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US20080068568 Projection Optical Device And Exposure Apparatus  
A projection optical device includes a projection optical system which projects an image of a pattern, a support device having a flexible structure to support the projection optical system, and a...
US20090091723 MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD  
The present invention provides a measuring apparatus which measures a shape of a surface of a measurement target object, comprising a light projecting optical system configured to split light from...
US20090208852 PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS  
Provided are a pattern forming method capable of accurately forming a microscopic pattern without employing a hard mask, thereby simplifying a process in comparison to a conventional process and...
US20130329202 PATTERN GENERATION METHOD  
A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the...
US20110310338 PRODUCTION METHOD OF LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE  
To provide a production method of a liquid crystal display device and a liquid crystal display device, in which generation of a joint line on a display screen is suppressed and yield can be...
US20090021712 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, DISPLAY MANUFACTURING METHOD, MASK, AND MASK MANUFACTURING METHOD  
An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the...
US20070242249 Exposure apparatus, exposure method, and method for producing device  
The present invention provides an exposure method which illuminates each of patterns, to be subjected to double exposure, on entire surfaces thereof in optimal illumination conditions...
US20090103067 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus comprises an original stage which holds an original, a substrate stage which holds a substrate, and a control unit which controls a measurement process of measuring a...
US20060204867 Material deposition method and/or system for layers including repetitive features  
Embodiments of a method and/or system for material deposition for layers that include repetitive features are disclosed.
US20090284723 STAGE DEVICE, PATTERN FORMATION APPARATUS, EXPOSURE APPARATUS, STAGE DRIVE METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
A stage device is equipped with: a wafer stage that has a coarse movement stage that moves along an XY plane and a table that is finely movable in at least a direction parallel to the XY plane;...
US20060181689 Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same  
An exemplary optical system includes a first vacuum chamber and a second vacuum chamber having first and second portions. The first vacuum chamber contains an energy-beam source. The first...
US20140168621 Fly Eye Lens and Proximity Exposure Machine Optical System  
An embodiment of the present invention provides a fly eye lens which is applied to a proximity exposure machine optical system. The fly lens includes a first lens assembly and a second lens...
US20110109888 Method and Apparatus for Measuring Line End Shortening, Substrate and Patterning Device  
End of line effect can occur during manufacture of components using a lithographic apparatus. These end of line effects can result in line end shortening of the features being manufactured. Such...
US20090046265 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An illumination optical apparatus of the present invention includes an illumination optical system having a plurality of reflection mirrors arranged to guide illumination light flux to an...
US20090296059 MEASUREMENT APPARATUS, MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD  
The present invention provides a measurement apparatus which measures a wavefront aberration of a measurement target optical system, the apparatus including a fringe scanning unit configured to...
US20100238421 Preparation Unit for Lithography Machine  
A charged particle lithography system comprising a preparation unit. The preparation unit comprises a housing having a first load port for loading and/or unloading a substrate into or out of the...
US20090174873 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD  
An exposure apparatus that exposes a substrate is provided, the exposure apparatus comprising a first exposure system that drives a movable component which holds the substrate, and that, using...
US20070182943 Debris apparatus, system, and method  
Apparatus, system, and method for reducing contamination of semiconductor device wafers in immersion lithography fabrication. A preferred embodiment comprises a support ring to provide structural...
US20110116063 Exposure Unit Containment Mechanism and Image-Forming Apparatus  
An exposure unit containment mechanism includes an exposure unit and a frame that defines a space into which the exposure unit is inserted, the exposure unit including: first protrusions...
US20070190438 METHOD AND APPARATUS FOR CONTROLLING LIGHT INTENSITY AND FOR EXPOSING A SEMICONDUCTOR SUBSTRATE  
In an embodiment, a method of controlling a light intensity includes measuring a critical dimension distribution of a pattern on a substrate. The critical dimension distribution is formed using a...
US20140233000 METHOD FOR PRODUCING OPTICAL ORIENTATION FILM METHOD FOR PRODUCING RETARDATION FILM, SYSTEM FOR PRODUCING OPTICAL ORIENTATION FILM, OPTICAL ORIENTATION FILM AND RETARDATION FILM  
A method for producing an optical orientation film is disclosed, the method being able to realize highly accurate exposure in a pattern, even if a simple device and non-parallel light are used and...
US20060250593 Exposure apparatus and device fabricating method  
The present invention is an exposure apparatus that exposes a substrate through a projection optical system and a liquid, comprising: a first nozzle member, which is provided in the vicinity of...
US20070070317 EXPOSURE APPARATUS  
An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a substrate to be exposed, via a liquid that is filled in a space between the substrate and a...
US20050185155 Exposure apparatus and method  
An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, via a fluid that is at least partially filled in a space between the...
US20110273676 IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES  
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the...
US20090091722 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus, that exposes each shot according to shot arrangement on a substrate, includes a detector configured to detect a mark; and a processor configured to determine a coefficient...
US20080316446 Stage apparatus and exposure apparatus  
A wafer stage and a measurement stage are configured so that they are movable along an upper surface of a base plate, and water is transferred therebetween by bringing the stages proximate to one...
US20070258068 Exposure Apparatus, Exposure Method, and Device Fabricating Method  
The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is...
US20140160453 RADIATION SOURCE  
A radiation source includes a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser...
US20070165201 System and Method for Reducing Disturbances Caused by Movement in an Immersion Lithography System  
In an immersion lithography system, a moveable substrate unit is formed from a substrate and at least one optical element, with immersion liquid between them. The immersion liquid and the optical...
US20090122284 LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY  
A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system,...
US20150022793 LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD  
Provided is a lithography apparatus that includes a plurality of patterning devices each of which is configured to perform patterning for a substrate supplied from a preprocessing apparatus; and a...
US20110134403 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is...
US20090153817 Correction method and exposure apparatus  
At Step 602, the grid of a wafer loaded into an exposure apparatus is approximated by a mathematical function fitting up to, for example, a cubic function, and at Step 612, the magnitude of a...
US20080170213 STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A stage apparatus includes a stage, a repulsive force generating unit including a first magnet provided on the stage and a second magnet provided to face the first magnet at an end of the moving...
US20090190110 MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
A stage device is equipped with a first scale which is placed with a Y-axis direction serving as its longitudinal direction and in which a first grating whose periodic direction is in an X-axis...
US20090115983 Immersion lithography apparatus  
An immersion lithographic apparatus is disclosed that includes a detector to measure a distance between a substrate support structure and/or a substrate and a fluid handling system and/or to...
US20080002174 Control system for pattern generator in maskless lithography  
A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, and a control system. The illumination system is configured to...
US20080079920 Wafer exposure device and method  
A wafer exposure device includes a wafer stage. An optical exposure system exposes a wafer on the wafer stage. A sensor block measures a distance to a wafer provided on the wafer stage. The sensor...
US20090091725 Lithographic Apparatus, Projection Assembly and Active Damping  
A lithographic apparatus comprises an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further...
US20090086177 LITHOGRAPHIC APPARATUS HAVING A LORENTZ ACTUATOR WITH A COMPOSITE CARRIER  
An actuator is configured to produce a displacement force between a first and a second part to displace the first and second parts relative to each other. The Actuator includes a first magnet...
US20070097342 EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD  
This invention provides a novel technique for reducing at least the former of the oxidation of a ruthenium film and the deposition of carbon onto the ruthenium film. An exposure apparatus which...
US20100089712 PROJECTION ASSEMBLY AND LITHOGRAPHIC APPARATUS  
A projection assembly includes a projection system to project a patterned radiation beam onto a substrate, a damping system to dampen a vibration of the projection system, the damping system...
US20080218714 Exposure Method, Exposure Apparatus and Device Manufacturing Method  
An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller...
US20100020525 Cable Connection, Control System, and Method to Decrease the Passing on of Vibrations from a First Object to a Second Object  
A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and...
US20090310108 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
A reticle stage, a substrate stage and a measurement device are controlled such that first measurement of the position of a surface of a substrate, positioning of the surface at an image plane of...
US20110242513 SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM  
A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of...
US20090009740 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A measurement apparatus configured to measure a light intensity distribution in a plane to be measured includes a mask including an opening having a dimension smaller than a wavelength of light...
US20070103658 Lithographic projection device, method an substrate for manufacturing electronic devices, and obtained electronic device  
The invention proposes a lithographic projection device such as a wafer stepper for forming a pattern on a substrate or wafer, comprising a(n) (actinic) radiation or light source (2), illumination...
US20080068569 Lithographic system, device manufacturing method, and mask optimization method  
A lithographic system comprises an array of individually controllable elements, a projection system, datapath hardware, and a conversion system. The array of individually controllable elements is...