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US20090311631 NEAR-FIELD EXPOSURE APPARATUS AND NEAR-FIELD EXPOSURE METHOD  
A near-field exposure apparatus includes a near-field exposure mask, a mechanism to place a substrate to be exposed, opposed to the near-field exposure mask, a mechanism to perform relative...
US20130335718 METHOD FOR MEASURING DISTORTION OF PROJECTION OBJECTIVE  
A method for measuring distortion of a projection objective, which includes: obtaining a plurality of first positional deviations between two groups of patterns formed respectively after two...
US20060209289 Exposure apparatus, and device manufacturing method  
Disclosed is an exposure apparatus for exposing a substrate through a reticle, wherein the apparatus includes a clamp having a circumferential protrusion and a pin disposed inside the...
US20070019173 Photolithography arrangement  
A photolithography arrangement including an illumination source, which emits radiation with a predetermined wavelength directed towards a substrate, a projection mask for modulating the radiation...
US20110262870 PURGE RING WITH SPLIT BAFFLES FOR PHOTONIC THERMAL PROCESSING SYSTEMS  
A purge ring for a photonic temperature processing system includes a first layer, a second layer, and a third layer. The first layer, the second layer and the third layer define an inner region....
US20130208252 FLARE MEASURING METHOD, REFLECTIVE MASK, AND EXPOSURE APPARATUS  
According to a flare measuring method in an embodiment, a reflective mask, in which one reflective coordinate in a slit direction in a mask surface is determined when one scanning coordinate is...
US20070026325 Substrate distortion measurement  
A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the...
US20100033698 Full Wafer Width Scanning Using Steps and Scan System  
A system and method are provided for writing a pattern onto a substrate. A patterned beam of radiation is produced using a reticle and projected onto a substrate to expose the pattern. Reticle and...
US20120120380 LOW AND HIGH PRESSURE PROXIMITY SENSORS  
A fluid proximity sensor for surface measurements having a measurement chamber (210) with a measurement nozzle (205), a reference chamber (220) with a reference nozzle (225), and a diaphragm (215)...
US20080123067 Movable Body System, Exposure Apparatus, And Device Manufacturing Method  
Stopper mechanisms keep a wafer table and a measurement table from moving closer than a predetermined distance, and the blocking by the stopper mechanisms can also be released by a drive mechanism....
US20060204861 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination  
A mask for enhancing the depth of focus of an optical imaging system is designed by optimizing an optical property (transmittance or reflectance) of the mask relative to the intensity distribution...
US20060023197 Method and system for automated production of autostereoscopic and animated prints and transparencies from digital and non-digital media  
A method and system for automated production of stereoscopic and animated images and hardcopies can utilize a light-sensitive lenticular material employing a conventional or non-conventional...
US20080002167 PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME  
The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in...
US20070287074 Controlled ambient reticle frame  
Embodiments provide a system and a method to control the gas ambient in a reticle frame system. The reticle frame system can include a first cross structure including a pellicle, a second cross...
US20080094597 PROJECTION EXPOSURE APPARATUS, OPTICAL MEMBER, AND DEVICE MANUFACTURING METHOD  
A projection exposure apparatus 100 projects the pattern of an original 6 onto a substrate 7 via a projection optical system PL. The projection exposure apparatus 100 includes an original stage 5...
US20090284729 Illumination optical apparatus and projection exposure apparatus  
An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical...
US20070076184 Optical assembly for photolithography  
The invention relates to an optical assembly (1) having a plurality of optical elements (2), at least one optical element (2, 2″) being connected to a structure (5) dynamically decoupled from the o...
US20080129970 Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure  
An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111. The immersion exposure...
US20130114056 METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure...
US20080212061 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An illumination optical system which illuminates a plane to be illuminated using light from a light source, includes a diaphragm having an aperture of constant area and disposed on a pupil plane of...
US20090262328 ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD  
An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that...
US20070002293 Method measuring distortion using exposure equipment  
A method of measuring distortion for an exposure apparatus is disclosed and comprises; aligning a reticle comprising a plurality of measuring patterns over a first wafer, wherein the plurality of...
US20100097592 HIGH TRANSMISSION, HIGH APERTURE CATADIOPTRIC PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS  
The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image...
US20080024749 Low mass six degree of freedom stage for lithography tools  
A reticle or wafer stage mover with six degrees of freedom, a low mass coarse stage, and the ability to move an object in a scanning direction in a lithography tool. The mover includes a coarse...
US20080259293 EXPOSURE APPARATUS, TEMPERATURE REGULATING SYSTEM, AND DEVICE MANUFACTURING METHOD  
An exposure apparatus which includes a plurality of units to be temperature-regulated, and transfers a pattern of a reticle onto a substrate while activating the plurality of units is disclosed....
US20060209280 Immersion exposure apparatus, immersion exposure method, and device manufacturing method  
An immersion exposure apparatus projects and transfers a pattern onto a photosensitive substrate through a projection optical system with a liquid being supplied to the immersion space between the...
US20120162627 ILLUMINATION OPTICAL UNIT FOR MICROLITHOGRAPHY  
An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination...
US20090135392 SPATIAL LIGHT MODULATION UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
This invention relates to an illumination optical apparatus capable of forming a pupil intensity distribution of a desired shape and desired illuminance and, in turn, capable of realizing...
US20130235357 System and Method for Particle Control Near A Reticle  
Controlling particles near a reticle of a lithography or reticle inspection system may include generating a curtain of ultraviolet light about a reticle protection area of a reticle by illuminating...
US20100283978 LED-based UV illuminators and lithography systems using same  
An LED-based UV illuminator is disclosed that includes a plurality of LED light sources that emit UV light, and a plurality of dichroic mirrors. The dichroic mirrors are arranged relative to the...
US20060028634 Multiple exposures of photosensitve material  
A method of accurately registering successive exposures of photosensitive material by forming between the exposures an image of the latent exposure pattern caused by initial exposures. In a...
US20140132939 CLEANUP METHOD FOR OPTICS IN IMMERSION LITHOGRAPHY  
An immersion lithography apparatus and method places an object for a cleanup process on a holder of a movable stage of the immersion lithography apparatus, a wafer being held on the holder of the...
US20080165426 PROJECTION OBJECTIVE AND METHOD FOR OPTIMIZING A SYSTEM APERTURE STOP OF A PROJECTION OBJECTIVE  
In certain aspects, the disclosure relates to a projection objective, in particular for a microlithography exposure apparatus, serving to project an image of an object field in an object plane onto...
US20100060876 Light generating apparatus and method of controlling the same  
A light beam generating apparatus and method of controlling the same is provided. The light beam generating apparatus may include a light source, a beam expander collimating a light beam emitted...
US20090310113 SUB-SEGMENTED ALIGNMENT MARK ARRANGEMENT  
An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence...
US20100302521 Inspection Apparatus for Lithography  
An illuminator configured to create a radiation beam for the metrology of a substrate surface includes an arc lamp, a parabolic reflector (150), a double cone (160) and a fly's eye integrator (110)...
US20110211183 Illumination optical system, aligner, and process for fabricating device  
[Problem] Each of pupil intensity distributions at respective points on an illumination target surface is substantially uniformly adjusted. [Solving Means] An illumination optical system to...
US20110216303 METHOD FOR ADJUSTING A PROJECTION OBJECTIVE  
A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the...
US20100186942 RETICLE ERROR REDUCTION BY COOLING  
Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger...
US20080246940 Illumination system for illuminating a pattering device and method for manufacturing an illumination system  
An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged...
US20090239178 OPTICAL ATTENUATOR PLATE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
There is disclosed an optical attenuator plate and an optical attenuator plate to adjust a quantity of light from a light source, which has a plurality of high-transmittance regions with a...
US20080239267 Exposure apparatus and exposure method for exposure apparatus  
Post-etching line width localities that occur due to resist film thickness localities can be corrected continuously, without the need for an expensive mask. After a resist applied to a thin film on...
US20100045953 Laser irradiation device and method of manufacturing organic light emitting diode display device using the same  
A laser irradiation device and a method of manufacturing an organic light emitting diode display device using the same. The laser radiation device prevents the scattering of the laser light into...
US20100285399 WAFER EDGE EXPOSURE UNIT  
A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common...
US20090280437 PROJECTION EXPOSURE METHODS AND SYSTEMS  
Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first...
US20090213346 IMMERSION LITHOGRAPHY USING HAFNIUM-BASED NANOPARTICLES  
Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or...
US20100079739 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY  
A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for...
US20110149262 SPECTRAL PURITY FILTER AND LITHOGRAPHIC APPARATUS  
A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate....
US20110194086 WAFER EDGE EXPOSURE MODULE  
A wafer edge exposure module connected to a semiconductor wafer track system. The wafer edge exposure module includes a wafer spin device, an optical system, a scanner interface module, and a...
US20130120732 CYLINDRICAL MAGNETIC LEVITATION STAGE AND LITHOGRAPHY  
The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The...