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US20110194093 POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT AND AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A polarization-influencing optical arrangement includes a pair, which includes a first lambda/2 plate and a second lambda/2 plate. The first and second lambda/2 plates partially overlap each other...
US20060176454 Exposure apparatus for liquid crystal panel and exposure apparatus  
A composite ceramic material with a honeycomb structure which is composed by adding glass into silicon carbide is used for a mask stage (2) and a substrate stage (12) in an exposure apparatus...
US20090035669 WORK POSITION INFORMATION OBTAINING METHOD AND APPARATUS  
A work position information obtaining apparatus capable of obtaining a position of a work with respect to a table with high accuracy. Moving a table with a work placed thereon relative to an...
US20080049202 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY  
The disclosure relates to a projection exposure apparatus for semiconductor lithography comprising optical elements and at least one sensor for determining the temperature of regions of at least...
US20100053588 Substrate Stage movement patterns for high throughput While Imaging a Reticle to a pair of Imaging Locations  
A new and useful optical imaging process is provided for imaging of a plurality of substrates, in a manner that makes efficient use of an optical imaging system with the capability to image a...
US20080186466 ELEMENT FOR DEFOCUSING TM MODE FOR LITHOGRAPHY  
A method for imaging a mask pattern with small features through a lithographic system includes an illumination source and providing a uniaxial material having an ordinary index of refraction and a...
US20150261103 Immersion Litography System Using A Sealed Wafer Bath  
Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a...
US20110228246 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
US20080024743 Lithography system, method of heat dissipation and frame  
The present invention relates to a lithography system for projecting an image or an image pattern on to a target such as a wafer. Energy that is accumulated in the target by the projection of the...
US20110157573 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD  
A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first...
US20090244502 Methods of Compensating Lens Heating, Lithographic Projection System and Photo Mask  
Embodiments relate to compensating for lens heating, lithographic projection system and photo mask. Accordingly, lens heating is compensated by providing a layout pattern including a regular...
US20100026974 Cooling of Actuator Coils  
In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an...
US20070254493 Integrated thermal unit having vertically arranged bake and chill plates  
An integrated thermal unit comprising a housing; a bake station positioned within the housing, the bake station comprising a bake plate configured to heat a substrate supported on a surface of the...
US20090201481 OPTICAL ELEMENT AND ILLUMINATION OPTICS FOR MICROLITHOGRAPHY  
The disclosure relates to an optical element and illumination optics for microlithography. The optical element can be configured to influence a nominal beam angle, preset over a beam...
US20150198891 METHOD FOR ASSIGNING A PUPIL FACET OF A PUPIL FACET MIRROR OF AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS TO A FIELD FACET OF A FIELD FACET MIRROR OF THE ILLUMINATION OPTICAL UNIT  
Methods are disclosed for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the...
US20080204680 PURGE SYSTEM FOR A SUBSTRATE CONTAINER  
A purging station with a substrate container receiving zone having at least one upwardly extending purging nozzle. The nozzle has a circular engaging lip. The substrate container has support means...
US20140333915 Radiation Source  
A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of...
US20140368802 RADIATION SOURCE  
A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel...
US20090273765 IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR AN IMMERSION LITHOGRAPHY MACHINE  
The present invention provides an immersion flow field maintenance system for an immersion lithography machine, the lithography machine including a projection objective lens, at least a wafer...
US20110157567 LIQUID IMMERSION SCANNING EXPOSURE SYSTEM USING AN IMMERSION LIQUID CONFINED WITHIN A LENS HOOD  
A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a...
US20150055107 MICROELECTROMECHANICAL MIRROR ASSEMBLY  
An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element...
US20060170896 Interferometric lithographic projection apparatus  
A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The...
US20090059196 Systems and Methods for In-Situ Reflectivity Degradation Monitoring of Optical Collectors Used in Extreme Ultraviolet (EUV) Lithography Processes  
Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes are described. In one embodiment, a method...
US20080299499 EXPOSURE METHOD, METHOD OF MANUFACTURING PLATE FOR FLAT PANEL DISPLAY, AND EXPOSURE APPARATUS  
An exposure method facilitating the formation of a fine pattern on a plate. The exposure method illuminates a mask with illumination light and exposes a plate using a mask pattern of the mask. The...
US20130052569 EXPOSURE APPARATUS FOR FORMING A RETICLE AND METHOD OF FORMING A RETICLE USING THE SAME  
A method including loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first and second pattern aperture so the first pattern aperture is overlapped by a...
US20110063590 OPTICAL ELEMENT MODULE  
An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical...
US20120206704 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY  
An illumination optical unit for projection lithography for illuminating an object field, in which an object to be imaged can be arranged, with illumination light has a field facet mirror having a...
US20120122030 COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more...
US20100039635 Filter Device Disposed in Reticle Library of Lithography System  
A filter device disposed in the reticle library of a lithography system, the lithography system comprising: a light emitting unit for providing a light source, a reticle library disposed with a...
US20070126998 Adding at least one picture to a contact detail in a communications device  
A communications device (100) and method for adding at least one picture to a contact detail in a phone book (132) stored in the communications device is disclosed. The method includes storing...
US20100053575 Thermal Control For EUV Lithography  
A method of patterning an integrated circuit including generating a thermal profile of a reticle is provided. The thermal profile of the reticle may illustrate heat accumulation (e.g., a...
US20150036116 APERTURE FOR PHOTOLITHOGRAPHY  
An aperture is configured to be disposed between an illumination source and a semiconductor substrate in a photolithography system. The aperture includes a light-transmission portion with a...
US20090251673 TRANSMITTING OPTICAL ELEMENT WITH LOW FOREIGN-ELEMENT CONTAMINATION  
A transmitting optical element of polycrystalline material that includes crystallites of magnesium spinel MgAl2O4 or lutetium-aluminum garnet Lu3Al5O12, wherein the polycrystalline material...
US20100225890 METHOD FOR EVALUATING FLARE IN EXPOSURE TOOL  
A method for evaluating flare of an exposure tool has measuring a first reference integral exposure amount of illumination light emitted from the light source, and a unit reference integral...
US20130340637 METHOD AND APPARATUS FOR LOADING AND UNLOADING FLEXOGRAPHIC PLATES FOR COMPUTER-TO-PLATE IMAGING INCLUDING SEPARATE LOADING AND UNLOADING AREAS  
An apparatus for and a method of loading and unloading of plates to and from an imager. The apparatus includes a loading area holding one single or a plurality of plates and an unloading area...
US20130155385 VACUUM CHAMBER ASSEMBLY FOR SUPPORTING A WORKPIECE  
A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal...
US20080239266 EXPOSURE METHOD, EXPOSURE APPARATUS, LIGHT CONVERGING PATTERN FORMATION MEMBER, MASK, AND DEVICE MANUFACTURING METHOD  
An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate;...
US20090135396 ILLUMINATING OPTICAL APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An illumination optical apparatus is able to individually illuminate two regions separate from each other, under required illumination conditions. The illumination optical apparatus comprises a...
US20080245975 Electrically Programmable Reticle and System  
An electrically programmable reticle is made using at least one electrochromatic layer that changes its optical transmissibility in response to applied voltages. Transparent conductor layers are...
US20130258310 Metrology Method and Apparatus, Lithographic System and Device Manufacturing Method  
A lithographic process is used to form a plurality of target structures (T) on a substrate (W). Each target structure comprises overlaid gratings each having a specific overlay bias. Asymmetry (A)...
US20070008513 Exposing apparatus having substrate chuck of good flatness  
An exposing apparatus comprises a mask stage, a supporter that supports the mask stage, a substrate below the mask stage, and a substrate chuck that supports the substrate. The exposing apparatus...
US20120307216 TEMPERATURE SENSING PROBE, BURL PLATE, LITHOGRAPHIC APPARATUS AND METHOD  
A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised...
US20070139630 Changeable Slit to Control Uniformity of Illumination  
Methods and apparatus for controlling illumination uniformity by altering the size of a slit are disclosed. According to one aspect of the present invention, an apparatus includes a light source,...
US20050231695 Method and system for immersion lithography using high PH immersion fluid  
A method and system is disclosed for conducting immersion photolithography. The system includes at least one lens for transmitting a predetermined radiation on a predetermined product substrate,...
US20080174758 REPLACEMENT DEVICE FOR AN OPTICAL ELEMENT  
Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination...
US20080138623 Substrate comprising a mark  
A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a...
US20080284994 REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY  
A method for reducing contamination in immersion lithography includes retaining a semiconductor wafer on a support surface of a wafer chuck, the wafer chuck having a gap therein, the gap located...
US20050058948 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced  
Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate....
US20110205517 OPTICAL ELEMENT MOUNT FOR LITHOGRAPHIC APPARATUS  
A mount configured to mount an optical element in a module for a lithographic apparatus. The mount includes a plurality of resilient members constructed and arranged to circumferentially support...
US20060110693 Exposure method and apparatus, exposure mask, and device manufacturing method  
Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a...