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US20100002215 |
IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
An optical system is used in a detection unit of an exposure apparatus that projects an original pattern by exposure onto a substrate via a projection optical system. The detection unit detects a...
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US20100002213 |
PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE
A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is...
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US20100002214 |
IN-DIE FOCUS MONITORING WITH BINARY MASK
Focus monitoring for a photolithographic applications is provided by illuminating a photoresist layer with a light beam transmitted through a first binary mask to define a circuit pattern on an...
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US20090325087 |
Parallel Process Focus Compensation
Disclosed are systems, methods, and computer program products for parallel process focus compensation. Such methods may include three steps. First, a first sensor senses a top surface of a wafer to...
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US20090303453 |
MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS
A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting...
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US20090296059 |
MEASUREMENT APPARATUS, MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
The present invention provides a measurement apparatus which measures a wavefront aberration of a measurement target optical system, the apparatus including a fringe scanning unit configured to...
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US20090284722 |
METHOD FOR MONITORING FOCUS ON AN INTEGRATED WAFER
A method and apparatus are provided for improving the focusing of a substrate such as a wafer during the photolithography imaging procedure of a semiconductor manufacturing process. The invention...
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US20090274983 |
SCANNING EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
A scanning exposure apparatus ( 300 ) includes a first stage ( 325 ), a second stage ( 345 ), a projection optical system ( 330 ), a first measurement unit ( 20 ) arranged on the second stage ( 345...
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US20090262320 |
Method and Lithographic Apparatus for Acquiring Height Data Relating to a Substrate Surface
A method of positioning a target portion of a substrate with respect to a focal plane of a projection system uses a level sensor to perform height measurements of at least part of the substrate to...
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US20090231565 |
OPTICAL SYSTEM AND METHOD OF USE
A method for improving imaging properties of an optical system and an optical system of this type having improved imaging properties are described. The optical system can have a plurality of...
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US20090162798 |
Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus
A method of manufacturing a master plate includes the steps of forming a photoresist film on a substrate, disposing a photomask having a plurality of island radiation shields on the photoresist...
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US20090135389 |
METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS
A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification fields...
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US20090115985 |
POSITION DETECTOR, POSITION DETECTION METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
A position detector ( 16 ), configured to detect a position of a mark on an object to be detected, comprises an image pickup unit ( 34 ), an optical system, a noise obtaining unit ( 36 ) and a...
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US20090103068 |
EXPOSURE APPARATUS AND METHOD FOR PHOTOLITHOGRAPHY PROCESS
Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field....
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US20090081568 |
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
An exposure apparatus comprises a light source, a measuring instrument, a processor, and a controller, wherein the processor is configured to obtain a synthetic spectrum by synthesizing a spectrum...
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US20090073409 |
EXPOSURE SYSTEM AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
In an exposure system and semiconductor device manufacturing method relating to the present invention, an image of spatial image mark body through a reduction projection lens is projected onto a...
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US20090027643 |
COMPENSATION OF RETICLE FLATNESS ON FOCUS DEVIATION IN OPTICAL LITHOGRAPHY
A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate...
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US20090009742 |
OPTICAL ELEMENT DRIVING APPARATUS, BARREL, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
A permanent magnet fixed to a peripheral portion of a lens cell includes two magnets that are joined together so that the north poles face each other and the south poles are exposed. A first...
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US20080316445 |
Fluid Pressure Compensation for Immersion Lithography Lens
An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly ( 14 ) to project an image defined by...
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US20080297752 |
FOCUS SENSITIVE LITHOGRAPHIC APPARATUS, SYSTEMS, AND METHODS
A system includes an illuminator, a mask, and a measurement device. The illuminator includes a light source. The mask includes at least one focus determination pattern having a first pattern...
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US20080291416 |
OPTICAL MEMBER-HOLDING APPARATUS, METHOD FOR ADJUSTING POSITION OF OPTICAL MEMBER, AND EXPOSURE APPARATUS
There is provided is an optical member-holding apparatus which can hold a plurality of optical members of two different optical systems, even when the optical members exist in a common barrel in a...
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US20080278701 |
DEFOCUS DETERMINATION METHOD USING SUB-RESOLUTION FEATURE (SRF) PRINTING
The present application is directed to apparatus and methods for determining a magnitude of defocus and a direction of defocus for a photolithography process. A sub-resolution feature on a reticle...
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US20080239503 |
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an...
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US20080192220 |
METHOD FOR ADJUSTING A PROJECTION OBJECTIVE
A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the...
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US20080192221 |
METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE
A method for determining one or more process parameter settings of a photolithographic system is disclosed.
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US20080186466 |
ELEMENT FOR DEFOCUSING TM MODE FOR LITHOGRAPHY
A method for imaging a mask pattern with small features through a lithographic system includes an illumination source and providing a uniaxial material having an ordinary index of refraction and a...
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US20080186482 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
A scatterometer has a radiation source capable of emitting radiation in distinct first and second wavelength ranges. An adjustable optical element is provided to effect a chromatic correction as...
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US20080170215 |
Lithographic apparatus and device manufacturing method
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus...
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US20080165333 |
Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, the mask pattern is minimized in size. A projection exposure apparatus relatively moves...
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US20080143986 |
AUTO-ADJUST OF IMAGING MODULE MECHANICAL SETUP
An imaging member adjustment system for an imaging module includes an imaging field opposing the imaging module and positioning targets provided in connection with the imaging field. The imaging...
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US20080123072 |
Projection Head Focus Position Measurement Method And Exposure Method
The same test image pattern is projected onto different regions of a photosensitive material on a substrate by a projection head while one of a projection distance from the projection head to the...
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US20080111980 |
EXPOSURE APPARATUS EQUIPPED WITH INTERFEROMETER AND EXPOSURE APPARATUS USING THE SAME
An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe,...
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US20080100814 |
RETICLE MANAGEMENT SYSTEMS AND METHODS
Reticle management systems and methods. The system comprises at least one reticle and at least one cabinet with an inert gas environment. The cabinet comprises a plurality of storage spaces. When...
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US20080088812 |
Method for performing a focus test and a device manufacturing method
The invention relates to a method for a focus test. The method includes performing a first projection by using a radiation beam to project a first reference mark onto a substrate to generate a...
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US20080079921 |
Substrate Exposure Apparatus and Illumination Apparatus
An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the...
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US20080079920 |
Wafer exposure device and method
A wafer exposure device includes a wafer stage. An optical exposure system exposes a wafer on the wafer stage. A sensor block measures a distance to a wafer provided on the wafer stage. The sensor...
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US20080062394 |
Lithographic apparatus and device manufacturing method
A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged...
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US20080062395 |
EXPOSURE APPARATUS
With respect to each of a plurality of shots on a substrate, a line or surface is calculated which approximates a plurality of positions of the surface of the substrate detected by a detector with...
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US20080018874 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
In a scatterometric method differential targets with different sensitivities to parameters of interest are printed in a calibration matrix and difference spectra obtained. principal component...
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US20080013063 |
Optical imaging device
There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element ( 109 ),...
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US20080002170 |
Holding Device for an Optical Element in an Objective
A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged...
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