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US20150085266 DIFFERENTIAL DOSE AND FOCUS MONITOR  
A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose...
US20150220005 Real-Time Reticle Curvature Sensing  
A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle...
US20150253680 METHOD OF CALCULATING AMOUNT OF ABERRATION AND METHOD OF CALCULATING AMOUNT OF MISALIGNMENT  
A method of calculating the amount of aberration is provided according to an embodiment. In the method of calculating the amount of aberration, a simulation is performed to calculate for each...
US20140063478 Focus Recipe Determination for a Lithographic Scanner  
The present disclosure is directed to a method of determining one or more focus values for a lithographic scanner. According to an embodiment, an optical signal including at least a first variable...
US20100002213 PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE  
A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which...
US20130201463 SYSTEM AND METHOD FOR LITHOGRAPHY WITH LEVELING SENSOR  
Disclosed is a lithography system. The lithography system includes a radiation source for providing radiation energy; a reticle stage configured to hold a reticle; an imaging lens module...
US20130286369 Using Customized Lens Pupil Optimization to Enhance Lithographic Imaging in a Source-Mask Optimization Scheme  
A process for use in configuring a projection optics lithography system comprising providing a determination of pupil amplitude and phase optimization for the projection optics, for use in...
US20110261335 SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN IMMERSION LITHOGRAPHY  
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration...
US20070035709 End effector with integrated illumination system for reticle pre-alignment sensors  
An apparatus includes a first support structure configured to support an element that has an alignment marker. The apparatus also includes an alignment sensor comprising a light source that is...
US20150168851 INCREASING LITHOGRAPHIC DEPTH OF FOCUS WINDOW USING WAFER TOPOGRAPHY  
Various embodiments provide for topography aware optical proximity correction that can improve depth of focus during wafer lithography. The system can determine the topography of the wafer using...
US20090274983 SCANNING EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
A scanning exposure apparatus (300) includes a first stage (325), a second stage (345), a projection optical system (330), a first measurement unit (20) arranged on the second stage (345), and a...
US20110181854 FOCUS COMPENSATION FOR OPTICAL ELEMENTS AND APPLICATIONS THEREOF  
Optical imaging apparatus are provided having the desired focal properties, which can be manufactured and/or assembled at the wafer level.
US20150015860 Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography  
A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to...
US20110276125 Medical Devices, Methods of Producing Medical Devices, and Projection Photolithography Apparatus for Producing Medical Devices  
Stents and other medical devices that can have specific geometric configurations (curves, contours, tapers) and/or patterns (e.g., grooves) thereon, methods of making such medical devices, and...
US20060290911 Scanning photolithography apparatus and method  
A reticle having a reticle pattern is mounted with a scanning photolithography apparatus. The reticle pattern adapted to form a circuit pattern on a photoresist layer formed on a substrate. An...
US20060215138 Laser beam pattern generator with a two-axis scan mirror  
An optical pattern generator for use in grayscale photolithography is provided with an optical source to generate a light beam, an optical modulator optically coupled to the optical source to...
US20090027643 COMPENSATION OF RETICLE FLATNESS ON FOCUS DEVIATION IN OPTICAL LITHOGRAPHY  
A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate...
US20070070311 Contacts to microdevices  
Provided are microdevices, e.g. integrated circuits, with contact bumps and processes for making the same. The microdevices may have contact bumps on two or more sides of the microdevices. Also...
US20070070320 METHOD FOR ABERRATION EVALUATION IN A PROJECTION SYSTEM  
Aberrations in an optical system can be detected and measured using a method comprised of a test target in the object plane of a projection system and imaging onto the image plane with the system....
US20080186466 ELEMENT FOR DEFOCUSING TM MODE FOR LITHOGRAPHY  
A method for imaging a mask pattern with small features through a lithographic system includes an illumination source and providing a uniaxial material having an ordinary index of refraction and a...
US20070254493 Integrated thermal unit having vertically arranged bake and chill plates  
An integrated thermal unit comprising a housing; a bake station positioned within the housing, the bake station comprising a bake plate configured to heat a substrate supported on a surface of the...
US20140253891 TUNABLE WAVELENGTH ILLUMINATION SYSTEM  
A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into...
US20100112467 PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF OVERLAY ERROR CORRECTION  
Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a...
US20130003031 METHOD OF MEASURING FOCUS OF A LITHOGRAPHIC PROJECTION APPARATUS  
A method of measuring focus of a lithographic projection apparatus includes exposure of a photoresist covered test substrate with a plurality of verification fields. Each of the verification...
US20050041226 Method and device for exposure control, method and device for exposure, and method of manufacture of device  
A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure...
US20070081137 Exposure method  
An exposure method is suitable for an off-axis illumination system. According to the method, a photomask having a first pattern and a second pattern is provided, and an analysis on the photomask...
US20060279718 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly  
A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to...
US20080002170 Holding Device for an Optical Element in an Objective  
A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged...
US20070146662 Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device  
An amount is flare is measured by a method including steps of applying a photosensitive material to a substrate; exposing a part of the photosensitive material using a mask including a...
US20070247605 Optical element for correction of aberration, and a lithographic apparatus comprising same  
An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a...
US20070002293 Method measuring distortion using exposure equipment  
A method of measuring distortion for an exposure apparatus is disclosed and comprises; aligning a reticle comprising a plurality of measuring patterns over a first wafer, wherein the plurality of...
US20110194086 WAFER EDGE EXPOSURE MODULE  
A wafer edge exposure module connected to a semiconductor wafer track system. The wafer edge exposure module includes a wafer spin device, an optical system, a scanner interface module, and a...
US20140071416 METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATED OR MEASURED TOPOGRAPHY  
A method and system to predict lithography focus error using chip topography data is disclosed. The chip topography data may be measured or simulated topography data. A plane is best fitted to the...
US20120194792 METHOD AND SYSTEM TO PREDICT LITHOGRAPHY FOCUS ERROR USING SIMULATED OR MEASURED TOPOGRAPHY  
A method and system to predict lithography focus error using chip topography data is disclosed. The chip topography data may be measured or simulated topography data. A plane is best fitted to the...
US20140146298 DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHOGRAPHY WITH VARIABLE MAGNIFICATION  
A device for charged particle beam lithography is disclosed which includes an inputting device, a character projection stencil and a reducing lens. The inputting device reads a set of shots, where...
US20070058153 Image improvement by using reflective mirrors between object and projection lens  
An optical method is invented to improve image quality by inserting different types and numbers of mirrors in different ways between the object and the projection lens. To demonstrate this method,...
US20100110402 FOCUS CORRECTION IN LITHOGRAPHY TOOLS VIA LENS ABERRATION CONTROL  
Aberration control capabilities of sophisticated lithography tools may be exploited in order to locally adapt the focal surface of the optical system. That is, higher order correction terms may be...
US20150085267 Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method  
A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test...
US20130050668 Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method  
A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test...
US20060215139 Pattern exposure method and apparatus  
A maskless exposure method and a maskless exposure apparatus in which maskless exposure can be performed efficiently with high-directivity illumination light, while the exposure efficiency of...
US20110045409 METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHOGRAPHY WITH VARIABLE MAGNIFICATION  
A character projection charged particle beam writer system is disclosed comprising a variable magnification reduction lens which will allow different shot magnifications on a shot by shot basis. A...
US20110122383 MAGNIFICATION CONTROL FOR LITHOGRAPHIC IMAGING SYSTEM  
In a lithographic projection system, a corrective optic in the form of one or more deformable plates is mounted within telecentric image or object space for making one-dimensional or...
US20070121093 METHOD FOR MEASURING OVERLAY ERROR IN EXPOSURE MACHINE  
A method for measuring the overlay error of an exposure machine is provided. The method includes disposing a pre-fabricated matching mask and a pre-fabricated matching wafer in two exposure...
US20100002214 IN-DIE FOCUS MONITORING WITH BINARY MASK  
Focus monitoring for a photolithographic applications is provided by illuminating a photoresist layer with a light beam transmitted through a first binary mask to define a circuit pattern on an...
US20050140953 Image enhancement of substantially coherent imaging systems  
A method of imaging a patterned sample comprising acquiring at least one image of the sample by illuminating the sample through an optical arrangement and collecting light reflected from the...
US20080291416 OPTICAL MEMBER-HOLDING APPARATUS, METHOD FOR ADJUSTING POSITION OF OPTICAL MEMBER, AND EXPOSURE APPARATUS  
There is provided is an optical member-holding apparatus which can hold a plurality of optical members of two different optical systems, even when the optical members exist in a common barrel in a...
US20080079921 Substrate Exposure Apparatus and Illumination Apparatus  
An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the...
US20070109524 Exposure method and device manufacturing method, exposure apparatus, and program  
Positional information (an estimate value in which a linear component of positional deviation amount is corrected) of each shot on a wafer is calculated by a statistical computation using actual...
US20070070319 Laser processing apparatus, exposure apparatus and exposure method  
An exposure apparatus includes a stage 10 for holding a substrate 8 to be exposed; a direct writing mask 6 arranged above the substrate 8 to be exposed held by the stage 10; a repeated opening...
US20050151947 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method  
Positional information on the scanning direction and non-scanning direction of a reticle stage is measured, based on each of the measurement results of a reticle Y interferometer and a reticle X...

Matches 1 - 50 out of 251 1 2 3 4 5 6 >