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US20090208884 EXPOSURE APPARATUS  
An exposure apparatus includes a driver used for one of height, inclination, curvature-of-field, magnification, and rotation corrections, and a controller configured to control a substrate stage...
US20080259301 Exposure system  
A CTP system is provided, which allows its continuous use even if some of laser diodes located at dispersed sites are in a non-light emitting state due to breakage or the like. In the case where...
US20100066989 SPECTRAL PURITY FILTERS AND METHODS THEREFOR  
A spectral purity filter arrangement is disclosed. The spectral purity filter arrangement includes a film configured for filtering out at least a portion of input light and a support structure...
US20080225254 PHOTOMASK, PHOTOMASK SUPERIMPOSITION CORRECTING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE  
In a photomask in which a device pattern, an alignment mark and a superimposition inspection mark are formed on a light transmitting base, each of the alignment mark and the superimposition...
US20080030701 Individual wafer history storage for overlay corrections  
The invention relates to a device manufacturing method comprising identifying a substrate to be processed, performing a manufacturing step of a patterned layer on the substrate, and storing a...
US20120249984 LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE  
The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the...
US20100055586 METHOD AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE  
A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a...
US20100002212 SCANNING EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
An apparatus includes a control unit configured to control an exposure unit and a driving unit such that exposure of a first region of a substrate starts and ends while a substrate stage is...
US20090033895 Lithography apparatus with flexibly supported optical system  
A lithography apparatus includes a projection optical system that projects an image of a pattern, a first support member, a second support member that is flexibly coupled to the first support...
US20100053578 Apparatus for imprint lithography using an electric field  
A lithography process for creating patterns in an activating light curable liquid using electric fields followed by curing of the activating light curable liquid is described. The process involves...
US20130063707 PATTERN GENERATING METHOD, PATTERN FORMING METHOD, AND PATTERN GENERATING PROGRAM  
One embodiment includes: a step of evaluating an amount of flare occurring through a mask at EUV exposure; a step of providing a dummy mask pattern on the mask based on the evaluated result of the...
US20060244940 Exposure method and apparatus and device producing method  
An exposure method which comprises illuminating a first object formed with a pattern to be transferred with a first light beam to expose a second object with the first light beam through the first...
US20060007415 Exposure system and device production process  
The exposure system of the present invention inhibits baseline shift by carrying out temperature control as required by each composite equipment. This exposure system has a first control system...
US20070165199 Immersion photolithography scanner  
An immersion photolithography system includes a lens system positioned to focus radiation emitted from the radiation source onto a workpiece or wafer on a stage. A liquid supply system provides...
US20080218716 METHOD FOR SETTING AN OPTICAL IMAGING PROPERTY IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND PROJECTION EXPOSURE APPARATUS OF THIS TYPE  
In some embodiments, the disclosure provides a method for setting an optical imaging property in a microlithographic projection exposure apparatus via which a mask can be imaged onto a substrate...
US20060132747 Optical element for an illumination system  
There is provided an optical element for an illumination system for wavelengths of ≦193 nm. The illumination sytem includes a light source, a field plane, an exit pupil, and a plurality of facets....
US20080212042 Circuit Breaker Arrangement in an Indicating Arrangement in an Electrically Powered Stapler  
A linear motor with high heat recovery efficiency that inhibits the rise in surface temperature is offered. The linear motor is disposed in a surrounding member (142) and facing a flow passage...
US20070109524 Exposure method and device manufacturing method, exposure apparatus, and program  
Positional information (an estimate value in which a linear component of positional deviation amount is corrected) of each shot on a wafer is calculated by a statistical computation using actual...
US20080278702 Lithographic apparatus and sensor calibration method  
A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder...
US20060250588 Immersion exposure tool cleaning system and method  
Methods of cleaning immersion exposure tools using ultrasonic waves and systems thereof are disclosed. An ultrasonic wave generator is coupled to the fluid of an immersion exposure tool, or to a...
US20070109522 Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method  
A stage device includes a base, a movable table arranged above the base, a position information measurement device that measures position information of the movable table, a deformation amount...
US20070275313 CALCULATION METHOD AND APPARATUS OF EXPOSURE CONDITION, AND EXPOSURE APPARATUS  
A method for calculating a correction amount to a focus amount or an exposure dose in exposing a substrate with an exposure apparatus includes a storing step of storing plural sets, each of which...
US20090097002 EXPOSURE DEVICE  
The present invention provides an inexpensive exposure device with a simple structure which can draw in high precision by correcting drawing pixel positions at a time of exposing by respective...
US20110159446 PLASMON HEAD WITH HYDROSTATIC GAS BEARING FOR NEAR FIELD PHOTOLITHOGRAPHY  
A low-cost approach to near field nano-scale photolithography using a plasmonic head with hydrostatic gas bearings. The hydrostatic gas bearing flies the plasmonic head at less than 100 nm, and...
US20050151947 Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method  
Positional information on the scanning direction and non-scanning direction of a reticle stage is measured, based on each of the measurement results of a reticle Y interferometer and a reticle X...
US20070046910 Apparatus and method for recovering fluid for immersion lithography  
A apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. A porous member is disposed...
US20070211231 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus for exposing a pattern of a reticle onto a substrate includes an illumination optical system configured to illuminate the reticle on a target plane to be illuminated using...
US20080084546 Exposure Apparatus,Exposure Method, And For Producing Device  
An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection...
US20120113403 EXPOSURE METHOD AND EXPOSURE APPARATUS  
In the present invention, when exposure on a first exposure area of the subject to be exposed by using a first mask pattern group of a photomask, is completed, the shutter is moved in...
US20110063593 MANAGEMENT APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE  
A management apparatus obtains a list of a plurality of lots for which exposure processes are reserved, an initial value of an aberration of a projection optical system before start of the...
US20090263735 EXPOSURE APPARATUS  
An exposure apparatus includes a plurality of module each of which is configured to expose a pattern of an original onto the substrate using light from a light source, each module including a...
US20070132969 Microlithographic projection exposure apparatus and method for introducing an immersion liquid into an immersion space  
The invention relates to a projection exposure system for microlithography, said system comprising an illumination device for generating a projection light, and a projection objective comprising a...
US20080246933 Exposure Method And Apparatus, And Device Production Method  
Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system,...
US20090153821 LITHOGRAPHIC APPARATUS WITH ADJUSTED EXPOSURE SLIT SHAPE ENABLING REDUCTION OF FOCUS ERRORS DUE TO SUBSTRATE TOPOLOGY AND DEVICE MANUFACTURING METHOD  
A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the...
US20070258070 Method for Determining Exposure Condition, Exposure Method, Exposure Apparatus, and Method for Manufacturing Device  
Pattern images are projected under various conditions of liquid prior to exposing a substrate, and exposure conditions for exposing a pattern image on the substrate is determined based on each...
US20130278909 APPARATUS FOR THERMAL DEVELOPMENT WITH SUPPORTING SURFACE FOR A DEVELOPMENT MEDIUM  
This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature...
US20050179881 Exposure apparatus and method  
An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto an object to be exposed, by utilizing exposure light, an optical element for determining a...
US20120274913 ENHANCED CONTRAST PIN MIRROR FOR LITHOGRAPHY TOOLS  
A contrasting surface surrounding the pin minor when measuring aberrations of a lithographic projection system. By using a surrounding surface having a different reflectivity characteristic...
US20080030705 EXPOSURE APPARATUS  
An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition...
US20050174552 Image pick-up apparatus and image pick-up system  
An output level difference in the case of using a joint line as a boundary, a bright line, a black bar, or the like is suppressed. A solid-state image pick-up apparatus in which, on a substrate...
US20080013061 Exposure method, exposure apparatus, photomask and method for manufacturing photomask  
There is disclosed an exposure method is a method of projecting patterns (M1, M2) of a mask (M) onto a substrate to effect exposure thereof, through a plurality of projection optical units each...
US20050270505 Method of photolithography using a fluid and a system thereof  
A photolithographic exposure system for use on a photoresist on a substrate includes an illumination system, a photomask with one or more object patterns, a projection optical exposure system, and...
US20070296936 Exposure Apparatus, Exposure Method, and Producing Method of Microdevice  
An exposure apparatus for exposure-transferring an image of a pattern projected through an optical system having a plurality of optical units L1 to L13 onto an object P, comprises a correcting...
US20060285100 Exposure apparatus and exposure method, and device manufacturing method  
An exposure apparatus comprises: a movable body that is arranged on an image plane side with respect to a projection optical system; a wavefront measuring unit at least a part of which is arranged...
US20100035061 CUTOMIZED LITHOGRAPHIC PARTICLES  
A method of producing particles includes providing a substrate structure that comprises a solid substrate; forming a target structure on said substrate structure, said target structure comprising...
US20110273685 PRODUCTION OF AN ALIGNMENT MARK  
A method of production of alignment marks uses a self-aligned double patterning process. An alignment mark pattern is provided with first and second sub-segmented elements. After selecting the...
US20070030463 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system  
A lithographic projection apparatus (1) includes a support configured to support a patterning device (MA), the patterning device configured to pattern the projection beam according to a desired...
US20050128455 Exposure apparatus, alignment method and device manufacturing method  
An exposure apparatus for exposing a pattern on an exposure original onto a substrate using exposure light, includes a projection optical system for projecting the pattern on the exposure original...
US20080024745 Patterning device utilizing sets of stepped mirrors and method of using same  
A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising...
US20080266536 Lithographic Method for Maskless Pattern Transfer Onto a Photosensitive Substrate  
The invention proposes a Subpixel Scroll method, which optically shifts the position of the mirror elements to the projection axis by one subpixel size each, with an additional 45° mirror between...