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US20080151207 Magneto-optical photoresist  
A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment....
US20090059195 EXPOSURE DEVICE WITH MECHANISM FOR FORMING ALIGNMENT MARKS AND EXPOSURE PROCESS CONDUCTED BY THE SAME  
The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is...
US20090303454 EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM  
An exposure apparatus (10) for transferring a mask pattern (358) from a mask (12) to a substrate (14) includes a mask retainer (44), a substrate stage assembly (24), and an illumination system...
US20080106719 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same  
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of...
US20100315617 WAFER STAGE  
A wafer stage and a method of supporting a wafer for inspection. the wafer stage comprises a platform for supporting a wafer such that a backside of the wafer is suspended above a cavity of the...
US20120307224 SPECTRAL PURITY FILTER  
A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least...
US20110255069 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20130065160 REMOVABLE TRANSPARENT MEMBRANE FOR A PELLICLE  
According to one embodiment, a pellicle includes first and second frame members that are selectively removable from one another. The second frame member has an annular shape similar to and is...
US20100039634 EXPOSURE APPARATUS FOR DISPLAY AND EXPOSING METHOD USING THE SAME  
Provided is an exposure apparatus, including a plurality of exposure lamps and a luminance changing mechanism disposed between the exposure lamps and an exposure target. The luminance changing...
US20090128789 Projection exposure device, and exposure process performed by the device  
The present invention relates to provide a projection exposure device having a small volume, thereby not occupying a large installation space. The projection exposure device is configured to...
US20080137044 Systems and methods for thermally-induced aberration correction in immersion lithography  
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration...
US20080204688 Methodology For Implementing Enhanced Optical Lithography For Hole Patterning In Semiconductor Fabrication  
System and method for enhancing optical lithography methodology for hole patterning in semiconductor fabrication are described. In one embodiment, a photolithography system comprises an...
US20130162963 Lithographic Apparatus With a Deformation Sensor  
Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first...
US20090284721 RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS  
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by...
US20050195376 System for purifying purge gases  
A system for purifying purge gases for an optical system, in particular for a projection objective for microlithography for the fabrication of semiconductor components, wherein the optical system...
US20090091729 Lithography Systems and Methods of Manufacturing Using Thereof  
Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system...
US20110255063 Seamless Stitching of Patterns Formed by Interference Lithography  
This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that ach...
US20060055911 High resolution printer and a method for high resolution printing  
The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method includes: (i) determining multiple intermediate schemes such...
US20070035715 Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles  
Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention relate...
US20080206685 Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus  
An exposure method and exposure apparatus optimal for the formation of a fine pattern of an electronic device, such as a flat panel display. The exposure method and apparatus provides a high...
US20100097590 ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPHY WHICH ARE TOLERANT OF VARIATIONS IN DROP VOLUME AND DROP PLACEMENT  
Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be...
US20130057839 LITHOGRAPHY SYSTEM AND MANUFACTURING METHOD OF COMMODITIES  
The present invention provides a lithography system including an obtaining unit which obtains a transfer function describing a relationship between first vibration generated in one lithography...
US20080063982 Fluids and methods of forming thereof  
Fluids for use in immersion lithography systems and methods of forming thereof are disclosed. In accordance with a preferred embodiment, a fluid for immersion lithography includes a liquid and a...
US20130250262 ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY  
An illumination optical system for projection lithography has an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optical...
US20130120725 IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM  
An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium....
US20120133916 WAFER LEVEL OPTICAL ELEMENTS AND APPLICATIONS THEREOF  
In one aspect, the present invention provides a wafer level optical assembly comprising a first wafer level optical element, the first wafer level optical element comprising a first alignment...
US20120026474 Reticle Cooling in a Lithographic Apparatus  
An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an...
US20130128246 Lithography Method and Apparatus  
In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the...
US20100302520 CLUSTER E-BEAM LITHOGRAPHY SYSTEM  
A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where...
US20120075605 Source Polarization Optimization  
A lithographic simulation process is described, where each source point in a preselected group of source points at a pupil plane of an illumination source is represented by one or more variable...
US20070279605 Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the like  
Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a chamber,...
US20140063478 Focus Recipe Determination for a Lithographic Scanner  
The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. According to an embodiment, an optical signal including at least a first variable...
US20100002213 PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE  
A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is...
US20080018876 COLLECTOR FOR AN ILLUMINATION SYSTEM  
Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of...
US20090115110 Drop Pattern Generation for Imprint Lithography  
Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement...
US20120212722 Fast Illumination Simulator Based on a Calibrated Flexible Point Spread Function  
A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the...
US20090296055 LENS HEATING COMPENSATION SYSTEMS AND METHODS  
Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a...
US20090040483 MULTIPLE EXPOSURE TECHNIQUE USING OPC TO CORRECT DISTORTION  
Accurate ultrafine patterns are formed using a multiple exposure technique comprising implementing an OPC procedure to form an exposure reticle to compensate for distortion of an overlying resist...
US20070211232 Thermophoretic Techniques for Protecting Reticles from Contaminants  
Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a...
US20130156939 METHOD AND APPARATUS FOR ANALYZING AND/OR REPAIRING OF AN EUV MASK DEFECT  
The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least...
US20120154771 IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS  
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
US20110236809 METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM  
A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses...
US20110141445 ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY  
An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of...
US20080311529 IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS  
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
US20130201463 SYSTEM AND METHOD FOR LITHOGRAPHY WITH LEVELING SENSOR  
Disclosed is a lithography system. The lithography system includes a radiation source for providing radiation energy; a reticle stage configured to hold a reticle; an imaging lens module configured...
US20120320361 CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE  
Embodiments of the invention generally include a robot assembly comprising a robot operable to position a substrate at one or more points within a plane, and a motion assembly having a motor...
US20110181848 EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CONTAMINATION CAPTOR  
The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.
US20110051116 Substrate Matrix To Decouple Tool And Process Effects  
A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix,...
US20120127440 OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY  
An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent...
US20120154775 EUV Radiation Source and Method of Generating EUV Radiation  
An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at...