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US20090021716 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one...
US20100060874 Maskless lithographic apparatus and methods of compensation for rotational alignment error using the same  
A maskless lithographic apparatus may include a light source providing an exposure beam, a light modulator modulating the exposure beam according to an exposure pattern, an exposure optical system...
US20110164235 PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
Projection objectives, projection exposure apparatuses and related systems and components are disclosed.
US20130314681 ARRANGEMENT FOR MOUNTING AN OPTICAL ELEMENT  
The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device (103) for exerting a...
US20100073660 SPECTRALLY CONTROLLED HIGH ENERGY DENSITY LIGHT SOURCE PHOTOPOLYMER EXPOSURE SYSTEM  
A system for forming printing features (10) on a printing plate includes a high energy density light source (20) that has an emission spectrum that includes actinic radiation and non-actinic...
US20080170216 PROJECTION OPTICS FOR MICROLITHOGRAPHY  
A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and...
US20060176460 Lithographic optical systems including exchangeable optical-element sets  
Optical systems are disclosed for use in lithography systems, especially extreme-ultraviolet (EUV) lithography systems. An exemplary optical system includes at least a first optical-element set...
US20080252867 OVERLAY MARK, AND FABRICATION AND APPLICATION OF THE SAME  
An overlay mark is described, including a portion of a lower layer having two x-directional and two y-directional bar-like patterns therein, and two x-directional and two y-directional photoresist...
US20090251677 ILLUMINATING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
A projection exposure apparatus for microlithography has an illumination system with an EUV light source and an illumination optical unit to expose an object field in an object plane. A projection...
US20120293782 Methods and Systems for Lithography Alignment  
Methods and systems for lithographically exposing a substrate based on a curvature profile of the substrate.
US20070190430 Photo-mask stage  
A photo-mask stage of an exposure apparatus includes a fixed component to fix a first photo-mask, an exchanging component, which is able to assemble or to disassemble with the fixed component for...
US20090174875 SCANNING EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
A scanning exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system while scanning the original and the substrate, thereby...
US20100112467 PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF OVERLAY ERROR CORRECTION  
Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a...
US20080079919 IMMERSION LITHOGRAPHY METHOD  
An immersion lithography method includes forming a resist layer on a substrate to be processed, performing immersion lithography in a state where liquid is locally interposed between the resist...
US20090257032 OPTICAL ELEMENT AND METHOD  
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for...
US20070222961 Lithographic apparatus, radiation supply and device manufacturing method  
A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation...
US20050219493 Illuminating method, exposing method, and device for therefor  
The present invention provides a light exposure apparatus, and its method, comprising: an illumination optical system including: a light source array formed of a plural separate light sources...
US20080151202 STAGE DEVICE AND EXPOSURE APPARATUS  
A stage device includes a stage configured to move along a base while holding a heating medium, and a heat exchange section configured to perform heat exchange of the heating medium. The heat...
US20140300880 Flow Through MEMS Package  
A flow through Micro-Electromechanical Systems (MEMS) package and methods of operating a MEMS packaged using the same are provided. Generally, the package includes a cavity in which the MEMS is...
US20130003031 METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS  
A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification...
US20120099094 DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS  
A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing...
US20080246941 Wavefront aberration measuring device, projection exposure apparatus, method for manufacturing projection optical system, and method for manufacturing device  
A wavefront aberration measuring device includes a mask which arranges a group of minute apertures for generating a group of point light sources at an object point as a measurement objective of an...
US20090311613 Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same  
A mask for exposure, which is used in a multi-column electron beam exposure apparatus having multiple column cells, includes a stencil pattern group constituted by multiple stencil patterns for...
US20150056559 IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS  
An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography...
US20090002654 Immersion Lithography Apparatus and Method of Performing Immersion Lithography  
An immersion lithography apparatus comprises an optical system having a liquid delivery unit. The liquid delivery unit is arranged to deliver a layer of an immersion liquid onto a surface of a...
US20090033899 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE  
The movable stages carry chucks 10a and 10b and move towards secondary stage bases 11a and 11b and a primary stage base 11, thereby positioning the substrate 1 on the primary stage base 11. Each...
US20150085265 PELLICLE  
There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the...
US20130033689 DYNAMIC MASKING METHOD FOR MICRO-TRUSS FOAM FABRICATION  
A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate...
US20110090480 DYNAMIC MASKING METHOD FOR MICRO-TRUSS FOAM FABRICATION  
A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate...
US20120300184 SURFACE CORRECTION ON COATED MIRRORS  
A mirror (1) for a microlithography projection exposure apparatus including a substrate (3) and a reflective coating (5). A functional coating (11) between the substrate (3) and the reflective...
US20110205510 Method and Apparatus for Controlling a Lithographic Apparatus  
A lithographic exposure process is performed on a substrate using a scanner. The scanner comprises several subsystems. There are errors in the overlay arising from the subsystems during the...
US20080206683 MASK AND BLANK STORAGE INNER GAS  
The present disclosure provides a lithography apparatus. The lithography apparatus includes a radiation source providing a radiation energy with a wavelength selected from the group consisting of...
US20060033905 Pellicle-reticle methods with reduced haze or wrinkle formation  
Methods for using and/or storing a pellicle-reticle assembly that does not result in the formation of haze on the reticle and/or the formation of wrinkles on the pellicle.
US20080204689 Optical module with minimized overrun of the optical element  
There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main...
US20140313497 EXPOSURE APPARATUS AND A METHOD FOR CONTROLLING RADIATION FROM A LAMP FOR EXPOSING A PHOTOSENSITIVE ELEMENT  
The invention pertains to an exposure apparatus, a method for controlling a photosensitive element to radiation using the exposure apparatus, and a method for exposing a photosensitive element to...
US20140111782 LITHOGRAPHY APPARATUS, METHOD FOR LITHOGRAPHY AND STAGE SYSTEM  
Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface...
US20090316129 LITHOGRAPHIC APPARATUS HAVING A FEED FORWARD PRESSURE PULSE COMPENSATION FOR THE METROLOGY FRAME  
A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a metrology frame supported by a vibration isolation...
US20100214545 Creating Metal Gate Structures Using Lithography-Etch-Lithography-Etch (LELE) Processing Sequences  
The invention can provide apparatus and methods of creating metal gate structures on wafers in real-time using Lithography-Etch-Lithography-Etch (LELE) processing sequence. Real-time data and/or...
US20090002662 Lighting Apparatus, Exposure Apparatus And Microdevice Manufacturing Method  
An illumination apparatus for illuminating a surface (M) to be irradiated with illumination light emitted from a light source (2) comprises a reflection type fly-eye optical systems (12, 14)...
US20070285634 Maintenance Method, Exposure Method, Exposure Apparatus, And Method For Producing Device  
An exposure apparatus irradiates an exposure light beam a state that a space, between predetermined optical elements and among a plurality of optical elements included in a projection optical...
US20060038971 DUAL RETICLE DEVICE AND ASSEMBLING METHOD THEREOF  
A dual reticle device comprising a ring structure, a first reticle and a second reticle is provided. Four positioning grooves parallel to the axis of the ring structure are formed on the external...
US20080094590 Offset Partial Ring Seal in Immersion Lithographic System  
A substrate processing apparatus includes a device for partially sealing a gap between a final optical element (22) of a projection lens (14) and an immersion nozzle (20). In one embodiment, the...
US20070013883 SEMICONDUCTOR MANUFACTURING DEVICE AND PARTICLE MONITORING METHOD  
An embodiment of a semiconductor manufacturing device includes a chamber to perform a predetermined semiconductor process, a light source to emit light into the chamber, a light receiver to sense...
US20070258069 Gas bearing, and lithographic apparatus provided with such a bearing  
A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing...
US20120287415 PICKUP DEVICE AND LITHOGRAPHY APPARATUS USING THE SAME  
A pickup device disposed on a base includes a driving unit, a pickup arm, a control unit, a passive arm and a control line. The control unit is disposed on the pickup arm and electrically connects...
US20060061218 Dual force wafer table  
Methods and apparatus for actuating a tubeless fine stage using E-I core actuators and voice coil motors (VCMs) are described. According to one aspect of the present invention, a stage device...
US20090168040 DIFFRACTIVE OPTICAL DEVICE, AND ALIGNER COMPRISING THAT DEVICE  
The invention relates to a pupil filter used for the illumination optical system of a semiconductor aligner or the like that can prevent a decrease in the quantity of light having transmitted...
US20140205934 SINGLE RETICLE APPROACH FOR MULTIPLE PATTERNING TECHNOLOGY  
A reticle for multiple patterning a layer of an integrated circuit die includes a first portion with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a...
US20090109411 Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersion Lithography  
An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion...
US20080309906 Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System  
A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the...