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US20130038852 RETICLE REMOVING APPARATUS AND RETICLE REMOVING METHOD USING THE SAME  
A reticle removing apparatus adapted to remove a reticle in a reticle library of an exposure apparatus is provided. The reticle removing apparatus includes a bracket and a reticle removing module...
US20110051114 OPTIMIZED POLARIZATION ILLUMINATION  
Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an...
US20110032502 POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD  
Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion...
US20080285003 Linear motor driven automatic reticle blind  
A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle...
US20090296064 ILLUMINATION SYSTEM FOR SIZING FOCUSED SPOTS OF A PATTERNING SYSTEM FOR MASKLESS LITHOGRAPHY  
An optical system for producing a pattern of focused spots, such as a maskless lithographic projection system, includes an illuminator, a pattern generator, and an imager. The illuminator includes...
US20090268187 EXPOSURE SYSTEM  
An exposure system includes a light source for generating an exposure light, a mask, a lens system, and a bandwidth-filtering module for narrowing bandwidth of the exposure light. The mask, the...
US20130107239 OPTICAL ARRANGEMENT FOR EUV LITHOGRAPHY AND METHOD FOR CONFIGURING SUCH AN OPTICAL ARRANGEMENT  
An optical arrangement, e.g. projection lens, for EUV lithography, provided with: a first optical element (22) having a reflective surface (31a) and a first substrate (32) composed of TiO2-doped...
US20100066990 IMAGING DEVICE WITH EXCHANGEABLE DIAPHRAGMS AND METHOD THEREFOR  
The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding...
US20090180088 Illumination Sources for Lithography Systems  
Illumination sources, lithography systems, and methods of processing and fabricating semiconductor devices are disclosed. In a preferred embodiment, an illumination source includes a first aperture...
US20130293862 POLARIZATION-MODULATING OPTICAL ELEMENT  
A microlithography optical system includes a projection objective and an illumination system that includes a temperature compensated polarization-modulating optical element. The temperature...
US20060104413 Mask repeater and mask manufacturing method  
A mask repeater for transferring the pattern of a master mask onto a real mask by exposure and transferring the pattern on the real mask onto a substrate such as a semiconductor wafer. The size of...
US20110122392 MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINATION OPTICAL UNIT  
An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second...
US20120307224 SPECTRAL PURITY FILTER  
A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least...
US20080068579 APERTURE UNIT AND EXPOSURE SYSTEM INCLUDING THE SAME, AND METHOD FOR REPLACING APERTURES OF THE APERTURE UNIT  
Provided are an aperture unit, an exposure system including the aperture unit, and a method for replacing an aperture of the aperture unit. The aperture unit rotates a revolver on which a plurality...
US20050151952 Photolithography system with variable shutter and method of using the same  
A photolithography system applied to the semiconductor process includes a light source, a shutter set, and a lens set. The shutter set has a variable opening area. The shutter set can include a...
US20090115986 Microlithography projection objective  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20100302525 Lithographic Apparatus and Method for Illumination Uniformity Correction and Uniformity Drift Compensation  
A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam....
US20100079741 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY  
A projection objective for use in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured...
US20130120730 FACET MIRROR DEVICE  
A facet mirror device includes a facet element and a support element which supports the facet element. The facet element includes a curved support section. The support element includes a support...
US20080030708 DEVICE MANUFACTURING METHOD  
A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to a...
US20140160456 OPTICAL APERTURE DEVICE  
An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is...
US20100099048 Stop Flow Interference Lithography System  
Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer...
US20100165317 Illumination aperture for optical lithography  
Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.
US20110222042 OPTICAL DEVICE AND DEVICE MANUFACTURING METHOD  
An optical device includes a wavelength separation filter configured to separate incident light into light having a first wavelength and light having a second wavelength, the wavelength separation...
US20090268186 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS  
A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an...
US20090059189 PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS  
A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle...
US20140176932 RETICLE, EXPOSURE APPARATUS INCLUDING THE SAME, AND EXPOSURE METHOD  
A reticle including exposure monitoring keys. The reticle includes an exposure region that is to be exposed to light during an exposure process, and a non-exposure region surrounding the exposure...
US20100039636 ILLUMINATION OPTICS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Illumination optics for a microlithographic projection exposure apparatus is used for illumination of an object field in the object plane with illumination light of a radiation source. The...
US20090004581 Exposure apparatus, exposure method and optical proximity correction method  
There is disclosed an exposure apparatus which includes an illumination optical system including a light source which emits illumination light, a mask stage which holds a photomask having a mask...
US20090257041 Illuminator for a Photolithography Device  
The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a...
US20100097594 APPARATUS FOR FABRICATING AND OPTICALLY DETECTING BIOCHIP  
An apparatus for fabricating a biochip is provided. The apparatus includes a reaction chamber which encapsulates the biochip to be sealed form an external environment. The apparatus further...
US20090115980 Illumination system and filter system  
A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system...
US20090185155 LITHOGRAPHY SYSTEM WITH ILLUMINATION MONITOR  
A lithographic system including a light source configured to provide a light beam, a mask stage configured to hold a mask having a mask pattern, a wafer stage having a surface configured to hold a...
US20070242256 Lithographic apparatus, lens interferometer and device manufacturing method  
Lithographic Apparatus, Lens Interferometer and Device Manufacturing Method A lithographic apparatus includes an illumination system that is configured to condition a radiation beam; a projection...
US20090244504 PROJECTION EXPOSURE METHOD  
A projection exposure method that projects the shape of a hole onto a wafer by projecting a diffracted light, which is produced by applying light to a mask having a pattern for forming a hole...
US20090207398 Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member  
An exposure mask in which exposure of an exposure object is carried out on the basis of near field light leaking from a plurality of openings provided in a light blocking member in a mutually...
US20080030706 Illumination optical system, exposure method and designing method  
Exposure for performing patterning in which micropatterns differing in pitch exist in close vicinity to one another is handled, and micropatterns are formed with high accuracy with sufficient...
US20110194093 POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT AND AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A polarization-influencing optical arrangement includes a pair, which includes a first lambda/2 plate and a second lambda/2 plate. The first and second lambda/2 plates partially overlap each other...
US20100039635 Filter Device Disposed in Reticle Library of Lithography System  
A filter device disposed in the reticle library of a lithography system, the lithography system comprising: a light emitting unit for providing a light source, a reticle library disposed with a...
US20090135396 ILLUMINATING OPTICAL APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An illumination optical apparatus is able to individually illuminate two regions separate from each other, under required illumination conditions. The illumination optical apparatus comprises a...
US20130258316 Tunable Wavelength Illumination System  
A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable...
US20090079953 USE OF PERFLUOROALKANES IN VACUUM ULTRAVIOLET APPLICATIONS  
This invention concerns liquid perfluoro-n-alkanes for use in applications demanding high transparency at UV wavelengths ranging from about 150 to 165 nm, especially 157 nm. Uses include optical...
US20110043782 SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS  
A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of...
US20090168041 PROJECTION APPARATUS  
A projection apparatus including an image display element for modulating illumination light, an illumination optical system for irradiating the illumination light onto the image display element, a...
US20080094600 ILLUMINATION DEVICE AND MASK FOR MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEM, AND RELATED METHODS  
Illumination devices and masks for microlithography projection exposure systems, as well as related systems and methods, are disclosed.
US20100073660 SPECTRALLY CONTROLLED HIGH ENERGY DENSITY LIGHT SOURCE PHOTOPOLYMER EXPOSURE SYSTEM  
A system for forming printing features (10) on a printing plate includes a high energy density light source (20) that has an emission spectrum that includes actinic radiation and non-actinic...
US20090251677 ILLUMINATING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
A projection exposure apparatus for microlithography has an illumination system with an EUV light source and an illumination optical unit to expose an object field in an object plane. A projection...
US20090168040 DIFFRACTIVE OPTICAL DEVICE, AND ALIGNER COMPRISING THAT DEVICE  
The invention relates to a pupil filter used for the illumination optical system of a semiconductor aligner or the like that can prevent a decrease in the quantity of light having transmitted...
US20100079740 IMAGE FORMING DEVICE PROVIDED WITH SENSOR  
An image forming device has a conveying member, a light source, a photo-sensor, a shutter member, a shutter driving unit, a reflecting member and a judging member. The shutter member located...
US20120147351 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER  
A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ<20 nm). The filter comprises a grid-like structure comprising a plurality of microscopic apertures ...
Matches 1 - 50 out of 359 1 2 3 4 5 6 7 8 >