Match Document Document Title
US20110001954 CHUCKING SYSTEM WITH RECESSED SUPPORT FEATURE  
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward...
US20150205193 PELLICLE FOR EUV, AND AN ASSEMBLY INCLUDING THE PELLICLE, AND A METHOD FOR ASSEMBLING THE SAME  
Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus...
US20120069317 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION  
The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation, for example part of the floor in the room where the lithography system is...
US20150036117 MASKLESS NANOIMPRINT LITHOGRAPHY  
A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined...
US20120162628 Actuator  
An actuator comprising a first part and a second part, the first part being configured to move relative to the second part, wherein a labyrinth seal is provided between the first part and the...
US20130114061 DOUBLE PASS INTERFEROMETRIC ENCODER SYSTEM  
An encoder head includes one or more components arranged to: i) direct a first incident beam to the diffractive encoder scale at a first incident angle with respect to the encoder scale; ii)...
US20130128254 Thermally Stable Optical Sensor Mount  
Disclosed is an apparatus including a mechanical reference frame and a rigid object mechanically coupled to the reference frame by two or more constraints. The stiffnesses of at least two of the...
US20120069316 METHODS FOR LIMITING COUNTER-MASS TRIM-MOTOR FORCE AND STAGE ASSEMBLIES INCORPORATING SAME  
An exemplary stage assembly has movable stage mass and counter-mass. A stage motor is coupled to the stage mass and counter-mass such that stage-mass motion imparted by the stage motor causes a...
US20120092640 Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage  
Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a...
US20110228242 Method and apparatus for performing alignment using reference board  
An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a...
US20100315617 WAFER STAGE  
A wafer stage and a method of supporting a wafer for inspection. the wafer stage comprises a platform for supporting a wafer such that a backside of the wafer is suspended above a cavity of the...
US20150077733 Method of Overlay In Extreme Ultra-Violet (EUV) Lithography  
Some embodiments of the present disclosure relate to a method of overlay control which utilizes a deformable electrostatic chuck. The method comprises exposing a substrate to radiation which is...
US20070211232 Thermophoretic Techniques for Protecting Reticles from Contaminants  
Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a...
US20150144789 VACUUM CHAMBER WITH BASE PLATE  
A target processing machine (100), such as a lithography or inspection machine, comprising a rigid base plate (150), a projection column (101) for projecting one or more optical or particle beams...
US20120320361 CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE  
Embodiments of the invention generally include a robot assembly comprising a robot operable to position a substrate at one or more points within a plane, and a motion assembly having a motor...
US20110013170 DEVICE FOR TREATING SHEET-LIKE SUBSTRATES WITH LIGHT  
A device for treating sheet-like substrates with light is made for a suction table, which includes a circulating suction strip for transporting the sheet-like substrates, which suction strip forms...
US20130003036 PHOTO MASK UNIT COMPRISING A PHOTOMASK AND A PELLICLE AND A METHOD FOR MANUFACTURING THE SAME  
It is an object of the present invention to provide a photomask unit suitable for forming a microscopic pattern of 32 nm or smaller on a photoresist film using the EUV exposure technique and being...
US20140204358 MAGNETIC SENSOR CALIBRATION AND SERVO FOR PLANAR MOTOR STAGE  
A stage assembly for positioning a device includes: (i) a stage that retains the device; (ii) a base; (iii) a mover assembly that moves the stage along a first axis, along a second axis, and along...
US20130010277 System and Method for Using a Two Part Cover and a Box for Protecting a Reticle  
Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part...
US20150116686 EDGE-DOMINANT ALIGNMENT METHOD IN EXPOSURE SCANNER SYSTEM  
An edge-dominant alignment method for use in an exposure scanner system is provided. The method includes the steps of: providing a wafer having a plurality of shot areas, wherein each shot area...
US20130135603 C-CORE ACTUATOR FOR MOVING A STAGE  
A mover assembly (46) for moving a stage (14) includes an actuator (30) that is coupled to the stage (14). The actuator (30) includes (i) a C-Core (52) having a generally ā€œCā€ shape and including a...
US20120127447 METHOD FOR DETERMING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE  
A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover...
US20120113405 METHOD FOR DETERMINING A COMMUTATION OFFSET AND FOR DETERMINING A COMPENSATION MAP FOR A STAGE  
A method for determining a commutation offset for a mover (250A) of a mover assembly (220C) that moves and positions a stage (220A) relative to a stage base (220B) includes controlling the mover...
US20130038853 NANOMETER-PRECISION SIX-DEGREE-OF-FREEDOM MAGNETIC SUSPENSION MICRO-MOTION TABLE AND APPLICATION THEREOF  
A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a...
US20060061751 Stage assembly including a stage having increased vertical stroke  
A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a...
US20100271612 METHOD AND PELLICLE MOUNTING APPARATUS FOR REDUCING PELLICLE INDUCED DISTORTION  
An apparatus for mounting a pellicle onto a mask is provided. In one embodiment, the apparatus comprises a base provided with a track; a dummy plate holder coupled to the base, the dummy plate...
US20060033043 Stacked six degree-of-freedom table  
A table with six degrees of freedom, such as a wafer table for a lithography system, has an upper table stacked on top of a lower table. Each of these two stacked tables has three degrees of...
US20140085620 3D PRINTER WITH SELF-LEVELING PLATFORM  
3D printing systems and methods avoid build-compromising misalignments through the use of a self-leveling assembly that maintains a constant and typically fully parallel orientation between a...
US20050174551 Position control and heat dissipation for photolithography systems  
A photolithography system that uses a variable reluctance linear motor (VRLM) to move a reticle or wafer stage is described. In addition to moving the stage, one or more of the surfaces of the...
US20150241200 MULTI-AXIS DIFFERENTIAL INTERFEROMETER  
The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81,...
US20150212430 MAGNETIC DEVICE AND LITHOGRAPHIC APPARATUS  
A magnetic device, comprising a first part, a second part, a first magnetic part coupled to the first part and having a first magnetic polarization, a second magnetic part coupled to the second...
US20110157576 FLUID GAUGE WITH MULTIPLE REFERENCE GAPS  
A fluid gauge (222) for measuring the position of a work piece (200) includes a gauge body (236), a fluid source assembly (238), and a gauge control system (240). The gauge body (236) includes a...
US20090147237 Spatial Phase Feature Location  
Methods for locating an alignment mark on a substrate are described. Generally, the substrate includes one or more locator marks adjacent to a substrate alignment mark. Locator marks provide the...
US20100091261 OPERATING VALVE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening...
US20050270516 System for magnification and distortion correction during nano-scale manufacturing  
The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to...
US20130088703 REACTION ASSEMBLY FOR A STAGE ASSEMBLY  
A reaction assembly 18 for a stage assembly 10 that moves a device 26 along a first axis includes a base countermass 40 and a first transverse countermass 42. The stage assembly 10 includes a...
US20150080802 Novel Method To Fabricate Polymeric Microneedles  
The present disclosure relates generally to microneedle devices and methods for fabricating microneedles from a biocompatible polymer using photolithography. More particularly, aspects of the...
US20080266539 Exposure system, device production system, exposure method, and device production method  
A device production system includes a substrate transport section which transports a substrate; a plurality of exposure sections each of which is capable of exposing the substrate; and a...
US20110261344 EXPOSURE METHOD  
A method for exposing a surface of a target in a system comprising a set of sensors (30) for measuring distance to the target. The method comprises clamping the target to a moveable table (134),...
US20080225253 Damper for a stage assembly  
A stage assembly (220) that moves a work piece (200) along a first axis includes a stage base (236), a guide bar (238), a device table (240) that retains the work piece (200), a mover assembly...
US20070008513 Exposing apparatus having substrate chuck of good flatness  
An exposing apparatus comprises a mask stage, a supporter that supports the mask stage, a substrate below the mask stage, and a substrate chuck that supports the substrate. The exposing apparatus...
US20130182235 MEASUREMENT SYSTEM THAT INCLUDES AN ENCODER AND AN INTERFEROMETER  
A stage assembly (10) for positioning a device (22) along a first axis includes (i) a stage (14) that retains the device (22); (ii) a mover assembly (16) that moves the stage (14) along the first...
US20110157575 MASK FRAME ASSEMBLY FOR THIN LAYER DEPOSITION AND ORGANIC LIGHT EMITTING DISPLAY DEVICE  
A mask frame assembly for thin film deposition is disclosed. In one embodiment, the assembly includes: a frame, and a plurality of unit mask strips attached to the frame, wherein each of the unit...
US20140253898 PELLICLE MOUNTING SYSTEM AND METHOD  
A pellicle mounting method is provided. The method includes aligning a mounting apparatus with a top surface of a pellicle frame, the mounting apparatus having a continuous duct extending...
US20090279067 Stage System and Lithographic Apparatus Comprising Such Stage System  
A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder...
US20080143994 Drive Method of Moving Body, Stage Unit, and Exposure Apparatus  
An exposure apparatus that comprises a stage (28) that moves in the X-axis direction, an X-axis linear motor (80) that drives the stage, a counter mass (30) that moves in a direction opposite to...
US20080151213 Bearing Device, Stage Device, and Exposure Apparatus  
A sufficient moving stroke can be secured without connecting a tube, etc. for supply of air. A movable body (3) having a pad part (73) and a fixed body (2) are provided. The movable body (3) is...
US20120099094 DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS  
A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing...
US20090311613 Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same  
A mask for exposure, which is used in a multi-column electron beam exposure apparatus having multiple column cells, includes a stencil pattern group constituted by multiple stencil patterns for...
US20090033899 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE  
The movable stages carry chucks 10a and 10b and move towards secondary stage bases 11a and 11b and a primary stage base 11, thereby positioning the substrate 1 on the primary stage base 11. Each...