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US20120140199 MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK  
A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the...
US20120069317 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION  
The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is...
US20140078478 METHOD OF OPTIMIZING LITHOGRAPHY TOOLS UTILIZATION  
A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography...
US20140362363 METHODS FOR MONITORING SOURCE SYMMETRY OF PHOTOLITHOGRAPHY SYSTEMS  
A method for monitoring the source symmetry of a photolithography system is provided. The method includes providing a first reticle; and providing a second reticle. The method also includes...
US20130229638 SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING  
Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an...
US20140268092 Extreme Ultraviolet Lithography Process and Mask  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. These different states of the EUV mask...
US20110069288 Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method  
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle...
US20100328638 LED LIGHT SOURCE, ITS MANUFACTURING METHOD, AND LED-BASED PHOTOLITHOGRAPHY APPARATUS AND METHOD  
This invention provides a structurally-simple LED light source that is capable of preventing temperature variations among its multiple LED elements arranged densely on its LED-mounting substrate...
US20130250260 PELLICLES FOR USE DURING EUV PHOTOLITHOGRAPHY PROCESSES  
Disclosed herein are various pellicles for use during extreme ultraviolet (EUV) photolithography processes. An EUV radiation device disclosed herein includes a reticle, a substrate support stage,...
US20110019173 Diffraction Elements for Alignment Targets  
A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered...
US20110080566 METHOD FOR REPLICATING PRODUCTION OF 3D PARALLAX BARRIER  
A method for replicating production of a 3D parallax barrier is capable of transfer-printing a 3D parallax barrier pattern on a planar transparent substrate mainly with a glass photo mask having...
US20140268086 Extreme Ultraviolet Lithography Process and Mask  
The present disclosure is directed towards lithography processes. In one embodiment, a patterned mask is provided. An information of a position of diffraction light (PDL) on a pupil plane of a...
US20130201468 LITHOGRAPHY METHOD WITH COMBINED OPTIMIZATION OF RADIATED ENERGY AND DESIGN GEOMETRY  
A lithography method for a pattern to be etched on a support, notably to a method using electron radiation with direct writing on the support. Hitherto, the methods for correcting the proximity...
US20140218714 SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE  
A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber...
US20120092640 Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage  
Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a...
US20140218713 Extreme Ultraviolet Lithography Process  
A process of an extreme ultraviolet lithography is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask, an EUV radiation source and an illuminator. The process also...
US20150032002 INTERCONNECTABLE ULTRASOUND TRANSDUCER PROBES AND RELATED METHODS AND APPARATUS  
Ultrasound devices and methods are described, including a repeatable ultrasound transducer probe having ultrasonic transducers and corresponding circuitry. The repeatable ultrasound transducer...
US20110188023 LITHOGRAPHIC IMAGING AND PRINTING WITHOUT DEFECTS OF ELECTROSTATIC ORIGIN  
Embodiments of the present invention involve three-layer printing members having a central layer that is non-conductive yet abalatable at commercially realistic fluence levels. In various...
US20100066990 IMAGING DEVICE WITH EXCHANGEABLE DIAPHRAGMS AND METHOD THEREFOR  
The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding...
US20090244512 LITHOGRAPHY PROCESS WINDOW ANALYZING METHOD AND ANALYZING PROGRAM  
A lithography process window analyzing method for setting a process window based on ranges of exposure amounts and focus positions, and giving evaluation of reliability of the set process window,...
US20110228242 Method and apparatus for performing alignment using reference board  
An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a...
US20090303454 EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM  
An exposure apparatus (10) for transferring a mask pattern (358) from a mask (12) to a substrate (14) includes a mask retainer (44), a substrate stage assembly (24), and an illumination system...
US20080106719 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same  
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of...
US20110255069 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20100039634 EXPOSURE APPARATUS FOR DISPLAY AND EXPOSING METHOD USING THE SAME  
Provided is an exposure apparatus, including a plurality of exposure lamps and a luminance changing mechanism disposed between the exposure lamps and an exposure target. The luminance changing...
US20150055114 LAYERED RADIATION-SENSITIVE MATERIALS WITH VARYING SENSITIVITY  
A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and applying a second radiation-sensitive material...
US20090284721 RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS  
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by...
US20090091729 Lithography Systems and Methods of Manufacturing Using Thereof  
Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system...
US20060055911 High resolution printer and a method for high resolution printing  
The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method includes: (i) determining multiple intermediate schemes such...
US20140268091 Extreme Ultraviolet Lithography Process and Mask  
A system and process of an extreme ultraviolet lithography (EUVL) is disclosed. The system and process includes receiving a mask with two states, which have 180 degree phase difference to each...
US20080063982 Fluids and methods of forming thereof  
Fluids for use in immersion lithography systems and methods of forming thereof are disclosed. In accordance with a preferred embodiment, a fluid for immersion lithography includes a liquid and a...
US20120133916 WAFER LEVEL OPTICAL ELEMENTS AND APPLICATIONS THEREOF  
In one aspect, the present invention provides a wafer level optical assembly comprising a first wafer level optical element, the first wafer level optical element comprising a first alignment...
US20120026474 Reticle Cooling in a Lithographic Apparatus  
An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an...
US20100302520 CLUSTER E-BEAM LITHOGRAPHY SYSTEM  
A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where...
US20110051116 Substrate Matrix To Decouple Tool And Process Effects  
A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix,...
US20120127440 OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY  
An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent...
US20100060878 EXPOSURE APPARTUS, EXPOSURE METHOD AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE  
A chuck 10 which supports a substrate 1 is moved by using an X-direction stage 5, and a position of the chuck 10 is detected at the same time. A traveling error of the X-direction stage 5 is...
US20150146188 METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OVERLAY, AND A COMBINATION OF A LITHOGRAPHIC APPARATUS AND AN OVERLAY MEASUREMENT SYSTEM  
A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes...
US20140368805 DESIGN METHOD OF EXTREME ULTRAVIOLET LITHOGRAPHY PROJECTION OBJECTIVE  
A design method of extreme ultraviolet lithography projection objective comprises: determining the optical design parameters of the lithography projection objective, setting the projection...
US20140078479 IMAGE OPTIMIZATION USING PUPIL FILTERS IN PROJECTING PRINTING SYSTEMS WITH FIXED OR RESTRICTED ILLUMINATION ANGULAR DISTRIBUTION  
A pupil filter can be designed for any combination of an illumination lens and for various types of lithographic features. The pupil filter can be placed at the pupil plane of a projection optics...
US20100085554 ADAPTOR OF AN ALIGNER SYSTEM  
An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and...
US20140191372 SPACER ASSISTED PITCH DIVISION LITHOGRAPHY  
Spacer-based pitch division lithography techniques are disclosed that realize pitches with both variable line widths and variable space widths, using a single spacer deposition. The resulting...
US20100053590 SYSTEM AND METHOD FOR MANUFACTURING A FLAT PANEL DISPLAY  
A method for manufacturing a flat panel display is presented. The method includes: transferring a first mask from a first mask loading/unloading part onto a main mask-stage by a first...
US20120081682 MASKLESS EXPOSURE APPARATUS AND METHOD TO DETERMINE EXPOSURE START POSITION AND ORIENTATION IN MASKLESS LITHOGRAPHY  
According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment...
US20060017910 Composite printing  
Systems and techniques for printing substrates. In one implementation, a method includes patterning a substrate with a substantially arbitrary arrangement of features by introducing irregularity...
US20140268090 CROSS TECHNOLOGY RETICLE (CTR) OR MULTI-LAYER RETICLE (MLR) CDU, REGISTRATION, AND OVERLAY TECHNIQUES  
Methods for reducing reticle transmission differences and for optimizing layer placement for overlay in MTRs and CTRs are disclosed. Embodiments include providing a reticle having a prime area and...
US20090195768 Alignment Mark and a Method of Aligning a Substrate Comprising Such an Alignment Mark  
An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a...
US20100302525 Lithographic Apparatus and Method for Illumination Uniformity Correction and Uniformity Drift Compensation  
A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam....
US20090040536 MARK FOR ALIGNMENT AND OVERLAY, MASK HAVING THE SAME, AND METHOD OF USING THE SAME  
A mark for alignment and overlay, a mask having the same, and a method of using the same are provided. The mark includes a first mark pattern and a second mark pattern. The first mark pattern...
US20110075124 Source and Mask Optimization By Changing Intensity and Shape of the Illumination Source  
An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation...