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US20090284721 |
RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by...
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US20050195376 |
System for purifying purge gases
A system for purifying purge gases for an optical system, in particular for a projection objective for microlithography for the fabrication of semiconductor components, wherein the optical system...
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US20090091729 |
Lithography Systems and Methods of Manufacturing Using Thereof
Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system...
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US20110255063 |
Seamless Stitching of Patterns Formed by Interference Lithography
This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that ach...
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US20060055911 |
High resolution printer and a method for high resolution printing
The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method includes: (i) determining multiple intermediate schemes such...
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US20070035715 |
Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles
Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention relate...
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US20080206685 |
Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
An exposure method and exposure apparatus optimal for the formation of a fine pattern of an electronic device, such as a flat panel display. The exposure method and apparatus provides a high...
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US20100097590 |
ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPHY WHICH ARE TOLERANT OF VARIATIONS IN DROP VOLUME AND DROP PLACEMENT
Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be...
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US20130057839 |
LITHOGRAPHY SYSTEM AND MANUFACTURING METHOD OF COMMODITIES
The present invention provides a lithography system including an obtaining unit which obtains a transfer function describing a relationship between first vibration generated in one lithography...
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US20080063982 |
Fluids and methods of forming thereof
Fluids for use in immersion lithography systems and methods of forming thereof are disclosed. In accordance with a preferred embodiment, a fluid for immersion lithography includes a liquid and a...
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US20130120725 |
IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM
An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium....
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US20120133916 |
WAFER LEVEL OPTICAL ELEMENTS AND APPLICATIONS THEREOF
In one aspect, the present invention provides a wafer level optical assembly comprising a first wafer level optical element, the first wafer level optical element comprising a first alignment...
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US20120026474 |
Reticle Cooling in a Lithographic Apparatus
An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an...
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US20100302520 |
CLUSTER E-BEAM LITHOGRAPHY SYSTEM
A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where...
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US20120075605 |
Source Polarization Optimization
A lithographic simulation process is described, where each source point in a preselected group of source points at a pupil plane of an illumination source is represented by one or more variable...
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US20070279605 |
Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the like
Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a chamber,...
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US20100002213 |
PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE
A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is...
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US20080018876 |
COLLECTOR FOR AN ILLUMINATION SYSTEM
Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of...
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US20090115110 |
Drop Pattern Generation for Imprint Lithography
Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement...
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US20120212722 |
Fast Illumination Simulator Based on a Calibrated Flexible Point Spread Function
A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the...
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US20090296055 |
LENS HEATING COMPENSATION SYSTEMS AND METHODS
Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a...
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US20090040483 |
MULTIPLE EXPOSURE TECHNIQUE USING OPC TO CORRECT DISTORTION
Accurate ultrafine patterns are formed using a multiple exposure technique comprising implementing an OPC procedure to form an exposure reticle to compensate for distortion of an overlying resist...
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US20070211232 |
Thermophoretic Techniques for Protecting Reticles from Contaminants
Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a...
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US20120154771 |
IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
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US20110236809 |
METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM
A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses...
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US20110141445 |
ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY
An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of...
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US20080311529 |
IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
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US20120320361 |
CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE
Embodiments of the invention generally include a robot assembly comprising a robot operable to position a substrate at one or more points within a plane, and a motion assembly having a motor...
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US20110181848 |
EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CONTAMINATION CAPTOR
The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.
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US20110051116 |
Substrate Matrix To Decouple Tool And Process Effects
A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix,...
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US20120127440 |
OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY
An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent...
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US20120154775 |
EUV Radiation Source and Method of Generating EUV Radiation
An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at...
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US20110014577 |
PELLICLE INSPECTION DEVICE, EXPOSURE APPARATUS USING SAME, AND DEVICE MANUFACTURING METHOD
The pellicle inspection device of the present invention is a device that detects damage to a pellicle film disposed on an original. The pellicle inspection device includes a measuring unit...
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US20090021711 |
METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM
A method of inspecting an exposure system uses a mask pattern including a first and a second mask pattern, the first pattern being formed in a line-and-space of a first pitch, the second pattern...
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US20050153216 |
Lithography mask and lithography system for direction-dependent exposure
Lithography mask having a structure for the fabrication of semiconductor components, in particular memory components, for a direction-dependent exposure device, featuring at least one auxiliary...
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US20070146681 |
Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle...
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US20090122281 |
SILICA GLASS CONTAINING TIO2 AND PROCESS FOR ITS PRODUCTION
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 10...
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US20070279611 |
Reflective loop system producing incoherent radiation
A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or...
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US20080068579 |
APERTURE UNIT AND EXPOSURE SYSTEM INCLUDING THE SAME, AND METHOD FOR REPLACING APERTURES OF THE APERTURE UNIT
Provided are an aperture unit, an exposure system including the aperture unit, and a method for replacing an aperture of the aperture unit. The aperture unit rotates a revolver on which a plurality...
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US20100060878 |
EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE
A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is...
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US20120281189 |
Evaporative thermal management of grazing incidence collectors for EUV lithography
Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a...
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US20110013170 |
DEVICE FOR TREATING SHEET-LIKE SUBSTRATES WITH LIGHT
A device for treating sheet-like substrates with light is made for a suction table, which includes a circulating suction strip for transporting the sheet-like substrates, which suction strip forms...
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US20070279612 |
LIGHT MIXING DEVICE, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
The disclosure relates to a light mixing device, comprising a first arrangement composed of first beam-deflecting elements and a second arrangement composed of second beam-deflecting elements, each...
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US20130003036 |
PHOTO MASK UNIT COMPRISING A PHOTOMASK AND A PELLICLE AND A METHOD FOR MANUFACTURING THE SAME
It is an object of the present invention to provide a photomask unit suitable for forming a microscopic pattern of 32 nm or smaller on a photoresist film using the EUV exposure technique and being...
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US20100085555 |
In-Situ Cleaning of an Imprint Lithography Tool
Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy...
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US20080180646 |
IMPRINT REFERENCE TEMPLATE FOR MULTILAYER OR MULTIPATTERN REGISTRATION AND METHOD THEREFOR
A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all...
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US20100085554 |
ADAPTOR OF AN ALIGNER SYSTEM
An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and the...
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US20120075603 |
PROCESS TUNING WITH POLARIZATION
A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more...
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US20100053590 |
SYSTEM AND METHOD FOR MANUFACTURING A FLAT PANEL DISPLAY
A method for manufacturing a flat panel display is presented. The method includes: transferring a first mask from a first mask loading/unloading part onto a main mask-stage by a first...
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US20120081682 |
MASKLESS EXPOSURE APPARATUS AND METHOD TO DETERMINE EXPOSURE START POSITION AND ORIENTATION IN MASKLESS LITHOGRAPHY
According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment...
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