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US20080049205 IMAGING SYSTEM FOR THERMAL TRANSFER  
An optical imaging system is disclosed for selective thermal transfer of a material from a donor film to a substrate. The imaging system includes a light source assembly that is configured to emit...
US20150070665 Homogeneous Thermal Equalization with Active Device  
A system and method is provided for providing a thermal distribution on a workpiece during a lithographic process. The system provides a source of lithographic energy to workpiece, such as a...
US20130258316 Tunable Wavelength Illumination System  
A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable...
US20090027644 PROJECTION OBJECTIVE  
The disclosure relates a projection objective for imaging an object field in an object plane into an image field in an image plane. The disclosure also relates to a microlithographic projection...
US20100007866 METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS  
The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.
US20080212059 MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS  
The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.
US20130182235 MEASUREMENT SYSTEM THAT INCLUDES AN ENCODER AND AN INTERFEROMETER  
A stage assembly (10) for positioning a device (22) along a first axis includes (i) a stage (14) that retains the device (22); (ii) a mover assembly (16) that moves the stage (14) along the first...
US20090021713 ILLUMINATION SYSTEM AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS INCLUDING SAME  
The disclosure relates an illumination system configured to guide illumination light from a radiation source to an object plane and to provide defined illumination of an object field in the object...
US20080304030 Spatial Light Modulator Device, Lithographic Apparatus, Display Device, Method of Producing a Light Beam Having a Spatial Light Pattern and Method of Manufacturing a Device  
The spatial light modulator device (SLM) for providing a spatial light pattern which is alterable in response to an electric signal comprises a first modulator element (ME1) and a second modulator...
US20090051927 OPTICAL SCATTERING DISK, USE THEREOF, AND WAVEFRONT MEASURING APPARATUS  
Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the...
US20110157575 MASK FRAME ASSEMBLY FOR THIN LAYER DEPOSITION AND ORGANIC LIGHT EMITTING DISPLAY DEVICE  
A mask frame assembly for thin film deposition is disclosed. In one embodiment, the assembly includes: a frame, and a plurality of unit mask strips attached to the frame, wherein each of the unit...
US20090090877 MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION  
A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be...
US20090079953 USE OF PERFLUOROALKANES IN VACUUM ULTRAVIOLET APPLICATIONS  
This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical...
US20060061744 Optimum location of active vibration controller  
An active vibration controller has: a sensor configured to measure a physical quantity related to vibration of a vehicle body; an actuator arranged on a floor panel of the vehicle body and...
US20140253891 TUNABLE WAVELENGTH ILLUMINATION SYSTEM  
A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into...
US20100297549 Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have...
US20100073649 Exposure Apparatus Having An Element To Be Cooled  
An exposure apparatus having an element to be cooled and that exposes a substrate to patterned radiation by using the element. A reservoir houses a liquid coolant therein. A first pump, disposed...
US20110043782 SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS  
A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of...
US20060139587 Software mechanism for generating flexible equipment state model views, software mechanism for measuring equipment reliability  
A state model engine according to one embodiment is configured to dynamically determine Reliability, Availability, and Maintainability data in a lithographic processing system. The engine...
US20140253898 PELLICLE MOUNTING SYSTEM AND METHOD  
A pellicle mounting method is provided. The method includes aligning a mounting apparatus with a top surface of a pellicle frame, the mounting apparatus having a continuous duct extending...
US20130128249 Fiber Delivery for Metrology Systems Used in Lithography Tools  
Metrology system, apparatus and method used to implement measurements inside a lithography tool are described, such that the disclosed measurements can be performed without contributing outgassed...
US20090168041 PROJECTION APPARATUS  
A projection apparatus including an image display element for modulating illumination light, an illumination optical system for irradiating the illumination light onto the image display element, a...
US20150261091 Liquid Deposition Photolithography  
Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a...
US20130252178 Liquid Deposition Photolithography  
Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a...
US20150261095 Radiation Source  
A radiation source suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets...
US20090279067 Stage System and Lithographic Apparatus Comprising Such Stage System  
A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder...
US20080094600 ILLUMINATION DEVICE AND MASK FOR MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM, AND RELATED METHODS  
Illumination devices and masks for microlithography projection exposure systems, as well as related systems and methods, are disclosed.
US20080143994 Drive Method of Moving Body, Stage Unit, and Exposure Apparatus  
An exposure apparatus that comprises a stage (28) that moves in the X-axis direction, an X-axis linear motor (80) that drives the stage, a counter mass (30) that moves in a direction opposite to...
US20080151213 Bearing Device, Stage Device, and Exposure Apparatus  
A sufficient moving stroke can be secured without connecting a tube, etc. for supply of air. A movable body (3) having a pad part (73) and a fixed body (2) are provided. The movable body (3) is...
US20130201467 LARGE-MESH CELL-PROJECTION ELECTRON-BEAM LITHOGRAPHY METHOD  
A lithography method based on the projection of cells, notably direct-write electron-beam lithography. One of the main limitations of the methods of this type in the prior art is the writing time....
US20110037961 LITHOGRAPHIC APPARATUS COMPRISING AN INTERNAL SENSOR AND A MINI-REACTOR, AND METHOD FOR TREATING A SENSING SURFACE OF THE INTERNAL SENSOR  
A lithographic apparatus includes a projection system constructed and arranged to project a beam of radiation onto a target portion of a substrate, an internal sensor having a sensing surface, and...
US20090002663 PROJECTION ILLUMINATION SYSTEM  
A projection illumination system with a plurality of optical components (29, 32) includes an interferometer arrangement (37) whose components are arranged outside a projection beam path (17) of...
US20080049204 Multi-column type electron beam exposure apparatus  
A multi-column type electron beam exposure apparatus includes: plural column cells disposed over a wafer, each including an electron gun, deflector for deflecting an electron beam emitted by the...
US20090219501 OPTICAL UNIT USING OPTICAL ATTENUATOR AND PRINTING APPARATUS PROVIDED THEREWITH  
An optical unit for a printing apparatus, and a printing apparatus that uses the optical unit. The optical unit includes a plurality of light emitting elements, a lens that collects light from the...
US20140362358 VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY  
A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located...
US20110273681 VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY  
A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located...
US20090097009 HOLDING DEVICE AND EXPOSURE APPARATUS  
A reticle is supported by flexible reticle holders at its +X and −X end portions, and therefore even if there is unevenness on the supported portions of the reticle, the surfaces of the reticle...
US20080304036 CATADIOPTRIC IMAGING SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD  
A catadioptric imaging optical system with a high numerical aperture and including an effective imaging region shaped optimally for use in a batch type exposure apparatus and having an imaging...
US20120281195 Multi-Method and Device with an Advanced Acousto-Optic Deflector (AOD) and a Dense Brush of Flying Spots  
The technology disclosed relates to improved acousto-optic deflectors (AODs). In particular, it relates to compensation for subtle effects not previously addressed by AOD designers. A shifting...
US20080273188 Device arranged to measure a quantity relating to radiation and lithographic apparatus  
A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles...
US20110273690 Maskless exposure apparatus and method of alignment for overlay in maskless exposure  
Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a...
US20120307219 CRISS-CROSS WRITING STRATEGY  
In general, one aspect of the technology described can be embodied in methods that include the action of applying a writing mechanism having non-isotropic writing properties resulting from...
US20100081093 EXPOSURE APPARATUS INSPECTION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE  
A mask pattern includes a first pattern having a line-and-space pattern extending in a first direction, a second pattern formed as a line-and-space pattern having a larger period than the first...
US20100114522 PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED ALIGNMENT CORRECTION METHODS  
Several embodiments of photolithography systems and associated methods of alignment correction are disclosed herein. In one embodiment, a method for correcting alignment errors in a...
US20120026479 OPTICAL IMAGING DEVICE AND METHOD FOR REDUCING DYNAMIC FLUCTUATIONS IN PRESSURE DIFFERENCE  
There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109),...
US20090161088 Beam Characterization Monitor for Sensing Pointing or Angle of an Optical Beam  
The divergence of an optical beam is determined. An optic is configured to provide internal reflection of at least a part of a beam of radiation scanned over varying angles of incidence on the...
US20080044741 Metrology systems and methods for lithography processes  
Metrology systems and methods for lithography processes are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes providing a mask having a plurality of corner...
US20150009482 EXTREME ULTRAVIOLET LITHOGRAPHY MASK  
An EUV mask includes a low thermal expansion material (LTEM) substrate, a reflective multilayer (ML) above one surface of the LTEM substrate, and a conductive layer above an opposite surface of...
US20080239269 Laser beam formatting module and method for fabricating semiconductor dies using same  
According to one exemplary embodiment, a laser beam formatting module for use in a lithographic system to fabricate a semiconductor wafer comprises an aperture plate having, for example, a...
US20100002210 INTEGRATED INTERFERENCE-ASSISTED LITHOGRAPHY  
A lithography scanner and track system is provided that includes an interference lithography system according to one embodiment. The scanner provides a first optical exposure of a wafer. The track...