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US20110128518 REFLECTIVE RETICLE CHUCK, REFLECTIVE ILLUMINATION SYSTEM INCLUDING THE SAME, METHOD OF CONTROLLING FLATNESS OF REFLECTIVE RETICLE USING THE CHUCK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE CHUCK  
Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of...
US20140293256 MICROLITHOGRAPHY PROJECTION OBJECTIVE  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20130128243 TEMPERATURE BALANCING DEVICE OF PROJECTION OBJECTIVE OF LITHOGRAPHY MACHINE AND METHOD THEREOF  
The invention provides a temperature balancing device for a projection objective of a lithography machine. The device comprises at least one temperature sensor, at least one heat-absorbing...
US20090117491 RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES  
Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance...
US20080291422 Light Attenuating Filter for Correcting Field Dependent Ellipticity and Uniformity  
Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus...
US20090086179 Radiometric Kirk Test  
Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present...
US20110310368 METHOD AND SYSTEM FOR THERMALLY CONDITIONING AN OPTICAL ELEMENT  
A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between...
US20070146680 Exposure apparatus, exposure method, and exposure mask  
Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure...
US20120092638 Method Of Aligning A Wafer Stage And Apparatus For Performing The Same  
In a method of aligning a wafer stage, the wafer stage may be moved in an X-axis direction. A first coordinate of the wafer stage may be measured from a first measurement position inclined to the...
US20050254035 Multi-photon lithography  
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while...
US20110043779 GRAZING INCIDENCE COLLECTOR OPTICAL SYSTEMS FOR EUV AND X-RAY APPLICATIONS  
A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical...
US20080231822 Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool  
An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liq...
US20120105817 LEAF SPRING, STAGE SYSTEM, AND LITHOGRAPHIC APPARATUS  
A leaf spring to be mounted between two objects, the leaf spring configured to have a high stiffness in two orthogonal directions, and a relative low stiffness in other degrees of freedom, wherein...
US20100033705 Multi Nozzle Proximity Sensor Employing Common Sensing and Nozzle Shaping  
A fluid proximity sensor having one or more measurement nozzles and a reference nozzle coupled to a common chamber. Diaphragms coupled to the measurement nozzles can be sensed by optical,...
US20090009735 REFLECTIVE, REFRACTIVE AND PROJECTING OPTICAL SYSTEM; REFLECTIVE, REFRACTIVE AND PROJECTING DEVICE; SCANNING EXPOSURE DEVICE; AND METHOD OF MANUFACTURING MICRO DEVICE  
A scanning exposure apparatus of the present invention is one for transferring a pattern of a first object onto a second object while projecting an image of the first object placed on a first...
US20090141257 Illumination optical apparatus, exposure apparatus, and method for producing device  
A reflection type illumination optical apparatus, which guides an exposure light to a reticle surface via a curved mirror, a concave mirror, etc. includes a vacuum chamber which accommodates the...
US20080304028 Lithographic apparatus and radiation system  
A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for...
US20100161099 Optimization Method and a Lithographic Cell  
Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then...
US20090316238 OPTICAL SECURITY DEVICE  
A holographic effect generating structure (HEGS), either stand alone or integrated with a security diffractive image, generates a holographic optically varying image by a process of diffraction of...
US20090170041 Immersion lithography  
A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The...
US20060170902 Apparatus and method for a loading reticle  
An apparatus and method to load a reticle, to check whether the reticle is loaded in a flat manner and to flatten the reticle when the reticle is not loaded in a flat manner. In one embodiment, the...
US20090225294 RETICLE FOR PROJECTION EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME  
In order to provide a reticle capable of increasing the number of chips per wafer and of enabling highly accurate alignment, and an exposure method using the reticle, a first alignment mark...
US20080273189 Sheet Body Holding Mechanism and Lithography Apparatus Using Same  
Highly accurate lithography is performed by maintaining planarity without generating a suction mark on a sheet body. Since a counterbore for storing the head of a screw member for fixing a suction...
US20100079767 DISPLACEMENT MEASUREMENT APPARATUS  
A displacement measurement apparatus includes a first diffraction grating transmitting light from a light source and producing diffracted beams including first to third diffracted beams output in...
US20060134535 Lensed fiber array for sub-micron optical lithography patterning  
In accordance with various embodiments, there is an exposure system for writing a pattern on a photosensitive material. The exposure system can include a waveguide array and a light modulator. The...
US20080198349 Film Printing Head Having Hybrid Lenses  
There are provided film printing systems and methods for printing images on one of two different width film stocks. A method for printing images on one of two different width film stocks includes...
US20070247605 Optical element for correction of aberration, and a lithographic apparatus comprising same  
An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a...
US20090280441 EXPOSURE METHOD, EXPOSURE DEVICE, AND MICRO DEVICE MANUFACTURING METHOD  
An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask (8) which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by...
US20080174754 PHOTO-MASKS AND METHODS OF FABRICATING PERIODIC OPTICAL STRUCTURES  
Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also...
US20090311631 NEAR-FIELD EXPOSURE APPARATUS AND NEAR-FIELD EXPOSURE METHOD  
A near-field exposure apparatus includes a near-field exposure mask, a mechanism to place a substrate to be exposed, opposed to the near-field exposure mask, a mechanism to perform relative...
US20130335718 METHOD FOR MEASURING DISTORTION OF PROJECTION OBJECTIVE  
A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two...
US20060209289 Exposure apparatus, and device manufacturing method  
Disclosed is an exposure apparatus for exposing a substrate through a reticle, wherein the apparatus includes a clamp having a circumferential protrusion and a pin disposed inside the...
US20070019173 Photolithography arrangement  
A photolithography arrangement including an illumination source, which emits radiation with a predetermined wavelength directed towards a substrate, a projection mask for modulating the radiation...
US20110262870 PURGE RING WITH SPLIT BAFFLES FOR PHOTONIC THERMAL PROCESSING SYSTEMS  
A purge ring for a photonic temperature processing system includes a first layer, a second layer, and a third layer. The first layer, the second layer and the third layer define an inner region....
US20130208252 FLARE MEASURING METHOD, REFLECTIVE MASK, AND EXPOSURE APPARATUS  
According to a flare measuring method in an embodiment, a reflective mask, in which one reflective coordinate in a slit direction in a mask surface is determined when one scanning coordinate is...
US20070026325 Substrate distortion measurement  
A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the...
US20100033698 Full Wafer Width Scanning Using Steps and Scan System  
A system and method are provided for writing a pattern onto a substrate. A patterned beam of radiation is produced using a reticle and projected onto a substrate to expose the pattern. Reticle and...
US20120120380 LOW AND HIGH PRESSURE PROXIMITY SENSORS  
A fluid proximity sensor for surface measurements having a measurement chamber (210) with a measurement nozzle (205), a reference chamber (220) with a reference nozzle (225), and a diaphragm (215)...
US20080123067 Movable Body System, Exposure Apparatus, And Device Manufacturing Method  
Stopper mechanisms keep a wafer table and a measurement table from moving closer than a predetermined distance, and the blocking by the stopper mechanisms can also be released by a drive mechanism....
US20060204861 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination  
A mask for enhancing the depth of focus of an optical imaging system is designed by optimizing an optical property (transmittance or reflectance) of the mask relative to the intensity distribution...
US20060023197 Method and system for automated production of autostereoscopic and animated prints and transparencies from digital and non-digital media  
A method and system for automated production of stereoscopic and animated images and hardcopies can utilize a light-sensitive lenticular material employing a conventional or non-conventional...
US20080002167 PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME  
The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in...
US20070287074 Controlled ambient reticle frame  
Embodiments provide a system and a method to control the gas ambient in a reticle frame system. The reticle frame system can include a first cross structure including a pellicle, a second cross...
US20080094597 PROJECTION EXPOSURE APPARATUS, OPTICAL MEMBER, AND DEVICE MANUFACTURING METHOD  
A projection exposure apparatus 100 projects the pattern of an original 6 onto a substrate 7 via a projection optical system PL. The projection exposure apparatus 100 includes an original stage 5...
US20090284729 Illumination optical apparatus and projection exposure apparatus  
An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical...
US20070076184 Optical assembly for photolithography  
The invention relates to an optical assembly (1) having a plurality of optical elements (2), at least one optical element (2, 2″) being connected to a structure (5) dynamically decoupled from the o...
US20080129970 Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure  
An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111. The immersion exposure...
US20130114056 METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure...
US20080212061 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An illumination optical system which illuminates a plane to be illuminated using light from a light source, includes a diaphragm having an aperture of constant area and disposed on a pupil plane of...
US20090262328 ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD  
An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that...