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US20050062947 Near-field exposure apparatus  
A near-field exposure apparatus includes an pressure adjusting vessel in which pressure is adjustable, mask supporting means for supporting an elastically deformable exposure mask to the pressure...
US20100073655 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity...
US20090117491 RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES  
Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance...
US20090086179 Radiometric Kirk Test  
Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present...
US20110310368 METHOD AND SYSTEM FOR THERMALLY CONDITIONING AN OPTICAL ELEMENT  
A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between...
US20050254035 Multi-photon lithography  
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while...
US20100161099 Optimization Method and a Lithographic Cell  
Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then...
US20090225294 RETICLE FOR PROJECTION EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME  
In order to provide a reticle capable of increasing the number of chips per wafer and of enabling highly accurate alignment, and an exposure method using the reticle, a first alignment mark...
US20080174754 PHOTO-MASKS AND METHODS OF FABRICATING PERIODIC OPTICAL STRUCTURES  
Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also...
US20090311631 NEAR-FIELD EXPOSURE APPARATUS AND NEAR-FIELD EXPOSURE METHOD  
A near-field exposure apparatus includes a near-field exposure mask, a mechanism to place a substrate to be exposed, opposed to the near-field exposure mask, a mechanism to perform relative...
US20070019173 Photolithography arrangement  
A photolithography arrangement including an illumination source, which emits radiation with a predetermined wavelength directed towards a substrate, a projection mask for modulating the radiation...
US20100033698 Full Wafer Width Scanning Using Steps and Scan System  
A system and method are provided for writing a pattern onto a substrate. A patterned beam of radiation is produced using a reticle and projected onto a substrate to expose the pattern. Reticle and...
US20120120380 LOW AND HIGH PRESSURE PROXIMITY SENSORS  
A fluid proximity sensor for surface measurements having a measurement chamber (210) with a measurement nozzle (205), a reference chamber (220) with a reference nozzle (225), and a diaphragm (215)...
US20080123067 Movable Body System, Exposure Apparatus, And Device Manufacturing Method  
Stopper mechanisms keep a wafer table and a measurement table from moving closer than a predetermined distance, and the blocking by the stopper mechanisms can also be released by a drive...
US20060204861 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination  
A mask for enhancing the depth of focus of an optical imaging system is designed by optimizing an optical property (transmittance or reflectance) of the mask relative to the intensity distribution...
US20080002167 PROJECTION EXPOSURE APPARATUS AND METHOD FOR OPERATING THE SAME  
The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in...
US20070076184 Optical assembly for photolithography  
The invention relates to an optical assembly (1) having a plurality of optical elements (2), at least one optical element (2, 2″) being connected to a structure (5) dynamically decoupled from the...
US20080129970 Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure  
An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111. The immersion exposure...
US20090262328 ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD  
An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that...
US20060209280 Immersion exposure apparatus, immersion exposure method, and device manufacturing method  
An immersion exposure apparatus projects and transfers a pattern onto a photosensitive substrate through a projection optical system with a liquid being supplied to the immersion space between the...
US20090239178 OPTICAL ATTENUATOR PLATE, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
There is disclosed an optical attenuator plate and an optical attenuator plate to adjust a quantity of light from a light source, which has a plurality of high-transmittance regions with a...
US20080239267 Exposure apparatus and exposure method for exposure apparatus  
Post-etching line width localities that occur due to resist film thickness localities can be corrected continuously, without the need for an expensive mask. After a resist applied to a thin film...
US20090213346 IMMERSION LITHOGRAPHY USING HAFNIUM-BASED NANOPARTICLES  
Method, apparatus, and composition of matter suited for use with, for example, immersion lithography. The composition of matter includes hafnium dioxide nanoparticles having diameters less than or...
US20050118516 Transfer mask for exposure and pattern exchanging method of the same  
The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the...
US20070177116 METHOD AND APPARATUS FOR MANUFACTURING MICROSTRUCTURE AND DEVICE MANUFACTURED THEREBY  
A method for manufacturing a microstructure, includes: dividing an incident laser beam into a plurality of diffracted beams by means of a diffractive optical element; concentrating said divided...
US20070085989 Exposure apparatus and exposure method, maintenance method, and device manufacturing method  
An exposure apparatus includes; a supply outlet that supplies a liquid to an optical path space of exposure light, and a liquid supply system that supplies an ionized ionic liquid to the supply...
US20070097345 System, method, and apparatus for scanning detector for fast and frequent illumination uniformity correction module  
Provided is a reticle masking blade system, including a reticle-masking blade device. Also included is a detector array mounted on an edge of a blade of the blade device.
US20050162634 Cable tray assembly for precision drive stage  
A cable tray assembly includes a wafer table placed on a precision drive stage of which motions along specified mutually perpendicular X- and Y-directions are independently controlled. A plurality...
US20080225252 Device manufacturing method, lithographic apparatus, and a computer program  
A device manufacturing method includes exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, determining a non-linear function for...
US20080204684 PROCESS AND APPARATUS FOR ULTRAVIOLET NANO-IMPRINT LITHOGRAPHY  
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an...
US20060203217 Optical adjustment device, optical pickup apparatus provided with optical adjustment device, and method and apparatus for assembling optical adjustment device  
An optical adjustment device capable of correcting spherical aberration with high accuracy in a simple configuration is provided. A second lens holder fits into a guiding portion of a first lens...
US20060164614 Exposing machine for a printed circuit board  
An exposing machine of the present invention consists of a plurality of ultraviolet light tubes arranged on light generation assemblies. Each tube of the ultraviolet tubes is mutually parallel and...
US20080318153 PHOTOSENSITIVE LAYER STACK  
A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon...
US20090190108 METHOD AND SYSTEM FOR LEVELING TOPOGRAPHY OF SEMICONDUCTOR CHIP SURFACE  
A system and method of leveling the topography of a semiconductor wafer surface is presented. The system may induce low-order lens aberration to control the focal plane dynamically. The system may...
US20080304031 EXPOSURE APPARATUS  
An exposure apparatus exposes a substrate using light from a light source having a wavelength of 20 nm or smaller, and includes plural optical elements, each of which is configured to reflect the...
US20100073653 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
In measurement of a positional information in the XY plane of a fine movement stage held by a coarse movement stage, an encoder system is used including a head which is placed facing a grating...
US20070064215 Removable pellicle for immersion lithography  
A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto...
US20060215144 Stage drive method, stage apparatus, and exposure apparatus  
A stage drive method for driving a stage on a surface of a surface plate along a guide part that extends in a first direction includes the step of rotating the guide part about an axis...
US20070275310 Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout  
A method and apparatus is provided for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout. The method begins by specifying a wafer target CD and...
US20150116679 MECHANISMS FOR PERFORMING A PHOTOLITHOGRAPHY PROCESS  
Embodiments of performing a photolithography process are provided. The method for performing the photolithography process includes providing a substrate and forming a photoresist layer over the...
US20070259275 Anti-reflection coating for an EUV mask  
An EUV mask includes, on top of a multi-layer mirror, a spectral purity enhancement layer, for application in an EUV lithographic apparatus. On top of the spectral purity enhancement layer, a...
US20080068571 Immersion exposure apparatus and immersion exposure method, and device manufacturing method  
An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined...
US20080143983 METHODS AND APPARATUS FOR MULTI-EXPOSURE PATTERNING  
In some aspects, a reticle is provided for use in forming a patterned region on a substrate using a multi-pattern, multi-exposure process. The reticle includes (a) a first pattern for the...
US20090168033 MANUFACTURING METHOD OF PATTERN FORMED BODY AND PATTERN FORMED BODY MANUFACTURING APPARATUS  
A main object of the invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously...
US20060194130 Run to run control for lens aberrations  
An exposure tool includes an illumination source, a blazed phase grating reticle, a reticle stage holding the blazed phase grating reticle, a lens system including at least one adjustable lens...
US20090128791 Stage system, lithographic apparatus including such stage system, and correction method  
A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative...
US20070091287 IMMERSION LITHOGRAPHY APPARATUS AND METHODS  
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean...
US20050185156 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus  
An air-conditioning apparatus includes an air-conditioning apparatus body; a gas supply duct disposed in the body; and an impurity-removing filter disposed inside the gas supply duct. An exposure...
US20070263190 Method for patterning a radiation beam, patterning device for patterning a radiation beam  
A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to...
US20080198354 Optical system and method for illuimination of reflective spatial light modulators in maskless lithography  
An illuminator for a lithography system is provided. The illuminator includes a mask positioned along an optical axis and first and second refractive groupings positioned along the axis in...