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US20110235016 PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK  
A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive...
US20090059193 Image production apparatus  
Disclosed herein is an image production apparatus, including a light source; an optical modulation apparatus of the one-dimensional type; and a projection optical system including a scanning...
US20140049761 DESIGN RULES FOR REDUCING THE SENSITIVITY OF FRINGE PROJECTION AUTOFOCUS TO AIR TEMPERATURE CHANGES  
Fringe projection autofocus systems are provided with variable pitch diffraction gratings or multiple diffraction gratings so that a reference beam and a measurement beam propagate along a common...
US20150109590 SCANNER ROUTING METHOD FOR PARTICLE REMOVAL  
A scanner routing method for particle removal is disclosed. A dummy wafer coated with a viscosity builder is provided. The dummy wafer is moved, shot by shot, with an immersion scanner. The said...
US20090153814 SELF-CLEANING SCAN HEAD ASSEMBLY  
A scan head assembly for use in an imaging device for scanning media that uses fluid particles from the atmosphere for cooling an optical system, cleaning existing contamination particles in the...
US20120244477 PELLICLE FOR LITHOGRAPHY  
The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic...
US20120107743 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20110261329 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS  
The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system....
US20150192860 ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY  
An illumination optical unit for EUV projection lithography has a first and second facet mirrors, each with a plurality of reflecting facets on a support. The facets of the first facet mirror can...
US20110032502 POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD  
Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion...
US20150098069 Extreme Ultraviolet Lithography Process and Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states. A reflection coefficient is r1, r2 and r3,...
US20140141536 Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change  
A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the...
US20150220005 Real-Time Reticle Curvature Sensing  
A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle...
US20120320348 REFLECTIVE MASK FOR EUV LITHOGRAPHY  
To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate...
US20120069316 METHODS FOR LIMITING COUNTER-MASS TRIM-MOTOR FORCE AND STAGE ASSEMBLIES INCORPORATING SAME  
An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a...
US20140192339 COLLECTOR  
A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon...
US20080266534 PHOTOMASK HAZE REDUCTION VIA VENTILATION  
Where a framed pellicle is mounted on a photomask, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second...
US20050275823 PHOTOSENSITIVE MEDIA CASSETTE FOR AN IMAGING DEVICE  
A cassette arrangement includes a light-tight, moisture proof pouch that is adapted to hold a stack of photosensitive sheets such as microencapsulated media and load the sheets into an...
US20110122385 Homogenizer  
A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The...
US20140368803 ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY, AND OPTICAL SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT  
An illumination optical unit for EUV projection lithography guides illumination light to an illumination field, in which a lithography mask can be arranged. A facet mirror with a plurality of...
US20100328638 LED LIGHT SOURCE, ITS MANUFACTURING METHOD, AND LED-BASED PHOTOLITHOGRAPHY APPARATUS AND METHOD  
This invention provides a structurally-simple LED light source that is capable of preventing temperature variations among its multiple LED elements arranged densely on its LED-mounting substrate...
US20090073403 Methods of characterizing similarity or consistency in a set of entities  
A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining...
US20120044473 OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY  
To reduce deformations which may be caused by a functional coating on a substrate in an optical element for UV or EUV lithography, an optical element is suggested comprising a functional coating...
US20130250260 PELLICLES FOR USE DURING EUV PHOTOLITHOGRAPHY PROCESSES  
Disclosed herein are various pellicles for use during extreme ultraviolet (EUV) photolithography processes. An EUV radiation device disclosed herein includes a reticle, a substrate support stage,...
US20110019173 Diffraction Elements for Alignment Targets  
A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered...
US20080285003 Linear motor driven automatic reticle blind  
A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle...
US20110080566 METHOD FOR REPLICATING PRODUCTION OF 3D PARALLAX BARRIER  
A method for replicating production of a 3D parallax barrier is capable of transfer-printing a 3D parallax barrier pattern on a planar transparent substrate mainly with a glass photo mask having...
US20090231568 METHOD OF MEASURING WAVEFRONT ERROR, METHOD OF CORRECTING WAVEFRONT ERROR, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE  
A method of measuring a wavefront error of an exposure light that occurs when the exposure light passes through an optical system that is used in an exposure apparatus is proposed. The method...
US20090296064 ILLUMINATION SYSTEM FOR SIZING FOCUSED SPOTS OF A PATTERNING SYSTEM FOR MASKLESS LITHOGRAPHY  
An optical system for producing a pattern of focused spots, such as a maskless lithographic projection system, includes an illuminator, a pattern generator, and an imager. The illuminator includes...
US20140160455 PELLICLE FOR RETICLE AND MULTILAYER MIRROR  
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
US20150022798 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY  
A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster...
US20080212045 OPTICAL SYSTEM WITH AT LEAST A SEMICONDUCTOR LIGHT SOURCE AND A METHOD FOR REMOVING CONTAMINATIONS AND/OR HEATING THE SYSTEMS  
A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light...
US20120320349 PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF OVERLAY ERROR CORRECTION  
Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a...
US20140268075 SOURCE, TARGET AND MASK OPTIMIZATION BY INCORPORATING COUNTOUR BASED ASSESSMENTS AND INTEGRATION OVER PROCESS VARIATIONS  
Methods and systems for determining a source shape, a mask shape and a target shape for a lithography process are disclosed. One such method includes receiving source, mask and target constraints...
US20150138524 Extreme Ultraviolet Lithography Process and Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes a mask having reflective phase-shift-grating-blocks (PhSGBs). The system also includes an illumination to...
US20080224251 Optimal Rasterization for Maskless Lithography  
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern...
US20080148978 Assembly for blocking a beam of radiation and method of blocking a beam of radiation  
An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an...
US20050174548 Finishing apparatus for photographic laboratories  
A finishing apparatus for photographic laboratories having at least two elements for advancing separate strips of photographic paper, carrying images printed thereon, towards two corresponding...
US20070148561 Exposure equipment having auxiliary photo mask and exposure method using the same  
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart...
US20140268086 Extreme Ultraviolet Lithography Process and Mask  
The present disclosure is directed towards lithography processes. In one embodiment, a patterned mask is provided. An information of a position of diffraction light (PDL) on a pupil plane of a...
US20050221238 Use of a reticle absorber material in reducing aberrations  
A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a...
US20080079927 Holder for carrying a photolithography mask in a flattened condition  
A holder is described for carrying a photolithography mask in a flattened condition. The holder may include a mask chuck and may be able to flatten a mask for use in photolithography. In one...
US20060141209 Pellicle for photolithography and pellicle frame  
There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface...
US20090233189 DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE  
A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution,...
US20130201468 LITHOGRAPHY METHOD WITH COMBINED OPTIMIZATION OF RADIATED ENERGY AND DESIGN GEOMETRY  
A lithography method for a pattern to be etched on a support, notably to a method using electron radiation with direct writing on the support. Hitherto, the methods for correcting the proximity...
US20140218714 SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE  
A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber...
US20150212434 MONOLITHIC EUV TRANSPARENT MEMBRANE AND SUPPORT MESH AND METHOD OF MANUFACTURING SAME  
The current application teaches embodiments of an EUV transparent support mesh and methods of manufacturing the same
US20130089813 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the...
US20080024752 Contact printing oxide-based electrically active micro-features  
Contact printing can be used to form electrically active micro-features on a substrate. An ink formulation containing an oxide precursor is used to form the micro-features, which are heat cured to...
US20120092640 Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage  
Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a...