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US20100097592 HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS  
The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image...
US20080024749 Low mass six degree of freedom stage for lithography tools  
A reticle or wafer stage mover with six degrees of freedom, a low mass coarse stage, and the ability to move an object in a scanning direction in a lithography tool. The mover includes a coarse...
US20080259293 EXPOSURE APPARATUS, TEMPERATURE REGULATING SYSTEM, AND DEVICE MANUFACTURING METHOD  
An exposure apparatus which includes a plurality of units to be temperature-regulated, and transfers a pattern of a reticle onto a substrate while activating the plurality of units is disclosed....
US20060209280 Immersion exposure apparatus, immersion exposure method, and device manufacturing method  
An immersion exposure apparatus projects and transfers a pattern onto a photosensitive substrate through a projection optical system with a liquid being supplied to the immersion space between the...
US20120162627 ILLUMINATION OPTICAL UNIT FOR MICROLITHOGRAPHY  
An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination...
US20090135392 SPATIAL LIGHT MODULATION UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
This invention relates to an illumination optical apparatus capable of forming a pupil intensity distribution of a desired shape and desired illuminance and, in turn, capable of realizing...
US20130235357 System and Method for Particle Control Near A Reticle  
Controlling particles near a reticle of a lithography or reticle inspection system may include generating a curtain of ultraviolet light about a reticle protection area of a reticle by illuminating...
US20100283978 LED-based UV illuminators and lithography systems using same  
An LED-based UV illuminator is disclosed that includes a plurality of LED light sources that emit UV light, and a plurality of dichroic mirrors. The dichroic mirrors are arranged relative to the...
US20060028634 Multiple exposures of photosensitve material  
A method of accurately registering successive exposures of photosensitive material by forming between the exposures an image of the latent exposure pattern caused by initial exposures. In a...
US20080165426 PROJECTION OBJECTIVE AND METHOD FOR OPTIMIZING A SYSTEM APERTURE STOP OF A PROJECTION OBJECTIVE  
In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto...
US20100060876 Light generating apparatus and method of controlling the same  
A light beam generating apparatus and method of controlling the same is provided. The light beam generating apparatus may include a light source, a beam expander collimating a light beam emitted...
US20090310113 SUB-SEGMENTED ALIGNMENT MARK ARRANGEMENT  
An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence...
US20100302521 Inspection Apparatus for Lithography  
An illuminator configured to create a radiation beam for the metrology of a substrate surface includes an arc lamp, a parabolic reflector (150), a double cone (160) and a fly's eye integrator (110)...
US20110211183 Illumination optical system, aligner, and process for fabricating device  
[Problem] Each of pupil intensity distributions at respective points on an illumination target surface is substantially uniformly adjusted. [Solving Means] An illumination optical system to...
US20110216303 METHOD FOR ADJUSTING A PROJECTION OBJECTIVE  
A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the...
US20100186942 RETICLE ERROR REDUCTION BY COOLING  
Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger...
US20080246940 Illumination system for illuminating a pattering device and method for manufacturing an illumination system  
An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged...
US20090239178 OPTICAL ATTENUATOR PLATE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
There is disclosed an optical attenuator plate and an optical attenuator plate to adjust a quantity of light from a light source, which has a plurality of high-transmittance regions with a...
US20080239267 Exposure apparatus and exposure method for exposure apparatus  
Post-etching line width localities that occur due to resist film thickness localities can be corrected continuously, without the need for an expensive mask. After a resist applied to a thin film on...
US20100045953 Laser irradiation device and method of manufacturing organic light emitting diode display device using the same  
A laser irradiation device and a method of manufacturing an organic light emitting diode display device using the same. The laser radiation device prevents the scattering of the laser light into...
US20100285399 WAFER EDGE EXPOSURE UNIT  
A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common...
US20090280437 PROJECTION EXPOSURE METHODS AND SYSTEMS  
Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first...
US20090213346 IMMERSION LITHOGRAPHY USING HAFNIUM-BASED NANOPARTICLES  
Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or...
US20100079739 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY  
A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for...
US20110149262 SPECTRAL PURITY FILTER AND LITHOGRAPHIC APPARATUS  
A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate....
US20110194086 WAFER EDGE EXPOSURE MODULE  
A wafer edge exposure module connected to a semiconductor wafer track system. The wafer edge exposure module includes a wafer spin device, an optical system, a scanner interface module, and a...
US20130120732 CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY  
The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The...
US20090296062 METHOD OF MEASURING POSITION ERROR OF BEAM OF EXPOSURE APPARATUS AND EXPOSURE APPARATUS USING THE SAME  
A method of measuring a position error of a beam of an exposure apparatus and an exposure apparatus using the same are provided. An exposure apparatus using a digital micromirror device (DMD)...
US20050118516 Transfer mask for exposure and pattern exchanging method of the same  
The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the...
US20130083305 METHOD, OPTICAL MODULE AND AUTO-FOCUSING SYSTEM FOR WAFER EDGE EXPOSURE  
Embodiments relate to a method, optical module and auto-focusing system for wafer edge exposure. The optical module comprises a light source emitting light of a wavelength to expose a photoresist,...
US20070177116 METHOD AND APPARATUS FOR MANUFACTURING MICROSTRUCTURE AND DEVICE MANUFACTURED THEREBY  
A method for manufacturing a microstructure, includes: dividing an incident laser beam into a plurality of diffracted beams by means of a diffractive optical element; concentrating said divided...
US20090027638 Lithographic appararus and method  
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first...
US20080239271 ABERRATION MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A method for measuring a spherical aberration or a coma aberration of a projection optical system of an exposure apparatus configured to transfer an image of a pattern formed on an original plate...
US20070085989 Exposure apparatus and exposure method, maintenance method, and device manufacturing method  
An exposure apparatus includes; a supply outlet that supplies a liquid to an optical path space of exposure light, and a liquid supply system that supplies an ionized ionic liquid to the supply...
US20070195307 Projection lens and method for performing microlithography  
A projection lens for microlithography is provided comprising transparent optical elements not having direct contact and being spaced apart at most half of the wavelength the lens is designed for...
US20100072454 EXPOSURE METHOD, AND SEMICONDUCTOR DEVICE  
An exposure method includes an exposure process for exposing a substrate through a halftone mask with quadrupole illumination to form plural columnar portions that are disposed into a matrix shape...
US20090213342 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
The invention relates to a projection exposure apparatus with a projection objective that serves to project a structure onto a substrate coated with a light-sensitive resist, wherein an immersion...
US20070097345 System, method, and apparatus for scanning detector for fast and frequent illumination uniformity correction module  
Provided is a reticle masking blade system, including a reticle-masking blade device. Also included is a detector array mounted on an edge of a blade of the blade device.
US20090168072 Illumination System  
A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and...
US20080204696 METHOD OF ALIGNMENT  
The invention provides an alignment method for applying a one layer of shot exposure on and throughout a substrate, wherein a shot exposure area throughout the substrate is divided into N block...
US20120249995 RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD  
The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has...
US20080231821 Exposure Method Of A Semiconductor Device  
An exposure method of a semiconductor device includes the steps of: providing a wafer on which a photoresist is coated; rotating and aligning a reticle and the wafer so that a swing direction of a...
US20100321659 Illumination Arrangement  
Illumination arrangement (3) for lighting a reflective light modulator (4) under oblique light incidence, comprising, one after another along an optical axis (10), a light source (6) with a first...
US20110211179 DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS  
An EUV (extreme ultraviolet) lithography apparatus (1) including: a housing (1a) enclosing an interior (15), at least one reflective optical element (5, 6, 8, 9, 10, 14.1 to 14.6) arranged in the...
US20110181860 Cooled spider and method for grazing-incidence collectors  
A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and...
US20050162634 Cable tray assembly for precision drive stage  
A cable tray assembly includes a wafer table placed on a precision drive stage of which motions along specified mutually perpendicular X- and Y-directions are independently controlled. A plurality...
US20130107240 Maskless Vortex Phase Shift Optical Direct Write Lithography  
The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is...
US20120038896 Maskless Vortex Phase Shift Optical Direct Write Lithography  
The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is...
US20090174874 Optical Projection System  
An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and...
US20100258744 Flare Evaluation Methods  
A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern...