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US20140211185 Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method  
For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth...
US20080123074 Projection Optical System, Exposure Equipment and Exposure Method  
A projection optical system is a system with good imaging performance based on well-balanced compensation for aberration associated with image height and aberration associated with numerical...
US20080129976 SHUTTER BLADE APPARATUS, SHUTTER UNIT, IMAGE PICKUP APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE  
A shutter blade apparatus includes a shutter blade; a first pushing member including two first pushing portions configured to push a first surface of the shutter blade; and a second pushing member...
US20140312500 COMBINING CUT MASK LITHOGRAPHY AND CONVENTIONAL LITHOGRAPHY TO ACHIEVE SUB-THRESHOLD PATTERN FEATURES  
Features are fabricated on a semiconductor chip. The features are smaller than the threshold of the lithography used to create the chip. A method includes patterning a first portion of a feature...
US20070229793 Filtered device container assembly with shield for a reticle  
A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device...
US20100110411 ANTI-PIRACY CODING TECHNIQUE  
An internegative duplicate (12), as used to make motion picture release prints, undergoes marking by exposing at least one area within at least one frame to provide a decodable pattern specific to...
US20110229827 Method and Lithography Device with a Mask Reflecting Light  
A method and lithography device addressing the problem in projection optics of pupil apodization which leads to imaging defects. As here proposed, the illumination system is configured to...
US20120050705 PHOTOLITHOGRAPHY SYSTEM  
A photolithography system is equipped with a light modulator that comprises a plurality of regularly arrayed light modulation elements; a scanning mechanism configured to move an exposure area...
US20120293785 OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS  
An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element...
US20080143988 System for calculating transmission utility factor value of photo energy for exposure and method for calculating transmission utility factor value of photo energy utilizing the calculation system  
Disclosed is a system for calculating transmission utility factor value of photo energy for exposure and a method for calculating transmission utility factor value of photo energy utilizing the...
US20120008126 LITHOGRAPHIC APPARATUS WITH MULTIPLE ALIGNMENT ARRANGEMENTS AND ALIGNMENT MEASURING METHOD  
A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an...
US20120081686 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS  
Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.
US20120081685 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS ILLUMINATION OPTICS  
Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.
US20100239822 APERIODIC MULTILAYER STRUCTURES  
An aperiodic multilayer structure (2, 2′) comprising a plurality of alternating layers of a first (4, 4′) and a second (6, 6′) material and a capping layer (10, 10′) covering these alterna...
US20090086175 METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS  
A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the...
US20070296943 Optical apparatus  
An optical apparatus is disclosed that has a convex mirror and a concave mirror with an aperture, wherein, in use, radiation from a radiation emitter passes through the aperture and is incident...
US20140071422 DUAL WAFER STAGE SWITCHING SYSTEM FOR A LITHOGRAPHY MACHINE  
Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage...
US20110317136 Inspection Apparatus Employing Wide Angle Objective Lens With Optical Window  
An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first...
US20110205505 LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION  
Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line...
US20140043595 EUV collector system with enhanced EUV radiation collection  
A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator....
US20110242515 EUV collector system with enhanced EUV radiation collection  
A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator....
US20140226139 Novel Lithographic Method with the Capability of Spectrum Engineering to Create Complex Microstructures  
The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying...
US20130010274 MASKS FOR USE IN LITHOGRAPHY INCLUDING IMAGE REVERSAL ASSIST FEATURES, LITHOGRAPHY SYSTEMS INCLUDING SUCH MASKS, AND METHODS OF FORMING SUCH MASKS  
Microlithography masks are disclosed, such as those that include one or more image reversal assist features disposed between at least two primary mask features. The one or more image reversal...
US20090207387 FIBER OPTIC IMAGING APPARATUS  
A fiber optic imaging apparatus includes a light source (12); at least one optical fiber (47) for transmitting light from the light source; a mechanical assembly for supporting at least one optical...
US20080129969 System and Method For Improving Immersion Scanner Overlay Performance  
System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising...
US20070296937 ILLUMINATION LIGHT IN IMMERSION LITHOGRAPHY STEPPER FOR PARTICLE OR BUBBLE DETECTION  
Embodiments of the invention present a system, method, etc. for illumination light in an immersion lithography stepper for particle or bubble detection. More specifically, embodiments herein...
US20080117398 IMMERSION EXPOSURE APPARATUS  
A scanning immersion exposure apparatus includes a stage capable of delivering an area in contact with liquid to another member. The stage has a delivery portion configured to enable the area to...
US20120249991 PLANAR MOTOR AND LITHOGRAPHIC APPARATUS COMPRISING SUCH PLANAR MOTOR  
A motor includes a stator including a plurality of stator poles arranged in a repetitive arrangement with a first pitch, the stator poles facing a first side of a plane of movement, and a mover...
US20110063598 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS  
An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter...
US20100073646 METHOD FOR THE PRODUCTION OF A MULTI-COLOUR VOLUME HOLOGRAM, A DOCUMENT WITH SUCH A HOLOGRAM, AND A VOLUME HOLOGRAM MASTER  
The invention relates to a method for the production of a multicolor hologram by means of a capture beam, wherein the utilized capture beam (6) has a plurality of beam bundles of the same...
US20100165314 MEMS DEVICE WITH CONTROLLED GAS SPACE CHEMISTRY  
A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the...
US20070146662 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device  
An amount is flare is measured by a method including steps of applying a photosensitive material to a substrate; exposing a part of the photosensitive material using a mask including a transmitting...
US20120040280 Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography  
A mechanism is provided for simultaneous optical proximity correction (OPC) and decomposition for double exposure lithography. The mechanism begins with two masks that are equal to each other and...
US20060262289 Zoomable projection apparatus  
A zoomable projection apparatus including a projection system, an optical zoom adjusting device and a zoom ratio readout device is provided. The projection system at least includes a zoom lens set...
US20080309008 Document Feeder and Image Forming Device  
A document feeder configured to feed a document in a first direction includes a tray configured to load a document or a set of documents on a loading surface thereof, first and second contact...
US20090168035 Exposure method and exposure apparatus for photosensitive film  
An exposure apparatus for a photosensitive film includes: light-emitting diodes for generating rays to expose a photosensitive film; a light shield positioned between the light-emitting diodes to...
US20050062947 Near-field exposure apparatus  
A near-field exposure apparatus includes an pressure adjusting vessel in which pressure is adjustable, mask supporting means for supporting an elastically deformable exposure mask to the pressure...
US20100073655 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which...
US20100245790 METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERSION LITHOGRAPHY TOOL  
In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a...
US20110212403 METHOD AND APPARATUS FOR ENHANCED DIPOLE LITHOGRAPHY  
Provided is a lithography system that includes a source for providing energy, an imaging system configured to direct the energy onto a substrate to form an image thereon, and a diffractive optical...
US20130120729 INSPECTION METHOD FOR IMPRINT LITHOGRAPHY AND APPARATUS THEREFOR  
A method is disclosed for inspecting a device imprint lithography template to detect defect particles of imprintable medium remaining on the patterned imprinting surface after an earlier imprint...
US20090141356 OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME  
An optical element includes plural multilayer mirrors, wherein the multilayer mirrors are renewable.
US20140204353 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
Provided is an exposure method that includes setting a first exposure condition so as to calculate a coefficient for predicting the fluctuation in the imaging characteristics of the projection...
US20110128518 REFLECTIVE RETICLE CHUCK, REFLECTIVE ILLUMINATION SYSTEM INCLUDING THE SAME, METHOD OF CONTROLLING FLATNESS OF REFLECTIVE RETICLE USING THE CHUCK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE CHUCK  
Provided are a reflective reticle chuck, a reflective illumination system including the chuck, a method of controlling the flatness of a reflective reticle using the chuck, and a method of...
US20140333913 MICROLITHOGRAPHY PROJECTION OBJECTIVE  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20140293256 MICROLITHOGRAPHY PROJECTION OBJECTIVE  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20130128243 TEMPERATURE BALANCING DEVICE OF PROJECTION OBJECTIVE OF LITHOGRAPHY MACHINE AND METHOD THEREOF  
The invention provides a temperature balancing device for a projection objective of a lithography machine. The device comprises at least one temperature sensor, at least one heat-absorbing...
US20090117491 RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES  
Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance...
US20080291422 Light Attenuating Filter for Correcting Field Dependent Ellipticity and Uniformity  
Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus...
US20090086179 Radiometric Kirk Test  
Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present...