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US20120127440 OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY  
An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent...
US20150009480 REFLECTIVE OPTICAL ELEMENT FOR GRAZING INCIDENCE IN THE EUV WAVELENGTH RANGE  
An optical element comprises a reflecting coating on a substrate. The reflecting coating contains boron and can have a thickness of more than 50 nm.
US20120154775 EUV Radiation Source and Method of Generating EUV Radiation  
An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at...
US20150138520 Holding Device for an Optical Element in an Objective  
A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged...
US20110014577 PELLICLE INSPECTION DEVICE, EXPOSURE APPARATUS USING SAME, AND DEVICE MANUFACTURING METHOD  
The pellicle inspection device of the present invention is a device that detects damage to a pellicle film disposed on an original. The pellicle inspection device includes a measuring unit...
US20090021711 METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM  
A method of inspecting an exposure system uses a mask pattern including a first and a second mask pattern, the first pattern being formed in a line-and-space of a first pitch, the second pattern...
US20050153216 Lithography mask and lithography system for direction-dependent exposure  
Lithography mask having a structure for the fabrication of semiconductor components, in particular memory components, for a direction-dependent exposure device, featuring at least one auxiliary...
US20070146681 Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method  
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle...
US20090122281 SILICA GLASS CONTAINING TIO2 AND PROCESS FOR ITS PRODUCTION  
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100°...
US20070279611 Reflective loop system producing incoherent radiation  
A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or...
US20080068579 APERTURE UNIT AND EXPOSURE SYSTEM INCLUDING THE SAME, AND METHOD FOR REPLACING APERTURES OF THE APERTURE UNIT  
Provided are an aperture unit, an exposure system including the aperture unit, and a method for replacing an aperture of the aperture unit. The aperture unit rotates a revolver on which a...
US20100060878 EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE  
A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is...
US20120281189 Evaporative thermal management of grazing incidence collectors for EUV lithography  
Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a...
US20150146188 METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OVERLAY, AND A COMBINATION OF A LITHOGRAPHIC APPARATUS AND AN OVERLAY MEASUREMENT SYSTEM  
A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes...
US20110013170 DEVICE FOR TREATING SHEET-LIKE SUBSTRATES WITH LIGHT  
A device for treating sheet-like substrates with light is made for a suction table, which includes a circulating suction strip for transporting the sheet-like substrates, which suction strip forms...
US20070279612 LIGHT MIXING DEVICE, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
The disclosure relates to a light mixing device, comprising a first arrangement composed of first beam-deflecting elements and a second arrangement composed of second beam-deflecting elements,...
US20130003036 PHOTO MASK UNIT COMPRISING A PHOTOMASK AND A PELLICLE AND A METHOD FOR MANUFACTURING THE SAME  
It is an object of the present invention to provide a photomask unit suitable for forming a microscopic pattern of 32 nm or smaller on a photoresist film using the EUV exposure technique and being...
US20130286369 Using Customized Lens Pupil Optimization to Enhance Lithographic Imaging in a Source-Mask Optimization Scheme  
A process for use in configuring a projection optics lithography system comprising providing a determination of pupil amplitude and phase optimization for the projection optics, for use in...
US20140368805 DESIGN METHOD OF EXTREME ULTRAVIOLET LITHOGRAPHY PROJECTION OBJECTIVE  
A design method of extreme ultraviolet lithography projection objective comprises: determining the optical design parameters of the lithography projection objective, setting the projection...
US20140078479 IMAGE OPTIMIZATION USING PUPIL FILTERS IN PROJECTING PRINTING SYSTEMS WITH FIXED OR RESTRICTED ILLUMINATION ANGULAR DISTRIBUTION  
A pupil filter can be designed for any combination of an illumination lens and for various types of lithographic features. The pupil filter can be placed at the pupil plane of a projection optics...
US20100085555 In-Situ Cleaning of an Imprint Lithography Tool  
Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional...
US20080180646 IMPRINT REFERENCE TEMPLATE FOR MULTILAYER OR MULTIPATTERN REGISTRATION AND METHOD THEREFOR  
A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all...
US20100085554 ADAPTOR OF AN ALIGNER SYSTEM  
An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and...
US20140191372 SPACER ASSISTED PITCH DIVISION LITHOGRAPHY  
Spacer-based pitch division lithography techniques are disclosed that realize pitches with both variable line widths and variable space widths, using a single spacer deposition. The resulting...
US20120075603 PROCESS TUNING WITH POLARIZATION  
A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more...
US20150234297 Method of Calibrating a Reluctance Actuator Assembly, Reluctance Actuator and Lithographic Apparatus Comprising Such Reluctance Actuator  
A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the...
US20100053590 SYSTEM AND METHOD FOR MANUFACTURING A FLAT PANEL DISPLAY  
A method for manufacturing a flat panel display is presented. The method includes: transferring a first mask from a first mask loading/unloading part onto a main mask-stage by a first...
US20130314686 MASK SUPPORT FRAME AND MASK ASSEMBLY HAVING THE SAME  
A mask support frame for supporting a mask is provided. The frame is configured to secure both ends of a mask and apply tension to the mask in a first direction. The frame includes a frame main...
US20120081682 MASKLESS EXPOSURE APPARATUS AND METHOD TO DETERMINE EXPOSURE START POSITION AND ORIENTATION IN MASKLESS LITHOGRAPHY  
According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment...
US20120236273 TARGET SUPPLY UNIT  
A target supply unit may include: a reservoir for storing a target material; a heater provided inside the reservoir for heating the target material stored in the reservoir; a heater power supply...
US20090027637 Debris prevention system and lithographic apparatus  
A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic...
US20150077729 MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION  
A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an...
US20100096512 GUIDING DEVICE AND GUIDING ASSEMBLY FOR GUIDING CABLES AND/OR HOSES, AND A LITHOGRAPHIC APPARATUS  
A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional...
US20140374611 Continuous Generation of Extreme Ultraviolet Light  
The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots...
US20050151952 Photolithography system with variable shutter and method of using the same  
A photolithography system applied to the semiconductor process includes a light source, a shutter set, and a lens set. The shutter set has a variable opening area. The shutter set can include a...
US20060017910 Composite printing  
Systems and techniques for printing substrates. In one implementation, a method includes patterning a substrate with a substantially arbitrary arrangement of features by introducing irregularity...
US20140204358 MAGNETIC SENSOR CALIBRATION AND SERVO FOR PLANAR MOTOR STAGE  
A stage assembly for positioning a device includes: (i) a stage that retains the device; (ii) a base; (iii) a mover assembly that moves the stage along a first axis, along a second axis, and along...
US20120113404 Optimization Flows of Source, Mask and Projection Optics  
Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several...
US20080024751 Reticle holding member, reticle stage, exposure apparatus, projection-exposure method and device manufacturing method  
Reticle-holding members are disclosed that prevent a reticle from falling from the reticle stage of an exposure device, even in event of a power failure, and that maintain flatness of the reticle...
US20140247434 Lithographic Focus and Dose Measurement Using A 2-D Target  
In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for...
US20110249244 Lithographic Focus and Dose Measurement Using A 2-D Target  
In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for...
US20140078482 LITHOGRAPHIC PROJECTION OBJECTIVE  
Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or...
US20090046263 USING PHASE DIFFERENCE OF INTERFERENCE LITHOGRAPHY FOR RESOLUTION ENHANCEMENT  
Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference...
US20080062397 Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting Part  
A photolithography apparatus includes an optical illumination system. The optical illumination system includes a light source, an illumination system, a photomask, and a projection system. The...
US20140268090 CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, REGISTRATION, AND OVERLAY TECHNIQUES  
Methods for reducing reticle transmission differences and for optimizing layer placement for overlay in MTRs and CTRs are disclosed. Embodiments include providing a reticle having a prime area and...
US20090323040 TELECENTRICITY CORRECTOR FOR MICROLITHOGRAPHIC PROJECTION SYSTEM  
A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity...
US20090115986 Microlithography projection objective  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20130135598 METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS IN RESIST FEATURES  
A computer readable storage medium containing program instructions for treating a photoresist relief feature on a substrate having an initial line roughness and an initial critical dimension,...
US20090195768 Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark  
An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a...
US20120069311 Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography  
A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the...