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US20070097347 Method for forming a circuit pattern by using two photo-masks  
A method for forming a circuit pattern using two photo-masks. The method includes a first photo-mask with a first extracted circuit pattern in x-direction polarization plane, and adds the grating...
US20070159614 Laser projection system  
A mask distance a is adjusted with magnification control unit and mask-shift servo-control unit, and a base plate distance b is adjusted with focus control unit, AFC control unit and table-shift...
US20100149502 Method of detecting reticle errors  
A method of detecting reticle error may include using an optical source of an exposure unit to cause light to be incident on a reticle installed in the exposure unit, and detecting the reticle...
US20080030702 Exposure Apparatus, Producing Method of Exposure Apparatus, and Producing Method of Microdevice  
An exposure apparatus for exposing a pattern formed on a mask (M) onto a photosensitive substrate (P) through a projection optical system (PL), comprising an upper pedestal (26) on which at least...
US20120108072 SHOWERHEAD CONFIGURATIONS FOR PLASMA REACTORS  
Apparatus, devices, and methods for increasing the ion energy in a plasma processing devices are provided. In various embodiments, the surface area of a showerhead facing the work piece includes a...
US20080117395 Stage apparatus and exposure apparatus  
A stage apparatus includes: a moving stage, which moves along a movement plane; a first moving table, which holds a specimen while being able to move with respect to the moving stage; and a second...
US20070285638 Mirror array for lithography  
A mirror array apparatus includes a carrier configured to support a plurality of individually adjustable reflective elements. At least one actuator is associated with each reflective element, the...
US20070182948 SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCTOR EXPOSURE APPARATUS  
A semiconductor exposure method that uses a semiconductor exposure apparatus to expose a wafer is described. The semiconductor exposure apparatus comprises at least an exposure lens, a platform...
US20110279797 APPARATUS AND METHOD FOR CALIBRATING LITHOGRAPHY PROCESS  
A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to...
US20100002211 LITHOGRAPHIC APPARATUS  
A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma...
US20070268470 Support Method and Support Structure of Optical Member, Optical Unit, Exposure Apparatus, and Device Manufacturing Method  
A spacer members is placed between a lens that is located at the lowermost end among a plurality of lenses and a parallel flat plate that is placed below the lens, and the lens is made to support...
US20070024838 Exposure apparatus and exposure method, and method of manufacturing electrical wiring board  
This invention provides: an exposure apparatus and exposure method based on a maskless exposure technique which uses a two-dimensional optical modulator, in which maskless exposure technique, the...
US20070291243 Exposure apparatus, exposure method, and device manufacturing method  
An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical...
US20060192928 Pattern transferring apparatus and pattern transferring method  
A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus...
US20090122287 MOVABLE BODY APPARATUS, PATTERN FORMATION APPARATUS AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
On the +X and −X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a distance half or less than half the effective width of the scale, so that two heads...
US20070122561 System and method to increase surface tension and contact angle in immersion lithography  
A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made...
US20080284997 EXPOSURE APPARATUS  
A scanning exposure apparatus projects a pattern of an original onto a substrate via a projection optical system and shifts the original and the substrate in synchronization with each other with...
US20090009741 DEVICE MANUFACTURING METHOD, DEVICE MANUFACTURING SYSTEM, AND MEASUREMENT/INSPECTION APPARATUS  
In the case where measurement/inspection of a wafer is performed in a measurement/inspection instrument before and after exposure is performed in an exposure apparatus, various kinds of conditions...
US20070127001 Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus  
A method for preventing or reducing contamination of an immersion type projection apparatus is disclosed. The apparatus includes at least one immersion space that is at least partially filled with...
US20080002168 Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method  
A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens...
US20080204683 Lithographic apparatus and method  
A lithographic apparatus includes an illumination system constructed and arrange to condition a beam of radiation, a patterning device constructed and arranged to pattern the beam of radiation, a...
US20080018867 Maintenance Method, Maintenance Device, Exposure Apparatus, and Device Manufacturing Method  
An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle...
US20060238735 Optical system of a projection exposure apparatus  
An optical system of a microlithographic exposure apparatus has a pupil plane, a field plane and at least one intrinsically birefringent optical element that is positioned in or in close proximity...
US20090097003 METHOD FOR POSITIONING AN OBJECT BY AN ELECTROMAGNETIC MOTOR, STAGE APPARATUS AND LITHOGRAPHIC APPARATUS  
A method for positioning an object by an electromagnetic motor which, in use, produces a plurality of primary forces and a pitch torque associated with the primary forces. The method includes a...
US20100173250 METHOD FOR A MULTIPLE EXPOSURE, MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION AND A PROJECTION SYSTEM  
In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first...
US20120258390 EXPOSURE METHOD AND EXPOSURE DEVICE  
In an exposure method, a photomask and a substrate having a resist applied thereto are positioned so as to be opposed to a blinking light source that repeatedly emits light and emits no light. The...
US20060164616 Liquid immersion type lens system, projection exposure apparatus, and device fabricating method  
A liquid immersion type lens system includes: an optical system main body that has an optical surface at one end along an optical axis, the optical surface contacting a first immersion liquid; a...
US20130135599 DYNAMIC PROJECTION METHOD FOR MICRO-TRUSS FOAM FABRICATION  
A system for fabricating a radiation-cured component is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate...
US20080055576 Lithographic apparatus, and motor cooling device  
A lithographic device includes a cooling device for removing heat from a motor. The cooling device has a cooling element provided in thermal contact with at least part of the motor. The cooling...
US20080252868 MASK-LESS METHOD AND STRUCTURE FOR PATTERNING PHOTOSENSITIVE MATERIAL USING OPTICAL FIBERS  
A method for patterning objects, e.g., semiconductor wafer, glass plate, composite, etc. The method includes providing an object, which has an overlying layer of photosensitive material. The...
US20060057471 Lithographic apparatus and device manufacturing method  
Improved complementary phase shift mask (c:PSM) imaging techniques are described, including a method in which scattering bars are provided on the trim mask in order to allow better CD uniformity...
US20080278701 DEFOCUS DETERMINATION METHOD USING SUB-RESOLUTION FEATURE (SRF) PRINTING  
The present application is directed to apparatus and methods for determining a magnitude of defocus and a direction of defocus for a photolithography process. A sub-resolution feature on a reticle...
US20090002658 Exposure apparatus, exposure method, and method for producing device  
An exposure apparatus includes: a first optical member via which an exposure beam exits; a first movable body movable while holding a substrate in a predetermined area; a first holding device...
US20090021710 IMMERSION LITHOGRAPHY APPARATUS AND METHOD OF FORMING PATTERN USING THE SAME  
An immersion lithography apparatus and/or a method of forming a pattern. In an immersion lithography apparatus, an intermediate medium may not directly contact the photoresist layer and it may be...
US20080204685 EXPOSURE APPARATUS, EXPOSURE METHOD AND LITHOGRAPHY SYSTEM  
An exposure apparatus includes a first exposure apparatus used for exposing a peripheral portion of a wafer in maskless manner, the first exposure apparatus including a light source configured to...
US20100321656 TRANSMISSION MASK WITH DIFFERENTIAL ATTENUATION TO IMPROVE ISO-DENSE PROXIMITY  
A system and method to compensate for the proximity effects in the imaging of patterns in a photolithography process. A light exposure of a photoresist layer is effectuated in predetermined...
US20070091289 Apparatus and method for recovering liquid droplets in immersion lithography  
Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of...
US20100007864 SCANNING EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
A scanning exposure apparatus which transfers, onto a substrate, a pattern on a reticle illuminated with pulse light whose light intensity distribution has an isosceles trapezoidal shape along a...
US20090015246 Lithographic apparatus and position sensor  
A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a...
US20050287446 Method for the photolithographic projection of a pattern onto a semiconductor wafer with an alternating phase mask  
A method for the photolithographic projection of a pattern onto a semiconductor wafer with an alternating phase mask includes patterning a resist layer photolithographically with a pattern on the...
US20100311242 METHODS FOR FABRICATING SEMICONDUCTOR DEVICES  
Methods are provided for fabricating a semiconductor device. One method comprises providing a first pattern having a first polygon, the first polygon having a first tonality and having a first...
US20120099090 SYSTEM AND METHODS RELATED TO GENERATING ELECTROMEGNETIC RADIATION INTERFERENCE PATTERNS  
Systems and methods related to the generation of interference patterns using electromagnetic radiation are generally described. Some embodiments are directed to the use of such systems and methods...
US20090004577 MASK FOR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF  
Embodiments relate to a mask used for manufacturing a semiconductor device and a method for manufacturing the same. The mask includes a first and second region formed on a semiconductor mask....
US20100104960 EXPOSURE APPARATUS  
An exposure apparatus includes a controller configured to calculate a position of an alignment mark detected by a detector, to approximate a deformation of a substrate by using an approximation...
US20090273767 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND PATTERN FORMATION APPARATUS, AND DEVICE MANUFACTURING METHOD  
A movable body apparatus is equipped with a Y measuring system equipped with an encoder and an interferometer that measure the position of a stage in one axis (Y-axis) direction. The...
US20090213345 Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors  
The present invention relates to a microlithography projection exposure apparatus for wavelengths ≦100 nm, in particular for EUV lithography using wavelengths <50 nm, preferably <20 nm having an...
US20070052946 Supporting device for supporting vibration sensitive components  
The invention is in particular a supporting device for relative supporting loads with respect to a base comprising a load side part, a base side part, and an intermediate part giving support to...
US20070229790 Arrangement for the transfer of structural elements of a photomask onto a substrate and method therefor  
An arrangement for the transfer of structural elements of a photomask onto a substrate includes an illumination device, a photomask with a plurality of structural elements, wherein radiation from...
US20100097589 LITHOGRAPHIC APPARATUS COMPRISING AN ASSEMBLY OF A LINE CARRIER WITH LOW-FRICTION CABLES, HOSES OR THE LIKE AND SUCH AN ASSEMBLY IN GENERAL  
A lithographic apparatus includes an assembly of a plurality of flexible medium transfer lines and a line carrier, the liner carrier configured to moveably guide the plurality of flexible medium...
US20090257036 ALIGNMENT APPARATUS FOR ALIGNING MULTI-LAYER STRUCTURES  
An exemplary alignment apparatus can align a first layer with a second layer. The first layer has a first alignment pattern. The second layer has a second alignment pattern. The alignment...