Sign up

AcclaimIP-ad

Match Document Document Title
US20080273186 Illumination System, In Particular For A Projection Exposure Machine In Semiconductor Lithography  
An illumination system is provided with a light produced by a light source, with an optical axis and with optical elements, in particular for a projection exposure machine in semiconductor...
US20110222042 OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD  
An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation...
US20090273768 Liquid for immersion exposure, method of purifying the same,and immersion exposure method  
A saturated hydrocarbon compound is brought into contact at least with a first adsorbent and a second adsorbent to obtain a liquid for immersion exposure containing the saturated hydrocarbon...
US20110116068 EUV Reticle Substrates With High Thermal Conductivity  
A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry...
US20100271612 METHOD AND PELLICLE MOUNTING APPARATUS FOR REDUCING PELLICLE INDUCED DISTORTION  
An apparatus for mounting a pellicle onto a mask is provided. In one embodiment, the apparatus comprises a base provided with a track; a dummy plate holder coupled to the base, the dummy plate...
US20050157288 Zero-force pellicle mount and method for manufacturing the same  
Methods and apparatuses for mounting a pellicle to a reticle is provided. A multi-support point pellicle holder supports a pellicle, such as a fused silica pellicle, and a multi-support point...
US20050286037 Semiconductor exposure apparatus and method for exposing semiconductor using the same  
A semiconductor exposure apparatus and a method for exposing a semiconductor using the same are disclosed, which can prevent differences in critical dimensions according to variations in slit...
US20130169946 LITHOGRAPHY MACHINE AND SCANNING AND EXPOSING METHOD THEREOF  
The present disclosure provides a lithography machine and a scanning and exposing method thereof. According to the scanning and exposing method, the scanning and exposing process for a whole wafer...
US20090021715 MICROLITHOGRAPHIC ILLUMINATION SYSTEM  
A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of...
US20080204694 Controlling shape of a reticle with low friction film coating at backside  
In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the reticle...
US20090033892 DOUBLE EXPOSURE OF A PHOTORESIST LAYER USING A SINGLE RETICLE  
A composite exposure image is formed on a photoresist layer by applying a light beam through a reticle to form a first exposure image thereon, and thereafter, while maintaining the position of the...
US20060033043 Stacked six degree-of-freedom table  
A table with six degrees of freedom, such as a wafer table for a lithography system, has an upper table stacked on top of a lower table. Each of these two stacked tables has three degrees of...
US20100073654 EVALUATION METHOD AND EXPOSURE APPARATUS  
An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical...
US20080084548 MASKLESS EXPOSURE APPARATUS AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY USING THE SAME  
The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrate 22 is disposed on a scan...
US20100309448 WAVEFRONT ABERRATION MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE  
A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an...
US20120026473 HIGHLY REFLECTIVE, HARDENED SILICA TITANIA ARTICLE AND METHOD OF MAKING  
The present disclosure is directed to improved silica-titania glass articles intended for use in EUV or other high energy reflective optic systems, and to a process for producing such improved...
US20140085620 3D PRINTER WITH SELF-LEVELING PLATFORM  
3D printing systems and methods avoid build-compromising misalignments through the use of a self-leveling assembly that maintains a constant and typically fully parallel orientation between a build...
US20050174551 Position control and heat dissipation for photolithography systems  
A photolithography system that uses a variable reluctance linear motor (VRLM) to move a reticle or wafer stage is described. In addition to moving the stage, one or more of the surfaces of the VRLM...
US20140327897 EXPOSURE DEVICE AND METHOD FOR PRODUCING STRUCTURE  
In order to exposure interference fringes to photoresist and form a desired irregular pattern, it is necessary to know the cycle of the interference fringes in advance. In order to confirm the...
US20070165202 Illumination system for a microlithography projection exposure installation  
An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system...
US20060256305 Exposure apparatus and method for reducing thermal deformity of reticles  
Disclosed is an exposure apparatus and method thereof able to prevent thermal deformity of reticles. The exposure apparatus may includes a reticle container including a plurality of reticles and a...
US20150015860 Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography  
A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to...
US20080151210 METHOD FOR DETERMINING EXPOSURE CONDITION AND COMPUTER-READABLE STORAGE MEDIA STORING PROGRAM FOR DETERMINING EXPOSURE CONDITION  
A method for determining an exposure condition for use in projecting an image of a pattern of an original on a substrate includes a setting step of setting an exposure condition, an image...
US20110122381 Imaging Assembly  
A imaging assembly for generating a light beam suitable for sintering comprises a lamp housing and a lamp mounted in the lamp housing comprising a filament and a lamp base, wherein the lamp is...
US20100297550 Compositions comprising sulfonamide material and processes for photolithography  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide...
US20130182231 SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY  
A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a...
US20080225257 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method  
An optical integrator system comprises a first optical integrator including a plurality of first wavefront dividing elements arranged in juxtaposition along a predetermined direction, and a second...
US20120170014 Photolithography system using a solid state light source  
A photolithography system based on a solid-state light source having LEDs is provided. Solid-state photolithography using the solid state light source can achieve high quality patterns over a wide...
US20140175171 SYSTEM AND A METHOD FOR NANO IMPRINTING  
A method for creating a highly accurate nanostructure is provided, the method includes: (i) creating a highly accurate nanostructure prototype, wherein the highly accurate nanostructure prototype,...
US20150015865 ILLUMINATION INTENSITY CORRECTION DEVICE FOR PREDEFINING AN ILLUMINATION INTENSITY OVER AN ILLUMINATION FIELD OF A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
An illumination intensity correction device serves for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus. The correction device has a...
US20050088633 Composite optical lithography method for patterning lines of unequal width  
A composite patterning technique may include two lithography processes. A first lithography process may use interference lithography to form an interference pattern of lines of substantially equal...
US20110276125 Medical Devices, Methods of Producing Medical Devices, and Projection Photolithography Apparatus for Producing Medical Devices  
Stents and other medical devices that can have specific geometric configurations (curves, contours, tapers) and/or patterns (e.g., grooves) thereon, methods of making such medical devices, and...
US20110157576 FLUID GAUGE WITH MULTIPLE REFERENCE GAPS  
A fluid gauge (222) for measuring the position of a work piece (200) includes a gauge body (236), a fluid source assembly (238), and a gauge control system (240). The gauge body (236) includes a...
US20060290911 Scanning photolithography apparatus and method  
A reticle having a reticle pattern is mounted with a scanning photolithography apparatus. The reticle pattern adapted to form a circuit pattern on a photoresist layer formed on a substrate. An...
US20090201479 LASER LIGHT SOURCE CONTROL METHOD, LASER LIGHT SOURCE DEVICE, AND EXPOSURE APPARATUS  
An exposure apparatus includes a laser light source that emits a laser beam as an exposure beam by pulse oscillation; a detection system that detects a rotation angle of an external shape of the...
US20090213350 COHERENCE-REDUCTION DEVICES AND METHODS FOR PULSED LASERS  
Devices and methods are disclosed for reducing coherence, and thus speckle, of a coherent beam of light. An exemplary illumination device includes a source emitting a pulsed coherent light beam...
US20140285789 Lithography Method and Structure for Resolution Enhancement with a Two-State Mask  
A lithography process in a lithography system includes loading a mask that includes two mask states defining an integrated circuit (IC) pattern. The IC pattern includes a plurality of main...
US20090176167 Alignment System and Alignment Marks for Use Therewith  
A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured...
US20130016328 DISPERSING IMMERSION LIQUID FOR HIGH RESOLUTION IMAGING AND LITHOGRAPHY  
Methods and apparatus are described for delivering index-matching immersion liquid in high numerical-aperture optical microscopy and lithography. An array of immersion liquid droplets is delivered...
US20070279609 Device for Changing Pitch Between Light Beam Axes, and Substrate Exposure Apparatus  
A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y...
US20060215138 Laser beam pattern generator with a two-axis scan mirror  
An optical pattern generator for use in grayscale photolithography is provided with an optical source to generate a light beam, an optical modulator optically coupled to the optical source to...
US20070031743 Alignment and alignment marks  
A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by...
US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment  
A method for providing a vacuum isolated environment in a lithography system is disclosed. The method for dechucking a reticle includes providing a mask chamber having one or more vacuum valves for...
US20090147237 Spatial Phase Feature Location  
Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the...
US20080218715 IMMERSION EXPOSURE METHOD OF AND IMMERSION EXPOSURE APPARATUS FOR MAKING EXPOSURE IN A STATE WHERE THE SPACE BETWEEN THE PROJECTION LENS AND SUBSTRATE TO BE PROCESSED IS FILLED WITH A LIQUID  
An immersion exposure method is disclosed which, while causing a relative movement of an immersion area formed so as to intervene between a substrate to be exposed on an exposure stage and a...
US20120092632 DIFFRACTION UNLIMITED PHOTOLITHOGRAPHY  
Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern...
US20090201478 TRANSMITTING OPTICAL ELEMENT AND OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A transmitting optical element (33, 37) adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material (100), with the...
US20070231730 Radiation Curable Toner Composition  
The invention relates to dry toner particles comprising at least a radiation curable resin and a colouring agent, the radiation curable resin comprises a blend of a) an (meth)acrylated...
US20090117489 Compositons and processes for immersion lithography  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
US20090040484 EXPOSURE EQUIPMENT, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR A SEMICONDUCTOR DEVICE  
Provided is an exposure equipment having high resolution even when a reticle is inclined. The exposure equipment includes: an optical system for projecting on a wafer (130), a pattern formed on a...