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US20100009274 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM  
There is disclosed a substrate processing method by a multi-patterning technique, which comprises a lithography process and an etching process, each of the processes is performed to one substrate...
US20080284996 OPTICAL COMPENSATION DEVICES, SYSTEMS, AND METHODS  
Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate....
US20080212047 Exposure apparatus, exposing method, and device fabricating method  
An exposure apparatus comprises: a first optical member for acquiring positional information about the substrate through a first liquid that is for measurement; a second optical member that emits...
US20070263191 Pattern forming apparatus and pattern forming method, movable member drive system and movable member drive method, exposure apparatus and exposure method, and device manufacturing method  
A partial section of an aerial image measuring unit is arranged at a wafer stage and part of the remaining section is arranged at a measurement stage, and the aerial image measuring unit measures...
US20060232757 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method  
A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system;...
US20090123874 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE  
An exposure apparatus for efficiently exposing patterns onto corresponding regions of a substrate. The apparatus includes a first wafer stage, a second wafer stage, an alignment sensor which...
US20120218536 CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE  
A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a...
US20100238420 LITHOGRAPHY APPARATUS AND LITHOGRAPHY METHOD  
A lithography apparatus includes a stage on which a target object is placed; a chamber in which the stage is arranged and which has one side surface in which an opening having a size which is...
US20090268180 LITHOGRAPHIC APPARATUS AND A VACUUM CHAMBER  
A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device is configured to...
US20070097341 Measurement apparatus, exposure apparatus, and device manufacturing method  
A substrate stage holds a substrate irradiated with exposure light via a liquid. A measurement apparatus measures information on the exposure light and has a light receiving device detachable from...
US20080292994 TRANSFER METHOD, TRANSFER APPARATUS, AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING ELEMENT  
The present invention provides a transfer method and a transfer apparatus capable of making the shape and quality of a transferred layer uniform and a method of manufacturing an organic light...
US20140099799 Lithography Masks, Systems, and Manufacturing Methods  
Lithography masks, lithography systems, methods of manufacturing lithography masks, methods of altering material layers of semiconductor devices, and methods of manufacturing semiconductor devices...
US20100301457 Lithography Masks, Systems, and Manufacturing Methods  
Lithography masks, lithography systems, methods of manufacturing lithography masks, methods of altering material layers of semiconductor devices, and methods of manufacturing semiconductor devices...
US20090268179 METHOD OF ALIGNING AN EXPOSURE APPARATUS, METHOD OF EXPOSING A PHOTORESIST FILM USING THE SAME AND EXPOSURE APPARATUS FOR PERFORMING THE METHOD OF EXPOSING A PHOTORESIST FILM  
An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining...
US20070109521 Stage apparatus, exposure apparatus, and exposure method  
A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus...
US20090310109 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
When a substrate stage is located in a first area, a first measurement device measures the same portion of the substrate at the plural measurement points both before and after the stage is...
US20070177117 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus for exposing a substrate via liquid includes a supply nozzle configured to supply the liquid, and a recovery nozzle configured to recover the liquid, wherein at least one of...
US20100296069 Pattern division method, pattern division processing apparatus and information storage medium on which is stored a program  
There is provided a pattern division method to form crowded patterns accurately on a substrate includes acquiring a mask pattern, dividing a predetermine area into a plurality of areas to prepare...
US20100273099 Flood exposure process for dual tone development in lithographic applications  
A method and system for patterning a substrate using a dual tone development process is described. The method and system comprise a flood exposure of the substrate to improve process latitude for...
US20140071414 MICROLITHOGRAPHY PROJECTION SYSTEM WITH AN ACCESSIBLE DIAPHRAGM OR APERTURE STOP  
The invention relates to a microlithography projection lens for wavelengths <=248 nm<=, preferably <=193 mm, in particular EUV lithography for wavelengths ranging from 1-30 nm for imaging an...
US20120288803 MANUFACTURING DEVICE OF OPTICAL DEFLECTOR AND MANUFACTURING METHOD OF THE SAME  
A manufacturing device of optical deflectors and a manufacturing method of the same are revealed. The manufacturing device includes a movable work platform, a substrate, a lens and a femtosecond...
US20120212714 MANUFACTURING DEVICE OF A FILM PATTERNED RETARDER FOR A THREE DIMENSIONAL DISPLAY DEVICE  
The present disclosure relates to a manufacturing device of a film patterned retarder for a three dimensional display devices. The present disclosure suggests a device for manufacturing a film...
US20110261338 MICROLITHOGRAPHY PROJECTION SYSTEM WITH AN ACCESSIBLE DIAPHRAGM OR APERTURE STOP  
The invention relates to a microlithography projection lens for wavelengths <=248 nm <=, preferably <=193 mm, in particular EUV lithography for wavelengths ranging from 1-30 nm for imaging an...
US20100060869 LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD  
An alignment method for a substrate or a patterning device is disclosed along with a corresponding apparatus. The method includes using a part of an alignment arrangement of a lithographic...
US20090201477 MOVABLE SUPPORT, POSITION CONTROL SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF CONTROLLING A POSITION OF AN EXCHANGEABLE OBJECT  
A movable support is configured to hold an exchangeable object. The support includes a movable structure movably arranged with respect to a reference object, an object holder movably arranged with...
US20060139610 Lithographic apparatus and device manufacturing method  
Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The...
US20050151949 Process and apparatus for applying apodization to maskless optical direct write lithography processes  
The present invention provides methods and apparatus for accomplishing a phase shift lithography process using a blocker to block zero order light to improve image quality for phase shift...
US20070296940 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method  
A method of pattern forming includes forming a resist film on a substrate, transferring a pattern onto the resist film by an immersion lithography method using a liquid immersion fluid to form a...
US20070153246 Apparatus and method for exposing edge of substrate  
An apparatus and method for exposing an edge of a substrate are disclosed, in which an exposure time period for exposing the edge of the substrate is reduced. The apparatus for exposing an edge of...
US20100060872 EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD  
The present invention provides an apparatus including a calculating unit which calculates a first time serving as a time required to drive a stage in a non-scanning direction perpendicular to a...
US20080018866 Exposure Apparatus and Device Producing Method  
An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired...
US20090047608 APPARATUS AND METHOD FOR TRANSFERRING FEATURES TO AN EDGE OF A WAFER  
An edge shot (“ES”) exposure apparatus (14) for transferring edge features (ef) to a substrate edge region (222) of a substrate (18) includes a feature transferer (55), and an ES wafer stage...
US20100259737 Exposure apparatus preventing gas from moving from exposure region to measurement region  
An exposure apparatus that has an exposure region for irradiating exposure light to a substrate via an optical system and a liquid and a measurement region for obtaining information relating to...
US20080220345 Device manufacturing method, computer program and lithographic apparatus  
In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of...
US20080212049 SUBSTRATE PROCESSING APPARATUS WITH HIGH THROUGHPUT DEVELOPMENT UNITS  
A substrate processing apparatus is arranged adjacent to an exposure device and includes a processing section, a transfer section configured to carry the substrate into and out of the processing...
US20080100810 Exposure Apparatus, Supply Method And Recovery Method, Exposure Method, And Device Producing Method  
The present invention provides an exposure apparatus that can prevent the degradation of exposure and measurement accuracies. An exposure apparatus (EX) exposes a substrate (P) by irradiating the...
US20110032495 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
A purge cover is equipped whose upper end is connected to an illumination unit and the lower end has a pair of plate sections facing an upper surface of a reticle stage and a reticle via a...
US20100214552 MULTI-TABLE LITHOGRAPHIC SYSTEMS, LITHOGRAPHY PROCESSING TOOLS AND METHODS FOR PROCESSING WORKPIECES  
A lithographic workpiece processing tool includes a loading area for loading a workpiece; and a processing area for processing a workpiece. The workpiece processing tool further includes a...
US20080013059 Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor  
A radiation sensor includes a radiation receiver positioned in a focal plane of the final element of the projection system; a transmissive plate supporting the radiation receiver at a side facing...
US20070002295 System and method of monitoring and diagnosing system condition and performance  
The invention is directed to a system and method of monitoring and/or diagnosing tool performance in real-time for system degradation. The invention issues alerts and provides a structured process...
US20050244725 Apparatus and method for structure exposure of a photoreactive layer  
Exposure apparatus for structure exposure of a photoreactive material of a photoreactive layer with electromagnetic radiation, having a radiation source of electromagnetic radiation at a...
US20090073400 DEVICE AND METHOD FOR MANUFACTURING A PARTICULATE FILTER WITH REGULARLY SPACED MICROPORES  
Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle...
US20140268076 SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICATION  
A dynamic pattern generator (DPG) device and method of making a DPG device are disclosed. The DPG device is used in semiconductor processing tools that require multiple electron-beams, such as...
US20070285642 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
At least one exemplary embodiment is directed to an exposure apparatus configured to perform an exposure process by interposing a liquid along a path of exposure light between a projection optical...
US20070285635 EXPOSURE APPARATUS, REMOVAL METHOD, AND DEVICE MANUFACTURING METHOD  
An exposure apparatus that exposes onto a substrate a pattern of a mask that is located in a vacuum or reduced atmosphere and includes a multilayer film that is made of a lamination of a...
US20070103667 SUBSTRATE SUPPORT APPARATUS FOR USE IN A POSITION MEASURING DEVICE  
The invention relates to a substrate support apparatus (41) for use in a position measuring device (1) for determining the position of a substrate (30, 45) supported by the substrate support...
US20090122282 Exposure apparatus, liquid immersion system, exposing method, and device fabricating method  
An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a first surface, which is disposed around an optical path of the exposure light; a...
US20080309900 Method of making patterning device, patterning device for making patterned structure, and method of making patterned structure  
A method and apparatus to fabricate a patterned structure using a template supported on a carrier. The method includes patterning a material to conform to the patterned structure. The patterned...
US20080129972 EXPOSURE APPARATUS  
An exposure apparatus exposes each of a plurality of regions arranged on a substrate. The apparatus includes a processor configured to i) cause a measurement device to acquire an image signal of...
US20070030466 Exposure apparatus control method, exposure method and apparatus using the control method, and device manufacturing method  
An exposure apparatus control method maintains good characteristics of optical elements for a long period of time. The partial pressure of a deterioration causing gas, which is an oxidizing gas or...