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US20080309906 Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System  
A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the...
US20090225297 PROJECTION EXPOSURE APPARATUS AND OPTICAL SYSTEM  
The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography,...
US20090109416 DISPERSING IMMERSION LIQUID FOR HIGH RESOLUTION IMAGING AND LITHOGRAPHY  
Methods and apparatus are described for delivering index-matching immersion liquid in high numerical-aperture optical microscopy and lithography. An array of immersion liquid droplets is delivered...
US20150055106 Radiation Source and Lithographic Apparatus  
The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so...
US20140300876 OPTICAL ARRANGEMENT, EUV LITHOGRAPHY APPARATUS AND METHOD FOR CONFIGURING AN OPTICAL ARRANGEMENT  
The invention relates to an optical arrangement comprising: at least one optical element comprising an optical surface and a substrate, wherein the substrate is formed from a material whose...
US20130088702 ASSEMBLY AND A METHOD FOR LIFTING A MODULE OF A LITHOGRAPHY SYSTEM IN A VERTICAL DIRECTION AND A LITHOGRAPHY SYSTEM COMPRISING SUCH ASSEMBLY  
An assembly and a method for lifting a module of a lithography system from its support and a lithography system including such device are provided. The assembly includes a body and a track. The...
US20090034030 MULTI-FUNTIONAL DEVICE HAVING SCANNER MODULE AND IMAGE SCANNING APPARATUS EMPLOYING THE SCANNER MOUDLE  
A multi-functional device comprising an image forming apparatus to form a printing image and a scanner module to scan an image in a main scanning direction. The scanner module includes an...
US20150153652 METHOD FOR ADJUSTING AN ILLUMINATION SETTING  
Method for setting an illumination setting in an illumination optical unit comprising at least one controllable correction device, which includes a multiplicity of adjustable correction elements...
US20090291374 Exposure aligning method and exposure apparatus  
In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second...
US20150116690 BIT PATTERNED MEDIA TEMPLATE INCLUDING ALIGNMENT MARK AND METHOD OF USING SAME  
A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a...
US20070268476 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES  
Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a...
US20110181857 OPTICAL ASSEMBLY  
An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element,...
US20080079918 AUTOMATIC DYNAMIC BASELINE CREATION AND ADJUSTMENT  
In a plasma processing system, a method for dynamically establishing a baseline is provided. The method includes processing a first substrate. The method also includes collecting a first signal...
US20100079740 IMAGE FORMING DEVICE PROVIDED WITH SENSOR  
An image forming device has a conveying member, a light source, a photo-sensor, a shutter member, a shutter driving unit, a reflecting member and a judging member. The shutter member located...
US20090097004 Lithography Apparatus, Masks for Non-Telecentric Exposure and Methods of Manufacturing Integrated Circuits  
A lithography apparatus includes a first optical system configured to irradiate a mask with a non-telecentric illumination and a second optical system configured to guide radiation reflected off...
US20050041226 Method and device for exposure control, method and device for exposure, and method of manufacture of device  
A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure...
US20080158665 CATADIOPTRIC PROJECTION OBJECTIVE WITH TILTED DEFLECTING MIRRORS, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD, AND MIRROR  
In general, in one aspect, the invention features a catadioptric projection objective having a plurality of optical elements arranged along an optical axis to image a pattern arranged in an object...
US20070081137 Exposure method  
An exposure method is suitable for an off-axis illumination system. According to the method, a photomask having a first pattern and a second pattern is provided, and an analysis on the photomask...
US20120236272 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT  
The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is...
US20080024746 MICROLITHOGRAPHY PROJECTION SYSTEM WITH AN ACCESSIBLE DIAPHRAGM OR APERTURE STOP  
The invention relates to a microlithography projection lens for wavelengths≦248 nm ≦, preferably ≦193 mm, in particular EUV lithography for wavelengths ranging from 1-30 nm for imaging an object...
US20060279718 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly  
A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to...
US20080002170 Holding Device for an Optical Element in an Objective  
A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged...
US20060008711 Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method  
A mirror for use in an exposure system of this invention includes a reflection layer for reflecting EUV formed on a mirror substrate and an absorption layer formed on the reflection layer and made...
US20080038675 Exposure Method, Exposure Apparatus, Exposure System and Device Manufacturing Method  
When exposing a same resist layer of a wafer a plurality of times, at least in one exposure of the plurality of exposures, by filling a space between a projection optical system, which projects an...
US20080186467 Optical imaging device  
There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109),...
US20080106711 Projection Lens System of a Microlithographic Projection Exposure Installation  
A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective...
US20140313498 POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A polarization-influencing optical arrangement comprises a first retardation element and a second retardation element.
US20090257040 OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES  
The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light...
US20090262324 ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS  
A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The...
US20150153651 METHODS AND SYSTEMS FOR PATTERN DESIGN WITH TAILORED RESPONSE TO WAVEFRONT ABERRATION  
The present invention relates to methods and systems for designing gauge patterns that are extremely sensitive to parameter variation, and thus robust against random and repetitive measurement...
US20130314678 DEVICE AND METHOD FOR STEREOSCOPIC IMAGE PRINTING  
A method for stereoscopic image printing according to one aspect of the presently disclosed subject matter includes acquiring information on distribution of parallax of a multi-viewpoint image...
US20100103395 FLY'S EYE INTEGRATOR, ILLUMINATOR, LITHOGRAPHIC APPARATUS AND METHOD  
A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye...
US20150024306 MASK OVERLAY CONTROL  
Some embodiments of the present disclosure relate to a method of patterning a workpiece with a mask, wherein a scale factor between a geometry of the mask and a corresponding target shape of the...
US20120147351 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER  
A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ<20 nm). The filter comprises a grid-like structure comprising a plurality of microscopic apertures...
US20060274297 Photo detector unit and exposure apparatus having the same  
An exposure apparatus includes a projection optical system configured to project a reticle pattern onto a plate by using a light from a light source, a liquid being filled in a space between the...
US20100053580 COMPUTER READABLE MEDIUM AND EXPOSURE METHOD  
A computer readable medium containing computer-executable instructions which cause a computer to execute processing steps that calculate a light intensity distribution formed on an image plane of...
US20080186461 Liquid sealing unit and immersion photolithography apparatus having the same  
A liquid sealing unit is provided. The liquid sealing unit includes a storage vessel for containing a liquid and having an optical nozzle hole through which light can be transmitted, and a sealing...
US20140146301 EXPOSURE MACHINE  
Disclosed is exposure machine, comprising: a loading frame, for placing an object to be exposed; a light source device, located at one side of a plane where the loading frame is positioned,...
US20080030707 Lighting Optical Device, Regulation Method for Lighting Optical Device, Exposure System, and Exposure Method  
An illumination optical apparatus is able to adjust each of pupil luminance distributions at respective points on a surface to be illuminated to being almost uniform, while maintaining or...
US20090147232 MARKER STRUCTURE AND METHOD OF FORMING THE SAME  
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting...
US20140211185 Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method  
For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth...
US20080123074 Projection Optical System, Exposure Equipment and Exposure Method  
A projection optical system is a system with good imaging performance based on well-balanced compensation for aberration associated with image height and aberration associated with numerical...
US20080129976 SHUTTER BLADE APPARATUS, SHUTTER UNIT, IMAGE PICKUP APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE  
A shutter blade apparatus includes a shutter blade; a first pushing member including two first pushing portions configured to push a first surface of the shutter blade; and a second pushing member...
US20140312500 COMBINING CUT MASK LITHOGRAPHY AND CONVENTIONAL LITHOGRAPHY TO ACHIEVE SUB-THRESHOLD PATTERN FEATURES  
Features are fabricated on a semiconductor chip. The features are smaller than the threshold of the lithography used to create the chip. A method includes patterning a first portion of a feature...
US20070229793 Filtered device container assembly with shield for a reticle  
A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the...
US20100110411 ANTI-PIRACY CODING TECHNIQUE  
An internegative duplicate (12), as used to make motion picture release prints, undergoes marking by exposing at least one area within at least one frame to provide a decodable pattern specific to...
US20110229827 Method and Lithography Device with a Mask Reflecting Light  
A method and lithography device addressing the problem in projection optics of pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to...
US20120050705 PHOTOLITHOGRAPHY SYSTEM  
A photolithography system is equipped with a light modulator that comprises a plurality of regularly arrayed light modulation elements; a scanning mechanism configured to move an exposure area...
US20120293785 OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS  
An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element...
US20080143988 System for calculating transmission utility factor value of photo energy for exposure and method for calculating transmission utility factor value of photo energy utilizing the calculation system  
Disclosed is a system for calculating transmission utility factor value of photo energy for exposure and a method for calculating transmission utility factor value of photo energy utilizing the...