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US20130107240 |
Maskless Vortex Phase Shift Optical Direct Write Lithography
The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is...
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US20120038896 |
Maskless Vortex Phase Shift Optical Direct Write Lithography
The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is...
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US20090174874 |
Optical Projection System
An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and...
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US20100258744 |
Flare Evaluation Methods
A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern...
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US20080225252 |
Device manufacturing method, lithographic apparatus, and a computer program
A device manufacturing method includes exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, determining a non-linear function for...
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US20080204684 |
PROCESS AND APPARATUS FOR ULTRAVIOLET NANO-IMPRINT LITHOGRAPHY
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an...
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US20060203217 |
Optical adjustment device, optical pickup apparatus provided with optical adjustment device, and method and apparatus for assembling optical adjustment device
An optical adjustment device capable of correcting spherical aberration with high accuracy in a simple configuration is provided. A second lens holder fits into a guiding portion of a first lens...
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US20050147920 |
Method and system for immersion lithography
A system (100) and method for immersion lithography is disclosed in which an immersion medium (112) interfaces with a proximal lens (110) that focuses a patterned light beam on a light sensitive...
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US20100259745 |
METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES
The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon...
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US20070024835 |
Method for improving illumination uniformity in exposure process, and exposure apparatus
A method for improving illumination uniformity in an exposure process is described, wherein a light source, a reticle and a projection system are used to expose a substrate in the exposure process....
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US20060164614 |
Exposing machine for a printed circuit board
An exposing machine of the present invention consists of a plurality of ultraviolet light tubes arranged on light generation assemblies. Each tube of the ultraviolet tubes is mutually parallel and...
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US20090075216 |
STORAGE MEDIUM STORING EXPOSURE CONDITION DETERMINATION PROGRAM, EXPOSURE CONDITION DETERMINATION METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
A computer-readable storage medium storing a program for causing a computer to execute determination of an exposure condition for use in illuminating an original plate with an illumination optical...
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US20080318153 |
PHOTOSENSITIVE LAYER STACK
A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon irradiation...
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US20110109894 |
POLARIZATION-MODULATING OPTICAL ELEMENT AND METHOD FOR MANUFACTURING THEREOF
The disclosure relates to a method of manufacturing a polarization-modulating optical element, wherein the element causes, for light passing through the element and due to stress-induced...
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US20090134488 |
Immersion Liquid, Exposure Apparatus, and Exposure Process
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography...
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US20100053577 |
ROLL-TO-ROLL TYPE APPARATUS FOR FORMING THIN FILM PATTERN
An apparatus for forming a thin film pattern according to an aspect of the invention may include: an unwinding roll and a winding roll running a sheet; a rotary drum having an elastic layer...
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US20090190108 |
METHOD AND SYSTEM FOR LEVELING TOPOGRAPHY OF SEMICONDUCTOR CHIP SURFACE
A system and method of leveling the topography of a semiconductor wafer surface is presented. The system may induce low-order lens aberration to control the focal plane dynamically. The system may...
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US20080304031 |
EXPOSURE APPARATUS
An exposure apparatus exposes a substrate using light from a light source having a wavelength of 20 nm or smaller, and includes plural optical elements, each of which is configured to reflect the...
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US20090311636 |
EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND APERTURE STOP MANUFACTURING METHOD
A projection exposure apparatus includes an aperture stop that includes a light attenuation part that is located between a light shielding part and an opening part, and has a transmittance larger...
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US20100073653 |
MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
In measurement of a positional information in the XY plane of a fine movement stage held by a coarse movement stage, an encoder system is used including a head which is placed facing a grating...
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US20080014534 |
MICROPHOTONIC MASKLESS LITHOGRAPHY
A maskless lithography system and method to expose a pattern on a wafer by propagating a photon beam through a waveguide on a substrate in a plane parallel to a top surface of the wafer.
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US20110096309 |
Method and System for Wafer Inspection
A method and system for evaluating a lithographic pattern obtained using multiple-patterning lithographic processing are presented. In one aspect, the method includes aligning a target design with...
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US20070064215 |
Removable pellicle for immersion lithography
A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto the...
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US20060215144 |
Stage drive method, stage apparatus, and exposure apparatus
A stage drive method for driving a stage on a surface of a surface plate along a guide part that extends in a first direction includes the step of rotating the guide part about an axis...
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US20080259308 |
PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
A projection objective or microlithography for imaging a pattern arranged in an object plane on a substrate arranged in an image plane is disclosed. The projection objective has an arrangement of...
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US20070275310 |
Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout
A method and apparatus is provided for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout. The method begins by specifying a wafer target CD and...
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US20090219494 |
EVALUATION METHOD, EVALUATION APPARATUS, AND EXPOSURE APPARATUS
An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference...
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US20120194792 |
METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATED OR MEASURED TOPOGRAPHY
A method and system to predict lithography focus error using chip topography data is disclosed. The chip topography data may be measured or simulated topography data. A plane is best fitted to the...
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US20070259275 |
Anti-reflection coating for an EUV mask
An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a...
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US20080143995 |
MOVING APPARATUS
A moving apparatus includes a movable body movable in at least one direction; an electromagnet configured to drive a movable body and including a coil; an electromagnet control system configured to...
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US20070273861 |
STAGE DEVICE, EXPOSURE APPARATUS, AND MICRODEVICE MANUFACTURING METHOD
A stage device including a base, a stage movable portion being movable along said base without contact thereto, an interferometer configured to measure a position of the stage movable portion, at...
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US20080068571 |
Immersion exposure apparatus and immersion exposure method, and device manufacturing method
An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region...
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US20090168044 |
LITHOGRAPHY APPARATUS AND LITHOGRAPHY METHOD
A lithography apparatus includes a generating unit configured, by receiving character information which specifies a shape of an identification figure representing identification information of a...
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US20080304034 |
DOSE CONTROL FOR OPTICAL MASKLESS LITHOGRAPHY
A lithographic apparatus comprises a patterning device, a projection system, and a controller. The patterning device is configured to pattern a beam of radiation. The radiation beam comprises a...
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US20120293779 |
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element...
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US20110228237 |
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element...
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US20100026979 |
ACTIVE SPOT ARRAY LITHOGRAPHIC PROJECTOR SYSTEM WITH REGULATED SPOTS
An active spot array projection system particularly for microlithographic projection includes a spatial light modulator, such as a digital micromirror device, having individually addressable...
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US20080143983 |
METHODS AND APPARATUS FOR MULTI-EXPOSURE PATTERNING
In some aspects, a reticle is provided for use in forming a patterned region on a substrate using a multi-pattern, multi-exposure process. The reticle includes (a) a first pattern for the...
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US20090237634 |
ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD TO DETECT AN ERROR ON OR IN A GRID OR GRATING OF AN ENCODER-TYPE MEASUREMENT SYSTEM
An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the...
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US20090244506 |
SLM Calibration
Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the...
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US20130027681 |
EUV COLLECTOR
A collector transfers an emission of an EUV radiation source to a main intensity spot. The collector has at least one collector subunit including at least one grazing incidence mirror. The grazing...
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US20100220307 |
SHUTTER PIXEL, SHUTTER STRUCTURE INCLUDING THE SHUTTER PIXEL, AND EXPOSURE APPARATUS INCLUDING THE SHUTTER STRUCTURE
The present invention provides a shutter pixel, a shutter structure including the shutter pixel, and an exposure apparatus including the shutter structure. The shutter pixel may include a lower...
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US20090168033 |
MANUFACTURING METHOD OF PATTERN FORMED BODY AND PATTERN FORMED BODY MANUFACTURING APPARATUS
A main object of the invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously...
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US20060194130 |
Run to run control for lens aberrations
An exposure tool includes an illumination source, a blazed phase grating reticle, a reticle stage holding the blazed phase grating reticle, a lens system including at least one adjustable lens...
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US20100045954 |
Controllable radiation lithographic apparatus and method
A lithographic arrangement allows for controlling radiation characteristics. An illumination system provides a beam of radiation from radiation provided by a radiation source. The radiation source...
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US20080018868 |
CIRCULATION SYSTEM FOR HIGH REFRACTIVE INDEX LIQUID IN PATTERN FORMING APPARATUS
A circulation system for a high refractive index liquid includes a first collecting section configured to collect a high refractive index liquid used in an immersion light exposure section; a first...
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US20090128791 |
Stage system, lithographic apparatus including such stage system, and correction method
A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative...
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US20090233233 |
OPTICAL ARRANGEMENT FOR IMMERSION LITHOGRAPHY WITH A HYDROPHOBIC COATING, AS WELL AS PROJECTION EXPOSURE APPARATUS COMPRISING THE SAME
An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation...
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US20090115979 |
Immersion lithography apparatus
A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a...
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US20070091287 |
IMMERSION LITHOGRAPHY APPARATUS AND METHODS
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean...
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