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US20070031743 Alignment and alignment marks  
A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by...
US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment  
A method for providing a vacuum isolated environment in a lithography system is disclosed. The method for dechucking a reticle includes providing a mask chamber having one or more vacuum valves for...
US20090147237 Spatial Phase Feature Location  
Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the...
US20080218715 IMMERSION EXPOSURE METHOD OF AND IMMERSION EXPOSURE APPARATUS FOR MAKING EXPOSURE IN A STATE WHERE THE SPACE BETWEEN THE PROJECTION LENS AND SUBSTRATE TO BE PROCESSED IS FILLED WITH A LIQUID  
An immersion exposure method is disclosed which, while causing a relative movement of an immersion area formed so as to intervene between a substrate to be exposed on an exposure stage and a...
US20120092632 DIFFRACTION UNLIMITED PHOTOLITHOGRAPHY  
Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern...
US20090201478 TRANSMITTING OPTICAL ELEMENT AND OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A transmitting optical element (33, 37) adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material (100), with the...
US20070231730 Radiation Curable Toner Composition  
The invention relates to dry toner particles comprising at least a radiation curable resin and a colouring agent, the radiation curable resin comprises a blend of a) an (meth)acrylated...
US20090117489 Compositons and processes for immersion lithography  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
US20090040484 EXPOSURE EQUIPMENT, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR A SEMICONDUCTOR DEVICE  
Provided is an exposure equipment having high resolution even when a reticle is inclined. The exposure equipment includes: an optical system for projecting on a wafer (130), a pattern formed on a...
US20090225287 RETICLE POD AND METHOD FOR KEEPING RETICLE CLEAN AND DRY  
A reticle pod and a method for keeping a reticle clean and dry are provided, wherein the reticle pod holds a reticle and has a pellicle side provided with a pellicle. The reticle pod includes: a...
US20100315614 SOURCE-MASK OPTIMIZATION IN LITHOGRAPHIC APPARATUS  
A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more...
US20050275814 Maskless vortex phase shift optical direct write lithography  
The present invention provides methods and apparatus for accomplishing a optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is...
US20120099088 HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM  
Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an...
US20110099526 Pattern Selection for Full-Chip Source and Mask Optimization  
The present invention relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and...
US20060046211 Effectively water-free immersion lithography  
A method and system is disclosed for conducting immersion photolithography. The system includes at least one lens for transmitting a predetermined radiation on a predetermined substrate with a...
US20080137049 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle  
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The...
US20070285632 EUVL reticle stage and reticle protection system and method  
Apparatuses for and methods of maximizing particle protection while enabling temporary concurrent illumination of a reticle with exposure radiation through an aperture and auto focus beams or while...
US20120162622 FIELD EXTENSION TO REDUCE NON-YIELDING EXPOSURES OF WAFER  
Techniques are provided for efficient lithography processing and wafer layout. In particular, the techniques can be used to reduce the number of sacrificial exposures along the wafer perimeter...
US20100091261 OPERATING VALVE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening...
US20120307215 Flow Through MEMS Package  
A flow through Micro-Electromechanical Systems (MEMS) package and methods of operating a MEMS packaged using the same are provided. Generally, the package includes a cavity in which the MEMS is...
US20070267804 SHEET FEEDING DEVICE AND IMAGE FORMING APPARATUS  
A sheet feeding device includes: an arm member that is provided with a drive shaft at a base end thereof, the arm member being configured to swingably rotate around the drive shaft; a feed roller...
US20110261336 SYSTEM FOR PATTERNING FLEXIBLE FOILS  
According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This...
US20090268186 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS  
A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an...
US20080241760 PEB EMBEDDED EXPOSURE APPARATUS  
The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for...
US20080111981 Radiation Beam Pulse Trimming  
A system is used to perform fast and slow applications, for example fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam...
US20110235009 SUB-RESOLUTION ASSIST DEVICES AND METHODS  
Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive...
US20110242514 1.5D SLM FOR LITHOGRAPHY  
This invention relates to an improved micro lithographic writer that sweeps a modulated pattern across the surface of a workpiece. The SLM disclosed works in a diffractive mode with a continuous or...
US20090079952 SIX-MIRROR EUV PROJECTION SYSTEM WITH LOW INCIDENCE ANGLES  
The invention relates to a projection system for guiding light with wavelengths ≦193 nm from an object plane to an image plane, comprising at least a first mirror (M1), a second mirror (M2), a t...
US20060216615 Wavefront engineering with off-focus mask features  
An imaging part such as a mask or reticle includes a patterned layer in an on-axis plane of the imaging part. The imaging part further includes another layer including sub-resolution features,...
US20070091292 System, medium, and method controlling operation according to instructional movement  
A system, medium, and method for controlling an operation according to movement. A movement model can be generated based on at least one movement and stored corresponding to a predetermined...
US20120008121 ACTUATOR INCLUDING MAGNET FOR A PROJECTION EXPOSURE SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING A MAGNET  
The present disclosure relates to an actuator for projection exposure systems that include a magnet. The magnet is encapsulated and/or supported in a magnet holding plate that is produced by...
US20080304033 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
US20120194795 OPTICAL ELEMENT  
An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.
US20090027643 COMPENSATION OF RETICLE FLATNESS ON FOCUS DEVIATION IN OPTICAL LITHOGRAPHY  
A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate...
US20060028628 Lens cleaning module  
A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer...
US20050153424 Fluid barrier with transparent areas for immersion lithography  
A fluid supply system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid source (372) and a fluid barrier (256). The fluid source...
US20070273850 Extreme Ultra Violet Lithography Apparatus  
Lithography apparatus comprises a lithography tool housed in a first chamber, and a source of radiation at or below ultra violet wavelengths housed in a second chamber connected to the first...
US20090059189 PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS  
A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle...
US20120320351 IMMERSION LITHOGRAPHY SYSTEM USING A SEALED WAFER BATH  
Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a...
US20110019171 OPTICAL UNIT HAVING ADJUSTABLE FORCE ACTION ON AN OPTICAL MODULE  
The present disclosure relates to an optical device, in particular for microlithography, having an optical module, a supporting structure and a force-generating device. The force-generating device...
US20050270516 System for magnification and distortion correction during nano-scale manufacturing  
The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to...
US20100039636 ILLUMINATION OPTICS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The...
US20100321654 Method of Overlay Measurement, Lithographic Apparatus, Inspection Apparatus, Processing Apparatus and Lithographic Processing Cell  
In order to improve overlay measurement, product marker gratings on a substrate are measured in a lithographic apparatus by an alignment sensor using scatterometry. Then information relating to the...
US20130244139 Reflective Lithography Masks and Systems and Methods  
Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a...
US20090155730 METHOD FOR MANUFACTURING STORAGE MEDIUM AND APPARATUS FOR MANUFACTURING INFORMATION STORAGE MASTER DISC  
A method for manufacturing an information storage medium in which information is stored as a concave-convex pattern includes forming an inorganic-resist master disc by depositing on a substrate an...
US20130293865 Linear Stage for Reflective Electron Beam Lithography  
A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage...
US20080198351 Lithography Scanner Throughput  
A method for use in the manufacture of a microelectronic apparatus, the method comprising exposing a dummy field on a substrate by utilizing a lithographic scanner at a first speed, and exposing a...
US20060170895 Projection exposure apparatus  
The invention relates to a projection exposure apparatus, in particular for the field of microlithography. The projection exposure apparatus includes at least one treatment device for treating at...
US20100188646 DRAWING METHOD AND DRAWING APPARATUS  
A drawing method includes the steps of: moving a plurality of drawing heads relative to a drawing surface in a predetermined scanning direction, each of the drawing heads being equipped with a...
US20130088703 REACTION ASSEMBLY FOR A STAGE ASSEMBLY  
A reaction assembly 18 for a stage assembly 10 that moves a device 26 along a first axis includes a base countermass 40 and a first transverse countermass 42. The stage assembly 10 includes a stage...