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US20070296943 Optical apparatus  
An optical apparatus is disclosed that has a convex mirror and a concave mirror with an aperture, wherein, in use, radiation from a radiation emitter passes through the aperture and is incident...
US20140071422 DUAL WAFER STAGE SWITCHING SYSTEM FOR A LITHOGRAPHY MACHINE  
Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage...
US20110317136 Inspection Apparatus Employing Wide Angle Objective Lens With Optical Window  
An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first...
US20110205505 LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION  
Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line...
US20140043595 EUV collector system with enhanced EUV radiation collection  
A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator....
US20110242515 EUV collector system with enhanced EUV radiation collection  
A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator....
US20140226139 Novel Lithographic Method with the Capability of Spectrum Engineering to Create Complex Microstructures  
The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying...
US20130010274 MASKS FOR USE IN LITHOGRAPHY INCLUDING IMAGE REVERSAL ASSIST FEATURES, LITHOGRAPHY SYSTEMS INCLUDING SUCH MASKS, AND METHODS OF FORMING SUCH MASKS  
Microlithography masks are disclosed, such as those that include one or more image reversal assist features disposed between at least two primary mask features. The one or more image reversal...
US20090207387 FIBER OPTIC IMAGING APPARATUS  
A fiber optic imaging apparatus includes a light source (12); at least one optical fiber (47) for transmitting light from the light source; a mechanical assembly for supporting at least one optical...
US20080129969 System and Method For Improving Immersion Scanner Overlay Performance  
System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising...
US20070296937 ILLUMINATION LIGHT IN IMMERSION LITHOGRAPHY STEPPER FOR PARTICLE OR BUBBLE DETECTION  
Embodiments of the invention present a system, method, etc. for illumination light in an immersion lithography stepper for particle or bubble detection. More specifically, embodiments herein...
US20080117398 IMMERSION EXPOSURE APPARATUS  
A scanning immersion exposure apparatus includes a stage capable of delivering an area in contact with liquid to another member. The stage has a delivery portion configured to enable the area to...
US20120249991 PLANAR MOTOR AND LITHOGRAPHIC APPARATUS COMPRISING SUCH PLANAR MOTOR  
A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover...
US20110063598 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS  
An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter...
US20100073646 METHOD FOR THE PRODUCTION OF A MULTI-COLOUR VOLUME HOLOGRAM, A DOCUMENT WITH SUCH A HOLOGRAM, AND A VOLUME HOLOGRAM MASTER  
The invention relates to a method for the production of a multicolor hologram by means of a capture beam, wherein the utilized capture beam (6) has a plurality of beam bundles of the same...
US20100165314 MEMS DEVICE WITH CONTROLLED GAS SPACE CHEMISTRY  
A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the...
US20070146662 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device  
An amount is flare is measured by a method including steps of applying a photosensitive material to a substrate; exposing a part of the photosensitive material using a mask including a transmitting...
US20120040280 Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography  
A mechanism is provided for simultaneous optical proximity correction (OPC) and decomposition for double exposure lithography. The mechanism begins with two masks that are equal to each other and...
US20060262289 Zoomable projection apparatus  
A zoomable projection apparatus including a projection system, an optical zoom adjusting device and a zoom ratio readout device is provided. The projection system at least includes a zoom lens set...
US20080309008 Document Feeder and Image Forming Device  
A document feeder configured to feed a document in a first direction includes a tray configured to load a document or a set of documents on a loading surface thereof, first and second contact...
US20090168035 Exposure method and exposure apparatus for photosensitive film  
An exposure apparatus for a photosensitive film includes: light-emitting diodes for generating rays to expose a photosensitive film; a light shield positioned between the light-emitting diodes to...
US20050062947 Near-field exposure apparatus  
A near-field exposure apparatus includes an pressure adjusting vessel in which pressure is adjustable, mask supporting means for supporting an elastically deformable exposure mask to the pressure...
US20100073655 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which...
US20100245790 METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERSION LITHOGRAPHY TOOL  
In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a...
US20110212403 METHOD AND APPARATUS FOR ENHANCED DIPOLE LITHOGRAPHY  
Provided is a lithography system that includes a source for providing energy, an imaging system configured to direct the energy onto a substrate to form an image thereon, and a diffractive optical...
US20130120729 INSPECTION METHOD FOR IMPRINT LITHOGRAPHY AND APPARATUS THEREFOR  
A method is disclosed for inspecting a device imprint lithography template to detect defect particles of imprintable medium remaining on the patterned imprinting surface after an earlier imprint...
US20090141356 OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME  
An optical element includes plural multilayer mirrors, wherein the multilayer mirrors are renewable.
US20140204353 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
Provided is an exposure method that includes setting a first exposure condition so as to calculate a coefficient for predicting the fluctuation in the imaging characteristics of the projection...
US20110128518 REFLECTIVE RETICLE CHUCK, REFLECTIVE ILLUMINATION SYSTEM INCLUDING THE SAME, METHOD OF CONTROLLING FLATNESS OF REFLECTIVE RETICLE USING THE CHUCK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE CHUCK  
Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of...
US20140333913 MICROLITHOGRAPHY PROJECTION OBJECTIVE  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20140293256 MICROLITHOGRAPHY PROJECTION OBJECTIVE  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20130128243 TEMPERATURE BALANCING DEVICE OF PROJECTION OBJECTIVE OF LITHOGRAPHY MACHINE AND METHOD THEREOF  
The invention provides a temperature balancing device for a projection objective of a lithography machine. The device comprises at least one temperature sensor, at least one heat-absorbing...
US20090117491 RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES  
Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance...
US20080291422 Light Attenuating Filter for Correcting Field Dependent Ellipticity and Uniformity  
Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus...
US20090086179 Radiometric Kirk Test  
Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present...
US20150022795 POWER SUPPLY FOR A DISCHARGE PRODUCED PLASMA EUV SOURCE  
A power supply for providing HV power to a lithography illumination source comprising a HV power source arranged to provide the HV power, a HV power transmission line arranged to transmit the HV...
US20110310368 METHOD AND SYSTEM FOR THERMALLY CONDITIONING AN OPTICAL ELEMENT  
A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between...
US20070146680 Exposure apparatus, exposure method, and exposure mask  
Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure...
US20120092638 Method Of Aligning A Wafer Stage And Apparatus For Performing The Same  
In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the...
US20050254035 Multi-photon lithography  
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while...
US20110043779 GRAZING INCIDENCE COLLECTOR OPTICAL SYSTEMS FOR EUV AND X-RAY APPLICATIONS  
A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical...
US20140362366 METHOD AND SYSTEM FOR GAS FLOW MITIGATION OF MOLECULAR CONTAMINATION OF OPTICS  
A computer-implemented method for determining an optimized purge gas flow in a semi-conductor inspection metrology or lithography apparatus, comprising receiving a permissible contaminant mole...
US20080231822 Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool  
An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liq...
US20120105817 LEAF SPRING, STAGE SYSTEM, AND LITHOGRAPHIC APPARATUS  
A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein...
US20100033705 Multi Nozzle Proximity Sensor Employing Common Sensing and Nozzle Shaping  
A fluid proximity sensor having one or more measurement nozzles and a reference nozzle coupled to a common chamber. Diaphragms coupled to the measurement nozzles can be sensed by optical,...
US20090009735 REFLECTIVE, REFRACTIVE AND PROJECTING OPTICAL SYSTEM; REFLECTIVE, REFRACTIVE AND PROJECTING DEVICE; SCANNING EXPOSURE DEVICE; AND METHOD OF MANUFACTURING MICRO DEVICE  
A scanning exposure apparatus of the present invention is one for transferring a pattern of a first object onto a second object while projecting an image of the first object placed on a first...
US20090141257 Illumination optical apparatus, exposure apparatus, and method for producing device  
A reflection type illumination optical apparatus, which guides an exposure light to a reticle surface via a curved mirror, a concave mirror, etc. includes a vacuum chamber which accommodates the...
US20080304028 Lithographic apparatus and radiation system  
A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for...
US20100161099 Optimization Method and a Lithographic Cell  
Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then...
US20090316238 OPTICAL SECURITY DEVICE  
A holographic effect generating structure (HEGS), either stand alone or integrated with a security diffractive image, generates a holographic optically varying image by a process of diffraction of...