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US20120205558 Tools, Methods and Devices for Mitigating Extreme Ultraviolet Optics Contamination  
Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective...
US20120099089 APPARATUS AND METHODS FOR MEASURING THERMALLY INDUCED RETICLE DISTORTION  
An apparatus and method for measuring thermo-mechanically induced reticle distortion or other distortion in a lithography device enables detecting distortion at the nanometer level in situ. The...
US20070126999 Apparatus and method for containing immersion liquid in immersion lithography  
Immersion liquid is contained in the immersion area located between the last optical member of a projection system and a surface that is the subject of exposure by providing a liquid seal located...
US20110014573 SYSTEM FOR ENGRAVING FLEXOGRAPHIC PLATES  
A system for engraving flexographic printing plates includes a flexographic printing plate comprised of at least two ablation layers, a printing ablation layer and a non-printing ablation layer....
US20090075217 TAPERED EDGE BEAD REMOVAL PROCESS FOR IMMERSION LITHOGRAPHY  
A method and apparatus for forming a tapered photoresist edge. The method includes: forming a photoresist layer on a substrate; exposing a first annular region of the photoresist layer adjacent to...
US20100020299 INSTRUMENTATION AND METHOD FOR MASKLESS PHOTOLITHOGRAPHY  
There is disclosed a maskless photolithography apparatus and method where image patterns are determined by the user during visualization of a mounted material on a substrate with a microscope, and...
US20110096313 Constrained Optimization Of Lithographic Source Intensities Under Contingent Requirements  
A method for illuminating a mask to project a desired image pattern into a photoactive material is described. The method includes receiving an image pattern. Determining a relationship between...
US20090262327 MASK TRANSPORT SYSTEM CONFIGURED TO TRANSPORT A MASK INTO AND OUT OF A LITHOGRAPHIC APPARATUS  
A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a...
US20060001851 Immersion photolithography system  
In immersion photolithography, immersion fluid is located between a wafer and a lens for projecting an image onto the wafer through the immersion fluid. In order to inhibit evaporation from the...
US20090323078 METHOD AND SYSTEM FOR STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY  
A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the...
US20050007567 Contact or proximity printing using a magnified mask image  
Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended...
US20090004581 Exposure apparatus, exposure method and optical proximity correction method  
There is disclosed an exposure apparatus which includes an illumination optical system including a light source which emits illumination light, a mask stage which holds a photomask having a mask...
US20090257041 Illuminator for a Photolithography Device  
The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a...
US20080231826 UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY  
A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated...
US20110211180 OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT  
An optical component includes an optical element, a mount for the optical element, and a temperature control device configured to control a temperature of a part of the mount based on at least one...
US20080266539 Exposure system, device production system, exposure method, and device production method  
A device production system includes a substrate transport section which transports a substrate; a plurality of exposure sections each of which is capable of exposing the substrate; and a...
US20090310111 Pulse to Pulse Energy Equalization of Light Beam Intensity  
A system for equalizing pulse to pulse energy of a light beam includes a group of optical devices including an optical device configured to exhibit third order nonlinear properties. Transmission...
US20080094674 Holographic Lithography  
A method of generating a holographic diffraction pattern and a holographic lithography system are disclosed. The method involves defining at least one geometrical shape; generating at least one...
US20090219496 Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning  
Double patterning a photo sensitive layer stack, is disclosed including providing a substrate being coated with a first and a second photo resist layer, exposing both photo resist layers by...
US20070258061 System and method for using a two part cover and a box for protecting a reticle  
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part...
US20120257177 ILLUMINATION DESIGN FOR LENS HEATING MITIGATION  
A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design,...
US20090147226 Inner Surface Exposure Apparatus and Inner Surface Exposure Method Technical Field  
An apparatus and a method for exposing a photosensitive material deposited on the inner surface of a tube such as a circular or polygonal tube to light to form a predetermined exposed pattern are...
US20100097594 APPARATUS FOR FABRICATING AND OPTICALLY DETECTING BIOCHIP  
An apparatus for fabricating a biochip is provided. The apparatus includes a reaction chamber which encapsulates the biochip to be sealed form an external environment. The apparatus further...
US20150261094 Collector in an Extreme Ultraviolet Lithography System with Optimal Air Curtain Protection  
The present disclosure provides an extreme ultraviolet (EUV) radiation source module. The EUV radiation source module includes a collector designed to collect and reflect EUV light; a solid cover...
US20080106714 Alignment Information Display Method And Its Program, Alignment Method, Exposure Method, Device Production Process, Display System, Display Device, And Program And Measurement/Inspection System  
[PROBLEM] To provide an information display method enabling efficient analysis and evaluation of alignment results and thereby facilitating the setting of effective alignment conditions or...
US20130235363 DEVICE-SPECIFIC MARKINGS  
Producing a plurality of electronic devices by a technique including photolithographically patterning a layer of conductive material (3), and defining at least one device-specific mark (3a) of a...
US20100053583 EXPOSURE APPARATUS WITH AN ILLUMINATION SYSTEM GENERATING MULTIPLE ILLUMINATION BEAMS  
An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously...
US20110261344 EXPOSURE METHOD  
A method for exposing a surface of a target in a system comprising a set of sensors (30) for measuring distance to the target. The method comprises clamping the target to a moveable table (134),...
US20090033907 DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES  
Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding...
US20090115980 Illumination system and filter system  
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter...
US20140368806 Grid Refinement Method  
The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern...
US20130273474 Grid Refinement Method  
The present disclosure provides an embodiment of a method, for a lithography process for reducing a critical dimension (CD) by a factor n wherein n<1. The method includes providing a pattern...
US20060044534 Photographic film processor  
A check label on which an order identification number and a bar code thereof are recorded is attached to a leading portion of a photographic film and an envelope for containing the photographic...
US20090185155 LITHOGRAPHY SYSTEM WITH ILLUMINATION MONITOR  
A lithographic system including a light source configured to provide a light beam, a mask stage configured to hold a mask having a mask pattern, a wafer stage having a surface configured to hold a...
US20140247438 RETICLE DEFECT CORRECTION BY SECOND EXPOSURE  
Correction of reticle defects, such as EUV reticle defects, is accomplished with a second exposure. Embodiments include obtaining a reticle with a first pattern corresponding to a design for a...
US20060109445 Maskless lithography system and method  
In a lithographic system, data transmission is carried out by means of a powerful electro-optical free-beam connection system enabling optical pattern data to be guided from light exit places to...
US20070019180 Image-forming device having brush/drum processor  
An image-forming device includes a processing member in the form of a brush/drum processor. The processing member includes a rotatable vacuum drum with a surface that is adapted to receive an...
US20080304027 Cooling apparatus and substrate treating apparatus  
The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The...
US20070242256 Lithographic apparatus, lens interferometer and device manufacturing method  
Lithographic Apparatus, Lens Interferometer and Device Manufacturing Method A lithographic apparatus includes an illumination system that is configured to condition a radiation beam; a projection...
US20100060871 OFF-AXIS LIGHT SOURCE, LIGHT SCREEN PLATE, AND METHOD OF DEFINING DIFFERENT TYPES OF PATTERNS WITH SINGLE EXPOSURE  
An off-axis light source is described, including an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at the illumination surface thereof,...
US20070070320 METHOD FOR ABERRATION EVALUATION IN A PROJECTION SYSTEM  
Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging onto the image plane with the system....
US20140139815 IN-SITU METROLOGY  
Metrology methods and systems are provided, which measure metrology targets during the exposure stage using reflected or diffracted exposure illumination or additional simultaneous illumination...
US20080225253 Damper for a stage assembly  
A stage assembly (220) that moves a work piece (200) along a first axis includes a stage base (236), a guide bar (238), a device table (240) that retains the work piece (200), a mover assembly...
US20100020301 Exposure Device and Method for Producing the Same  
There is provided an exposure device including an exposure head having a light-emitting member which has a plurality of light-emitting sections arranged in a row and a casing which holds the...
US20090244504 PROJECTION EXPOSURE METHOD  
A projection exposure method that projects the shape of a hole onto a wafer by projecting a diffracted light, which is produced by applying light to a mask having a pattern for forming a hole...
US20090207398 Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member  
An exposure mask in which exposure of an exposure object is carried out on the basis of near field light leaking from a plurality of openings provided in a light blocking member in a mutually...
US20080030706 Illumination optical system, exposure method and designing method  
Exposure for performing patterning in which micropatterns differing in pitch exist in close vicinity to one another is handled, and micropatterns are formed with high accuracy with sufficient...
US20140152966 FACILITY AND METHOD FOR TREATING SUBSTRATE  
Provided is a method of a substrate treatment. The method includes providing an operation module with substrates contained in a lot and performing an operation treatment thereon and performing a...
US20050151955 Method and apparatus for a reticle with purged pellicle-to-reticle gap  
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical...
US20090100392 Securing Authenticity of Integrated Circuit Chip  
A system and method are provided for securely manufacturing a device at a foundry. For example, an integrated circuit chip may be securely fabricated at an untrusted foundry by later verifying...