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US20080252872 METHOD OF EVALUATING OPTICAL BEAM SOURCE OF EXPOSURE DEVICE, METHOD OF DESIGNING ILLUMINATION SHAPE OF EXPOSURE DEVICE, AND SOFTWARE FOR OPTIMIZING ILLUMINATION SHAPE OF EXPOSURE DEVICE  
A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing...
US20050123840 Mask for use in a microlithographic projection exposure apparatus  
A mask (20) for use in a microlithographic projection exposure apparatus (10) has a support (28) on which a pattern of opaque structures (32) is applied. The intermediate spaces (36, 36′)...
US20090153829 LITHOGRAPHIC PROJECTION OBJECTIVE  
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or...
US20060256313 Photolithographic imaging device and apparatus for generating an illumination distribution  
The imaging device has, in the illumination pupil region, an illumination distribution characterized by dipole-like light distributions along a straight line. The imaging device makes it possible...
US20080013065 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS  
Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.
US20140253887 CONTAMINATION PREVENTION FOR PHOTOMASK IN EXTREME ULTRAVIOLET LITHOGRAPHY APPLICATION  
Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. In one embodiment, an apparatus for removing debris particles...
US20090086184 Controlling Fluctuations in Pointing, Positioning, Size or Divergence Errors of a Beam of Light for Optical Apparatus  
A system and method are used for controlling fluctuations in one or more of a beam pointing error, a beam positioning error, a beam size error or a beam divergence error of a beam of light in a...
US20090021706 Immersion fluid containment system and method for immersion lithogtraphy  
A ferrofluid is provided adjacent to the immersion area between a projection optical system (PL) and substrate and receives a magnetic force so as to form a ferrofluidic seal (100) adjacent to the...
US20100099048 Stop Flow Interference Lithography System  
Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer...
US20100097596 SCANNING EXPOSURE METHOD  
A scanning exposure method is provided. A mask and a substrate are oppositely moved along a direction. The mask and the substrate are moved in at least two different uniform relative velocities...
US20090251675 EXPOSURE DEVICE  
In an exposure device having tiny light emitting elements aligned, a space required for drive circuits and wires is secured without affecting the size or alignment of the light emitting elements...
US20150042974 ILLUMINATION OPTICAL UNIT AND OPTICAL SYSTEM FOR EUV PROJECTION LITHOGRAPHY  
An illumination optical unit for EUV projection lithography serves for obliquely illuminating an illumination field, in which an object field of a downstream imaging catoptric optical unit and a...
US20120212719 THERMAL MANAGEMENT SYSTEMS, ASSEMBLIES AND METHODS FOR GRAZING INCIDENCE COLLECTORS FOR EUV LITHOGRAPHY  
Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror...
US20130038853 NANOMETER-PRECISION SIX-DEGREE-OF-FREEDOM MAGNETIC SUSPENSION MICRO-MOTION TABLE AND APPLICATION THEREOF  
A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a...
US20080239258 Residual Pupil Asymmetry Compensator for a Lithography Scanner  
A uniformity correction system may be used as an actuator for the correction of asymmetry scan-integrated illumination pupil fill that varies in the non-scanning direction of a lithography system....
US20100165317 Illumination aperture for optical lithography  
Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.
US20110063727 Method and system with indicating marks for projection film  
Indicia are established on the film to clearly indicate locations where cuts for splices may and may not be properly made. These indicia are different from each other to signify whether a cut can...
US20110255061 COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive...
US20150104734 Extreme Ultraviolet Lithography Process and Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes a mask having first and second reflective regions. The system also includes an illumination to expose the...
US20060061751 Stage assembly including a stage having increased vertical stroke  
A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a...
US20080259291 Pellicle, lithographic apparatus and device manufacturing method  
A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb...
US20110035171 Calibration of Optical Line Shortening Measurements  
A system and method of calibrating optical line shortening measurements, and lithography mask for same. The lithography mask comprises a plurality of gratings, with a calibration marker disposed...
US20130077067 EXPOSURE APPARATUS HAVING BLIND AND METHOD OF DRIVING  
An exposure apparatus includes a light source, a mask, a blind, and a blind driver. The light source emits light in a light emitting cycle. The mask is disposed over a substrate and includes an...
US20060003240 Methods for adjusting light intensity for photolithography and related systems  
Correcting light intensity for photolithography may include irradiating light having a first light intensity distribution through a photo mask having a mask pattern to a photosensitive layer on a...
US20110181854 FOCUS COMPENSATION FOR OPTICAL ELEMENTS AND APPLICATIONS THEREOF  
Optical imaging apparatus are provided having the desired focal properties, which can be manufactured and/or assembled at the wafer level.
US20120141928 METHOS AND DEVICE FOR KEEPING MASK DIMENSIONS CONSTANT  
The present application describes a method and a device for keeping the mask dimensions of a mask (6) constant in the mask plane in lithography. The mask (6) is heated due to the exposure during...
US20060146301 Print order receiving method, print order receiver, and print production system  
The print order receiver and print order receiving method acquire image data of first images of one order, input a print order with respect to the first images for individual package units of the...
US20090213343 RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY  
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further,...
US20100026977 METHOD FOR MEASURING WAVEFRONT ABERRATION  
A method comprises determining a first processing center position to calculate a wavefront aberration of an optical system, determining a second processing center position to calculate a wavefront...
US20140028993 PROCESS CONTROL USING NON-ZERO ORDER DIFFRACTION  
A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of...
US20060139592 Latent overlay metrology  
An apparatus and method for improved latent overlay metrology is disclosed. In an embodiment, a scatterometer and an overexposed overlay target are used to obtain more robust overlay measurement....
US20150198899 MARK DETECTING METHOD  
A mark detecting method of detecting a notch as a mark formed on the outer circumference of a wafer held on a holding table. The mark detecting method includes the steps of index-rotating the...
US20100053574 Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate  
A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead...
US20090002669 ULTRAVIOLET LIGHT-EMITTING DIODE EXPOSURE APPARATUS FOR MICROFABRICATION  
An exposure apparatus for use in optical lithography can include a holder and a plurality of UV-LED modules carried by the holder and disposed in an array. A respective plurality of collimating...
US20100248159 PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS  
An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the...
US20090091731 ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY  
The disclosure relates to illumination optical systems for microlithography, such as EUV-microlithography, as well as related systems, components and methods.
US20140268081 AMORPHOUS LAYER EXTREME ULTRAVIOLET LITHOGRAPHY BLANK, AND MANUFACTURING AND LITHOGRAPHY SYSTEMS THEREFOR  
An integrated extreme ultraviolet blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a deposition system for depositing a multi-layer stack without removing...
US20080030693 IMMERSION PHOTOLITHOGRAPHY MONITORING  
A method and apparatus are provided for monitoring an immersion photolithography process, the method including supplying an immersion fluid having an initial refractive index, performing...
US20080273186 Illumination System, In Particular For A Projection Exposure Machine In Semiconductor Lithography  
An illumination system is provided with a light produced by a light source, with an optical axis and with optical elements, in particular for a projection exposure machine in semiconductor...
US20110222042 OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD  
An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation...
US20090273768 Liquid for immersion exposure, method of purifying the same,and immersion exposure method  
A saturated hydrocarbon compound is brought into contact at least with a first adsorbent and a second adsorbent to obtain a liquid for immersion exposure containing the saturated hydrocarbon...
US20110116068 EUV Reticle Substrates With High Thermal Conductivity  
A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry...
US20150262831 LITHOGRAPHY TOOL WITH BACKSIDE POLISHER  
Methods for processing a substrate having a structure formed thereon and a system for processing a substrate are provided. A substrate is received from first processing equipment, where the first...
US20150138519 Contamination Trap for a Lithographic Apparatus  
Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme...
US20100271612 METHOD AND PELLICLE MOUNTING APPARATUS FOR REDUCING PELLICLE INDUCED DISTORTION  
An apparatus for mounting a pellicle onto a mask is provided. In one embodiment, the apparatus comprises a base provided with a track; a dummy plate holder coupled to the base, the dummy plate...
US20050157288 Zero-force pellicle mount and method for manufacturing the same  
Methods and apparatuses for mounting a pellicle to a reticle is provided. A multi-support point pellicle holder supports a pellicle, such as a fused silica pellicle, and a multi-support point...
US20050286037 Semiconductor exposure apparatus and method for exposing semiconductor using the same  
A semiconductor exposure apparatus and a method for exposing a semiconductor using the same are disclosed, which can prevent differences in critical dimensions according to variations in slit...
US20130169946 LITHOGRAPHY MACHINE AND SCANNING AND EXPOSING METHOD THEREOF  
The present disclosure provides a lithography machine and a scanning and exposing method thereof. According to the scanning and exposing method, the scanning and exposing process for a whole wafer...
US20090021715 MICROLITHOGRAPHIC ILLUMINATION SYSTEM  
A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of...
US20080204694 Controlling shape of a reticle with low friction film coating at backside  
In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the...