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US20130169917 EXPOSURE DEVICE  
In an exposure device, picture elements or pixels of a liquid crystal display device are split into two parts in the width direction, and exposed from different directions, whereby an alignment...
US20130070222 Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical Lithography  
A method and system for optimization of an image to be printed on a substrate using optical lithography is disclosed in which a set of charged particle beam shots, some of which overlap, is...
US20120092633 REFLECTIVE FILM INTERFACE TO RESTORE TRANSVERSE MAGNETIC WAVE CONTRAST IN LITHOGRAPHIC PROCESSING  
A system for exposing a resist layer to an image that includes a layer reflective to imaging tool radiation and a resist layer having a region of photosensitivity over the reflective layer. An...
US20120028192 CONTROL METHOD AND CONTROL SYSTEM FOR EXPOSURE APPARATUS  
According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of...
US20110222038 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PLACING TABLE  
A substrate processing apparatus, for performing a plasma process to a substrate (W) in a processing container held in a vacuum state, has a substrate placing table (5) for placing thereon the...
US20110058150 MOLECULAR TRANSFER LITHOGRAPHY APPARATUS AND METHOD FOR TRANSFERRING PATTERNED MATERIALS TO A SUBSTRATE  
A system and method to implement a molecular transfer lithography process is described. A destroyable nanopatterned template coated with functional material is attached to a removable carrier that...
US20100308439 DUAL WAVELENGTH EXPOSURE METHOD AND SYSTEM FOR SEMICONDUCTOR DEVICE MANUFACTURING  
A dual wavelength exposure system provides for patterning a resist layer formed on a wafer for forming semiconductor devices, using two exposure operations, one including a first radiation having...
US20100201965 Method and System for Improved Overlay Correction  
A method for improving alignment in a photolithography machine is provided. The method comprises identifying first empirical alignment data that has been determined from use of a target photomask...
US20100141914 LITHOGRAPHIC APPARATUS AND POSITIONING APPARATUS  
A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or...
US20090321864 CMOS IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SENSOR  
A CMOS image sensor manufacturing method may include forming an interlayer insulating film over a semiconductor substrate in which a plurality of photodiodes are formed, forming a plurality of...
US20090201474 Semiconductor Devices and Methods of Manufacture Thereof  
Methods of manufacturing semiconductor devices, structures thereof, methods of fabricating lithography masks, and lithography masks and systems are disclosed. In one embodiment, a method of...
US20090073405 Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus  
A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer...
US20080165334 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method  
When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately...
US20080062393 Lithographic apparatus and device manufacturing method  
A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid...
US20070258076 Lithographic apparatus and device manufacturing method  
A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete...
US20070222958 Exposure apparatus, exposure method, and method for producing device  
A lithographic projection apparatus projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the...
US20070046921 EXPOSURE APPARATUS AND METHOD  
An exposure apparatus for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes a measuring part for obtaining polarization information of...
US20060187427 Lithographic apparatus and device manufacturing method  
Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement...
US20060139594 Exposure apparatus and device fabricating method  
An exposure apparatus exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting the image of a pattern onto the substrate through the projection...
US20150146179 Low energy electron beam lithography  
A low energy electron beam lithography system uses an 2 KeV electron beam of about two hundred microamperes, a 4 Division Complementary Mask (4DCM) formed from a monocrystalline silicon wafer with...
US20150131066 MASK PATTERN GENERATION METHOD AND OPTICAL IMAGE CALCULATION METHOD  
In a method for generating, with a computer, a pattern of a mask, a pattern on an object plane of a projection optical system is set, shifted plural pupil functions are generated, a matrix...
US20140191185 APPARATUS AND METHOD FOR FABRICATING NANO RESONATOR USING LASER INTERFERENCE LITHOGRAPHY  
A method of fabricating a nano resonator, includes forming a line pattern in a first substrate, and transferring the line pattern to a second substrate including a gate electrode. The method...
US20140176925 INTERFERENCE EXPOSURE DEVICE AND METHOD  
An interference exposure device, including: a light source (100) for providing an exposure light beam; a light homogenizer-collimator (200) for homogenizing and collimating the exposure light...
US20130201462 METHOD OF DETERMINING OVERLAY ERROR AND CONTROL SYSTEM FOR DYNAMIC CONTROL OF RETICLE POSITION  
A method of determining overlay error. The method includes transferring a pattern from a reticle to a wafer and selecting a first set of data points to measure the positional difference between...
US20130077066 PATTERN FORMING APPARATUS  
According to one embodiment, a pattern forming apparatus includes a stage provided under a lower surface of a substrate, a probe provided above an upper surface of the substrate, a drive unit...
US20130003030 LASER ABLATION TOOLING VIA DISTRIBUTED PATTERNED MASKS  
A distributed patterned mask for use in a laser ablation process to image a complete pattern onto a substrate. The mask has a plurality of apertures for transmission of light and non-transmissive...
US20120320352 MULTIBEAM EXPOSURE SCANNING METHOD AND APPARATUS, AND METHOD OF MANUFACTURING PRINTING PLATE  
This invention is concerning a multibeam exposure scanning method and apparatus, and a method of manufacturing a printing plate. The problem to be solved is that angular small convex points are to...
US20120188522 REFLECTIVE OPTICAL COMPONENTS FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD  
A reflective optical component is configured to reflect EUV radiation. The reflective optical component has a reflective layer with a bimetal cap layer of differing first and second metals...
US20120129083 METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK  
According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include...
US20120058434 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE  
A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem comprises one or (preferably) more alignment & level sensors...
US20120057140 EXPOSURE APPARATUS, MOVABLE BODY APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD  
In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction...
US20120050704 Source-collector module with GIC mirror and xenon liquid EUV LPP target system  
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an...
US20110310370 Device And Method For Processing Light-Polymerizable Material For Building Up An Object In Layers  
A method and a device for processing light-polymerizable material for the assembly of a mold, utilizing a lithography-based generative manufacturing technique wherein a layer of a...
US20110273684 NANO-IMPRINT METHOD AND APPARATUS  
There is provided a nanoimprint method for pressing a template having a pattern of a rugged or uneven shape, to a substrate coated with a curable resin the method including a measuring step for...
US20110244395 APPARATUS AND METHOD FOR HAZE CONTROL IN A SEMICONDUCTOR PROCESS  
A method for haze control in a semiconductor process, includes: providing an exposure tool with a photocatalyzer coating inside and exposing a wafer in the exposure tool in the presence of...
US20110244376 PHOTOMASK USING SEPARATED EXPOSURE TECHNIQUE, METHOD OF FABRICATING PHOTOMASK, AND APPARATUS FOR FABRICATING PHOTOMASK BY USING THE METHOD  
A method of fabricating a photomask may include forming a light-shielding layer and a first resist film on a substrate, forming a first resist pattern by exposing first exposed regions of the...
US20110164230 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A positioning apparatus according to the present invention includes: a tabletop having a plane; a plurality of actuators configured to be driven in a direction perpendicular to the plane to move...
US20110134404 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
An exposure apparatus includes an original stage including a first mark, a substrate stage including a second mark and a photoelectric conversion device configured to detect light having passed...
US20110080570 EXPOSURE APPARATUS AND EXPOSURE METHOD  
An exposure apparatus and an exposure method by which alignment of regions of a substrate that are to be exposed by optical systems can be performed with accuracy even if the substrate is deformed...
US20110051108 EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
Positional information of a stage is obtained using an interferometer system only during an exposure time when a constant speed drive of the stage is performed to form a pattern. Therefore, the...
US20110043777 TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME  
A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a...
US20110013162 PATTERN FORMATION APPARATUS, PATTERN FORMATION METHOD, AND DEVICE MANUFACTURING METHOD  
When a segmented region SAi of a sheet S is scan-exposed, a stage SST1 adsorbs, at a standby position at the +X end portion of a scan region AS, a rear surface portion corresponding to the...
US20100323461 Lithographic Method and Arrangement  
A method is described for obtaining information for use in modeling of a lithographic process. A pattern feature is formed on a target portion of a substrate by projecting a beam of radiation onto...
US20100296071 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
A fine movement stage is driven by a controller, based on positional information of the fine movement stage in a measurement direction measured by a measurement system and correction information...
US20100290018 Miniaturized Microparticles  
A system and method for forming encoded microparticles is described. One embodiment includes a system for forming encoded microparticles, the system comprising a step and repeat exposure system...
US20100290017 Folded Optical Encoder and Applications for Same  
A system and method are used to determine a parameter (e.g., angle, position, orientation, etc.) of a device. A first portion includes a source of radiation configured to produce a beam of...
US20100271606 LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS  
An immersion lithographic apparatus is disclosed. The apparatus has a projection system configured to project a patterned radiation beam onto a target portion of the substrate, the projection...
US20100266961 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
In a substrate stage device, when an X coarse movement stage moves in an X-axis direction, a Y coarse movement stage, an empty-weight cancelling device and a Y beam move integrally with the X...
US20100266960 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND EXPOSURE DEVICE  
A method of manufacturing a semiconductor device according to an embodiment includes determining a second exposure parameter including exposure parameters except for an exposure amount from a...
US20100265479 DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS  
A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To...