order to improve overlay measurement, product marker gratings on a substrate are measured in a lithographic apparatus by an alignment sensor using scatterometry. Then information relating to the...
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US20090155730 |
METHOD FOR MANUFACTURING STORAGE MEDIUM AND APPARATUS FOR MANUFACTURING INFORMATION STORAGE MASTER DISC
A method for manufacturing an information storage medium in which information is stored as a concave-convex pattern includes forming an inorganic-resist master disc by depositing on a substrate an...
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US20080198351 |
Lithography Scanner Throughput
A method for use in the manufacture of a microelectronic apparatus, the method comprising exposing a dummy field on a substrate by utilizing a lithographic scanner at a first speed, and exposing a...
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US20060170895 |
Projection exposure apparatus
The invention relates to a projection exposure apparatus, in particular for the field of microlithography. The projection exposure apparatus includes at least one treatment device for treating at...
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US20100188646 |
DRAWING METHOD AND DRAWING APPARATUS
A drawing method includes the steps of: moving a plurality of drawing heads relative to a drawing surface in a predetermined scanning direction, each of the drawing heads being equipped with a...
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US20130088703 |
REACTION ASSEMBLY FOR A STAGE ASSEMBLY
A reaction assembly 18 for a stage assembly 10 that moves a device 26 along a first axis includes a base countermass 40 and a first transverse countermass 42. The stage assembly 10 includes a stage...
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US20070070311 |
Contacts to microdevices
Provided are microdevices, e.g. integrated circuits, with contact bumps and processes for making the same. The microdevices may have contact bumps on two or more sides of the microdevices. Also...
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US20100064274 |
PROXIMITY CORRECTION METHOD AND SYSTEM
A proximity correction method includes creating a first proximity correction model having a focus value and creating a second proximity correction model having a first defocus value. One of the...
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US20090262319 |
MASKLESS EXPOSURE METHOD
A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a...
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US20120205558 |
Tools, Methods and Devices for Mitigating Extreme Ultraviolet Optics Contamination
Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective...
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US20120099089 |
APPARATUS AND METHODS FOR MEASURING THERMALLY INDUCED RETICLE DISTORTION
An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The...
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US20070126999 |
Apparatus and method for containing immersion liquid in immersion lithography
Immersion liquid is contained in the immersion area located between the last optical member of a projection system and a surface that is the subject of exposure by providing a liquid seal located...
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US20110014573 |
SYSTEM FOR ENGRAVING FLEXOGRAPHIC PLATES
A system for engraving flexographic printing plates includes a flexographic printing plate comprised of at least two ablation layers, a printing ablation layer and a non-printing ablation layer. In...
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US20090075217 |
TAPERED EDGE BEAD REMOVAL PROCESS FOR IMMERSION LITHOGRAPHY
A method and apparatus for forming a tapered photoresist edge. The method includes: forming a photoresist layer on a substrate; exposing a first annular region of the photoresist layer adjacent to...
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US20100020299 |
INSTRUMENTATION AND METHOD FOR MASKLESS PHOTOLITHOGRAPHY
There is disclosed a maskless photolithography apparatus and method where image patterns are determined by the user during visualization of a mounted material on a substrate with a microscope, and...
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US20110096313 |
Constrained Optimization Of Lithographic Source Intensities Under Contingent Requirements
A method for illuminating a mask to project a desired image pattern into a photoactive material is described. The method includes receiving an image pattern. Determining a relationship between...
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US20090262327 |
MASK TRANSPORT SYSTEM CONFIGURED TO TRANSPORT A MASK INTO AND OUT OF A LITHOGRAPHIC APPARATUS
A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom...
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US20060001851 |
Immersion photolithography system
In immersion photolithography, immersion fluid is located between a wafer and a lens for projecting an image onto the wafer through the immersion fluid. In order to inhibit evaporation from the...
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US20090323078 |
METHOD AND SYSTEM FOR STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY
A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the...
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US20050007567 |
Contact or proximity printing using a magnified mask image
Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended through...
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US20090004581 |
Exposure apparatus, exposure method and optical proximity correction method
There is disclosed an exposure apparatus which includes an illumination optical system including a light source which emits illumination light, a mask stage which holds a photomask having a mask...
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US20090257041 |
Illuminator for a Photolithography Device
The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a...
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US20080231826 |
UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY
A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated...
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US20110211180 |
OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT
An optical component includes an optical element, a mount for the optical element, and a temperature control device configured to control a temperature of a part of the mount based on at least one...
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US20080266539 |
Exposure system, device production system, exposure method, and device production method
A device production system includes a substrate transport section which transports a substrate; a plurality of exposure sections each of which is capable of exposing the substrate; and a controller...
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US20090310111 |
Pulse to Pulse Energy Equalization of Light Beam Intensity
A system for equalizing pulse to pulse energy of a light beam includes a group of optical devices including an optical device configured to exhibit third order nonlinear properties. Transmission...
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US20080094674 |
Holographic Lithography
A method of generating a holographic diffraction pattern and a holographic lithography system are disclosed. The method involves defining at least one geometrical shape; generating at least one...
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US20090219496 |
Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning
Double patterning a photo sensitive layer stack, is disclosed including providing a substrate being coated with a first and a second photo resist layer, exposing both photo resist layers by...
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US20070258061 |
System and method for using a two part cover and a box for protecting a reticle
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part...
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US20120257177 |
ILLUMINATION DESIGN FOR LENS HEATING MITIGATION
A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design,...
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US20090147226 |
Inner Surface Exposure Apparatus and Inner Surface Exposure Method Technical Field
An apparatus and a method for exposing a photosensitive material deposited on the inner surface of a tube such as a circular or polygonal tube to light to form a predetermined exposed pattern are...
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US20100097594 |
APPARATUS FOR FABRICATING AND OPTICALLY DETECTING BIOCHIP
An apparatus for fabricating a biochip is provided. The apparatus includes a reaction chamber which encapsulates the biochip to be sealed form an external environment. The apparatus further...
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US20080106714 |
Alignment Information Display Method And Its Program, Alignment Method, Exposure Method, Device Production Process, Display System, Display Device, And Program And Measurement/Inspection System
[PROBLEM] To provide an information display method enabling efficient analysis and evaluation of alignment results and thereby facilitating the setting of effective alignment conditions or...
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US20100053583 |
EXPOSURE APPARATUS WITH AN ILLUMINATION SYSTEM GENERATING MULTIPLE ILLUMINATION BEAMS
An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously...
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US20110261344 |
EXPOSURE METHOD
A method for exposing a surface of a target in a system comprising a set of sensors (30) for measuring distance to the target. The method comprises clamping the target to a moveable table (134),...
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US20090033907 |
DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES
Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding...
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US20090115980 |
Illumination system and filter system
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system...
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