Match Document Document Title
US20100315608 METHOD FOR CONTACT COPYING OF HOLOGRAMS AND HOLOGRAPHIC PRINTS  
The invention relates to holography and is devoted for hologram copying and Denysiuk type hologram manufacture. The method comprises steps, wherein non-exposed photomaterial (1) is placed in...
US20100020295 METHOD TO FABRICATE PATTERN IN HOUSING  
A method to fabricate a pattern on a housing, includes following steps: placing a film having a first lightproof area and a first light-transmissible area on a housing having light-sensitive inks...
US20100302525 Lithographic Apparatus and Method for Illumination Uniformity Correction and Uniformity Drift Compensation  
A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam....
US20080285001 Lithography aperture lenses, illumination systems, and methods  
Lithography aperture lenses, illumination systems, and methods are disclosed. In a preferred embodiment, a lens includes a substantially transparent material and an electro-optical material...
US20070242253 Moving beam with respect to diffractive optics in order to reduce interference patterns  
A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element...
US20090040536 MARK FOR ALIGNMENT AND OVERLAY, MASK HAVING THE SAME, AND METHOD OF USING THE SAME  
A mark for alignment and overlay, a mask having the same, and a method of using the same are provided. The mark includes a first mark pattern and a second mark pattern. The first mark pattern...
US20130010277 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle  
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part...
US20110001955 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle  
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part...
US20100039630 OPTIMIZATION OF FOCUSED SPOTS FOR MASKLESS LITHOGRAPHY  
The focused spots of an active spot array projection system, such as a maskless lithographic projection system, are optimized within a relay of the projection system. A frequency modulator is...
US20090135390 LITHOGRAPHIC ALIGNMENT MARKS  
Precise and repeatable alignment performance using asymmetric illumination is achieved by properly structuring, as by segmenting, an alignment mark on a reticle of a photolithographic exposure...
US20150116686 EDGE-DOMINANT ALIGNMENT METHOD IN EXPOSURE SCANNER SYSTEM  
An edge-dominant alignment method for use in an exposure scanner system is provided. The method includes the steps of: providing a wafer having a plurality of shot areas, wherein each shot area...
US20100055584 EXPOSURE DEVICE AND EXPOSURE METHOD  
An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective...
US20080084549 HIGH REFRACTIVE INDEX MEDIA FOR IMMERSION LITHOGRAPHY AND METHOD OF IMMERSION LITHOGRAPHY USING SAME  
In accordance with the present invention, a colloidal immersion lithography medium is provided. The medium comprises: a) a continuous liquid phase comprising a liquid having an index of refraction...
US20150109601 CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM MEASUREMENT SENSOR  
A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of...
US20110075124 Source and Mask Optimization By Changing Intensity and Shape of the Illumination Source  
An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation...
US20110228244 ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY  
An illumination optical system for projection lithography for the illumination of an illumination field has a facet mirror. An optical system, which follows the illumination optical system, has an...
US20110267596 GRAVITATION COMPENSATION FOR OPTICAL ELEMENTS IN PROJECTION EXPOSURE APPARATUSES  
A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least...
US20080049206 ILLUMINATION SYSTEM WITH A DETECTOR FOR REGISTERING A LIGHT INTENSITY  
Illumination systems for microlithography projection exposure apparatuses, as well as related systems, components and methods are disclosed.
US20110261335 SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN IMMERSION LITHOGRAPHY  
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration...
US20110128519 Radiation Source  
A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a...
US20100079741 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY  
A projection objective for use in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured...
US20130120730 FACET MIRROR DEVICE  
A facet mirror device includes a facet element and a support element which supports the facet element. The facet element includes a curved support section. The support element includes a support...
US20070058149 Lighting system and exposure apparatus  
A lighting system and an exposure apparatus in which even if the outgoing optical axes of outgoing beams emitted from a plurality of LDs disposed on a flat plane are shifted, the efficiency of use...
US20070013896 EXPOSURE METHOD  
An exposure method for exposing a pattern of a reticle which includes a first pattern and a second pattern by using a light from a light source and an optical system includes the steps of...
US20150116685 Extreme Ultraviolet Lithography Process to Print Low Pattern Density Features  
The present disclosure provides a method for extreme ultraviolet lithography (EUVL) process. The method includes loading a binary phase mask (BPM) to a lithography system, wherein the BPM includes...
US20060078637 Solid immersion lens lithography  
Lithography using solid immersion lenses is disclosed. In one aspect, an apparatus is provided that includes a resist film that has a first side and a second and opposite side. One or more solid...
US20090316131 EXPOSURE APPARATUS THAT UTILIZES MULTIPLE MASKS  
An exposure apparatus (10) for transferring a first mask pattern (29A) from a first mask (26A) and a second mask pattern (29B) from a second mask (26B) to a substrate (28) includes a first mask...
US20090021714 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT  
The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is...
US20120249985 MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS  
A device for measuring an imaging optical system, including: a first grating pattern (6), which is positionable in a beam path upstream of the imaging optical system, having a first grating...
US20130135603 C-CORE ACTUATOR FOR MOVING A STAGE  
A mover assembly (46) for moving a stage (14) includes an actuator (30) that is coupled to the stage (14). The actuator (30) includes (i) a C-Core (52) having a generally ā€œCā€ shape and including a...
US20070035709 End effector with integrated illumination system for reticle pre-alignment sensors  
An apparatus includes a first support structure configured to support an element that has an alignment marker. The apparatus also includes an alignment sensor comprising a light source that is...
US20150227048 PHOTOLITHOGRAPHY METHOD AND SYSTEM BASED ON HIGH STEP SLOPE  
A photolithography method and system based on a high step slope are provided. The method includes: S1, manufacturing a sacrificial layer with a high step slope on a substrate; S2, adopting a...
US20120127447 METHOD FOR DETERMING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE  
A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover...
US20120113405 METHOD FOR DETERMINING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE  
A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover...
US20060103828 Adjustable illumination blade assembly for photolithography scanners  
A method and structure for providing adjustable optical lithography illumination comprises a blade which can be customized to provide a desired light pattern. The adjustable blade can be...
US20150168851 INCREASING LITHOGRAPHIC DEPTH OF FOCUS WINDOW USING WAFER TOPOGRAPHY  
Various embodiments provide for topography aware optical proximity correction that can improve depth of focus during wafer lithography. The system can determine the topography of the wafer using...
US20090244509 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS  
The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations....
US20100002205 PRINTING APPARATUS, LENS SHEET, AND PRINTING METHOD  
Provided is a printing apparatus for performing printing on a lens sheet on which a plurality of lenses is arranged with a longitudinal direction thereof in one direction, and a print image...
US20130044299 PROJECTION-TYPE PHOTOLITHOGRAPHY SYSTEM USING COMPOSITE PHOTON SIEVE  
The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting...
US20080030708 DEVICE MANUFACTURING METHOD  
A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to...
US20140160456 OPTICAL APERTURE DEVICE  
An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is...
US20110090478 Lens barrel support device and maskless exposure apparatus having the same  
Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel,...
US20110063595 OPTICAL APERTURE DEVICE  
An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is...
US20100007869 Reticle Handler  
The present invention provides an apparatus and method for handling a reticle during manufacturing processes of semiconductor devices in the fabrication line. The apparatus includes a holder for...
US20080100815 ARRANGEMENT OF TWO CONNECTED BODIES  
Arrangements of a first body and a second body connected to the first body, as well as related systems and methods, are disclosed. The arrangements, systems and methods can be used, for example,...
US20110267597 Method of Performing Model-Based Scanner Tuning  
A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method...
US20070153247 Exposure apparatus, exposure method, projection optical system and device producing method  
An exposure apparatus includes an optical unit which defines a first exposure area and a second exposure area at different positions in a first direction and which radiates exposure light beams...
US20090135387 Laser Irradiation  
The invention relates to an optical arrangement for transmitting a structure from a mask (4), and for the corresponding irradiation of a substrate (7). Said optical arrangement comprises a region...
US20090274983 SCANNING EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
A scanning exposure apparatus (300) includes a first stage (325), a second stage (345), a projection optical system (330), a first measurement unit (20) arranged on the second stage (345), and a...
US20130244140 Non-Planar Lithography Mask and System and Methods  
Various non-planar lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a lens-type transparent substrate and a...