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US20120127442 DETERMINING LITHOGRAPHIC SET POINT USING OPTICAL PROXIMITY CORRECTION VERIFICATION SIMULATION  
The subject matter disclosed herein relates to determining a lithographic set point using simulations of optical proximity correction verification. In one embodiment, a computer-implemented method...
US20140078478 METHOD OF OPTIMIZING LITHOGRAPHY TOOLS UTILIZATION  
A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography...
US20100328636 Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus  
In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is...
US20130229638 SYSTEM AND METHOD FOR LITHOGRAPHY PATTERNING  
Disclosed is a lithography system. The lithography system includes a lithography exposure tool designed for performing an exposure process to a radiation-sensitive material layer coated on an...
US20090073403 Methods of characterizing similarity or consistency in a set of entities  
A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining...
US20130250260 PELLICLES FOR USE DURING EUV PHOTOLITHOGRAPHY PROCESSES  
Disclosed herein are various pellicles for use during extreme ultraviolet (EUV) photolithography processes. An EUV radiation device disclosed herein includes a reticle, a substrate support stage,...
US20070148561 Exposure equipment having auxiliary photo mask and exposure method using the same  
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart...
US20130089813 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the...
US20090029270 Projection exposure device and method of separate exposure  
A projection exposure device which can perform high accurate alignment and separate exposures wherein the mask marks 20 overlap with the corresponding board marks 30 in exposure, the mask marks 20...
US20150032002 INTERCONNECTABLE ULTRASOUND TRANSDUCER PROBES AND RELATED METHODS AND APPARATUS  
Ultrasound devices and methods are described, including a repeatable ultrasound transducer probe having ultrasonic transducers and corresponding circuitry. The repeatable ultrasound transducer...
US20120183889 MULTIPLE LITHOGRAPHIC SYSTEM MASK SHAPE SLEEVING  
A mask fabrication method can include receiving a mask design, sending first exposure parameters to a first exposure machine, sending second exposure parameters to a second exposure machine,...
US20110081617 INTEGRATED LITHOGRAPHY EQUIPMENT AND LITHOGRAPHY PROCESS THEREOF  
An integrated lithography equipment is disclosed. The equipment includes an input/output area for loading at least one wafer, a coating a developing area for performing coating and developing...
US20090180088 Illumination Sources for Lithography Systems  
Illumination sources, lithography systems, and methods of processing and fabricating semiconductor devices are disclosed. In a preferred embodiment, an illumination source includes a first...
US20060104413 Mask repeater and mask manufacturing method  
A mask repeater for transferring the pattern of a master mask onto a real mask by exposure and transferring the pattern on the real mask onto a substrate such as a semiconductor wafer. The size of...
US20070248898 TARGETS FOR ALIGNMENT OF SEMICONDUCTOR MASKS  
Alignment of mask layers in semiconductor manufacturing is carried out by using alignment lines having at least one row of diffractively reflecting or scattering features on the lines. The...
US20080151207 Magneto-optical photoresist  
A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment....
US20090059195 EXPOSURE DEVICE WITH MECHANISM FOR FORMING ALIGNMENT MARKS AND EXPOSURE PROCESS CONDUCTED BY THE SAME  
The present invention relates to an exposure device for transferring circuit patterns of a mask to a roll-film-shaped object. The exposure device includes a supply reel rotation section that is...
US20090128789 Projection exposure device, and exposure process performed by the device  
The present invention relates to provide a projection exposure device having a small volume, thereby not occupying a large installation space. The projection exposure device is configured to...
US20090284721 RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS  
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by...
US20050195376 System for purifying purge gases  
A system for purifying purge gases for an optical system, in particular for a projection objective for microlithography for the fabrication of semiconductor components, wherein the optical system...
US20110255063 Seamless Stitching of Patterns Formed by Interference Lithography  
This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that...
US20060055911 High resolution printer and a method for high resolution printing  
The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method includes: (i) determining multiple intermediate schemes such...
US20080206685 Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus  
An exposure method and exposure apparatus optimal for the formation of a fine pattern of an electronic device, such as a flat panel display. The exposure method and apparatus provides a high...
US20100097590 ROBUST OPTIMIZATION TO GENERATE DROP PATTERNS IN IMPRINT LITHOGRAPHY WHICH ARE TOLERANT OF VARIATIONS IN DROP VOLUME AND DROP PLACEMENT  
Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be...
US20130057839 LITHOGRAPHY SYSTEM AND MANUFACTURING METHOD OF COMMODITIES  
The present invention provides a lithography system including an obtaining unit which obtains a transfer function describing a relationship between first vibration generated in one lithography...
US20130120725 IMPRINT LITHOGRAPHY METHOD AND IMPRINTABLE MEDIUM  
An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium....
US20130128246 Lithography Method and Apparatus  
In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the...
US20100302520 CLUSTER E-BEAM LITHOGRAPHY SYSTEM  
A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where...
US20070279605 Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the like  
Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a...
US20150079523 POLYMER SHEET PATTERNING AND ITS ASSEMBLY USING SLIT CHANNEL LITHOGRAPHY  
Synthesizing polymeric sheets in a slit fluidic channel by projection of a pulse of illumination to the channel. A slit channel can include a polymeric device with a plane's width larger than 1...
US20090115110 Drop Pattern Generation for Imprint Lithography  
Generating a fluid drop pattern for an imprint lithography process includes selecting an imprinting surface with features and generating a fluid drop pattern including drop locations for placement...
US20090040483 MULTIPLE EXPOSURE TECHNIQUE USING OPC TO CORRECT DISTORTION  
Accurate ultrafine patterns are formed using a multiple exposure technique comprising implementing an OPC procedure to form an exposure reticle to compensate for distortion of an overlying resist...
US20140300877 PROGRAMMABLE PHOTOLITHOGRAPHY  
A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with...
US20090021711 METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM  
A method of inspecting an exposure system uses a mask pattern including a first and a second mask pattern, the first pattern being formed in a line-and-space of a first pitch, the second pattern...
US20050153216 Lithography mask and lithography system for direction-dependent exposure  
Lithography mask having a structure for the fabrication of semiconductor components, in particular memory components, for a direction-dependent exposure device, featuring at least one auxiliary...
US20070279611 Reflective loop system producing incoherent radiation  
A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or...
US20150234297 Method of Calibrating a Reluctance Actuator Assembly, Reluctance Actuator and Lithographic Apparatus Comprising Such Reluctance Actuator  
A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the...
US20100096512 GUIDING DEVICE AND GUIDING ASSEMBLY FOR GUIDING CABLES AND/OR HOSES, AND A LITHOGRAPHIC APPARATUS  
A guide for guiding cables and/or hoses between two parts that are moveable relative to each other, the guide including a band having a length, width and thickness, and having a torsional...
US20110249244 Lithographic Focus and Dose Measurement Using A 2-D Target  
In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for...
US20090046263 USING PHASE DIFFERENCE OF INTERFERENCE LITHOGRAPHY FOR RESOLUTION ENHANCEMENT  
Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference...
US20130135598 METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS IN RESIST FEATURES  
A computer readable storage medium containing program instructions for treating a photoresist relief feature on a substrate having an initial line roughness and an initial critical dimension,...
US20120069311 Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography  
A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the...
US20070242253 Moving beam with respect to diffractive optics in order to reduce interference patterns  
A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element...
US20080084549 HIGH REFRACTIVE INDEX MEDIA FOR IMMERSION LITHOGRAPHY AND METHOD OF IMMERSION LITHOGRAPHY USING SAME  
In accordance with the present invention, a colloidal immersion lithography medium is provided. The medium comprises: a) a continuous liquid phase comprising a liquid having an index of refraction...
US20070058149 Lighting system and exposure apparatus  
A lighting system and an exposure apparatus in which even if the outgoing optical axes of outgoing beams emitted from a plurality of LDs disposed on a flat plane are shifted, the efficiency of use...
US20070013896 EXPOSURE METHOD  
An exposure method for exposing a pattern of a reticle which includes a first pattern and a second pattern by using a light from a light source and an optical system includes the steps of...
US20060078637 Solid immersion lens lithography  
Lithography using solid immersion lenses is disclosed. In one aspect, an apparatus is provided that includes a resist film that has a first side and a second and opposite side. One or more solid...
US20120249985 MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS  
A device for measuring an imaging optical system, including: a first grating pattern (6), which is positionable in a beam path upstream of the imaging optical system, having a first grating...
US20070035709 End effector with integrated illumination system for reticle pre-alignment sensors  
An apparatus includes a first support structure configured to support an element that has an alignment marker. The apparatus also includes an alignment sensor comprising a light source that is...
US20060103828 Adjustable illumination blade assembly for photolithography scanners  
A method and structure for providing adjustable optical lithography illumination comprises a blade which can be customized to provide a desired light pattern. The adjustable blade can be...