Match Document Document Title
US20150212433 PELLICLE  
A pellicle includes a first frame affixing a reticle, the first frame having a tapered locking groove, a second frame on the first frame, the second frame having a locking portion that is...
US20130265557 TEMPERATURE CONTROL IN EUV RETICLE INSPECTION TOOL  
An apparatus comprises an optics assembly and a plate. The optics assembly configured to focus light from an EUV source onto a reticle or sensor. The plate has an opening to allow the EUV light to...
US20100328635 Pellicle  
There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space...
US20130286365 METHOD AND STRUCTURE FOR AUTOMATED INERT GAS CHARGING IN A RETICLE STOCKER  
At least a first reticle is stored in a housing of a stocker. A first gas is delivered to the housing. At least one reticle pod having an additional reticle is delivered into a enclosure within...
US20140307237 PELLICLE FRAME AND PELLICLE WITH THIS  
A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of...
US20140085618 PARTICLE CONTROL NEAR RETICLE AND OPTICS USING SHOWERHEAD  
A method and an apparatus to protect a reticle against particles and chemicals in an actinic EUV reticle inspection tool are presented. The method and apparatus utilizes a pair of porous metal...
US20120200835 RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE AND METHOD FOR CARRYING RETICLE  
A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement...
US20060077361 Means of removing particles from a membrane mask in a vacuum  
A method of removing particles from a membrane reticle by a laser beam or beams. The particles on the bottom of the reticle are knocked off and fall away and particles on the top are removed a...
US20120176588 Immersion Lithography Apparatus and Tank Thereof  
A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of...
US20150212432 Reticle Heater to Keep Reticle Heating Uniform  
Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to...
US20150085264 ROTARY EUV COLLECTOR  
An EUV collector is rotated between or during operations of an EUV photolithography system. Rotating the EUV collector causes contamination to distribute more evenly over the collector's surface....
US20110069288 Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method  
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle...
US20150109590 SCANNER ROUTING METHOD FOR PARTICLE REMOVAL  
A scanner routing method for particle removal is disclosed. A dummy wafer coated with a viscosity builder is provided. The dummy wafer is moved, shot by shot, with an immersion scanner. The said...
US20090153814 SELF-CLEANING SCAN HEAD ASSEMBLY  
A scan head assembly for use in an imaging device for scanning media that uses fluid particles from the atmosphere for cooling an optical system, cleaning existing contamination particles in the...
US20110261329 METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS  
The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system....
US20080266534 PHOTOMASK HAZE REDUCTION VIA VENTILATION  
Where a framed pellicle is mounted on a photomask, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second...
US20080212045 OPTICAL SYSTEM WITH AT LEAST A SEMICONDUCTOR LIGHT SOURCE AND A METHOD FOR REMOVING CONTAMINATIONS AND/OR HEATING THE SYSTEMS  
A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light...
US20110081617 INTEGRATED LITHOGRAPHY EQUIPMENT AND LITHOGRAPHY PROCESS THEREOF  
An integrated lithography equipment is disclosed. The equipment includes an input/output area for loading at least one wafer, a coating a developing area for performing coating and developing...
US20080212044 Debris Mitigation System with Improved Gas Distribution  
The present invention relates to a debris mitigation system, in particular for use in a radiation unit for EUV radiation and/or X-rays. The debris mitigation system comprises a foil trap (11)...
US20140176922 Debris Removal in High Aspect Structures  
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface...
US20140322648 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20140268074 Lithography System with an Embedded Cleaning Module  
The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage;...
US20080137044 Systems and methods for thermally-induced aberration correction in immersion lithography  
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration...
US20050195376 System for purifying purge gases  
A system for purifying purge gases for an optical system, in particular for a projection objective for microlithography for the fabrication of semiconductor components, wherein the optical system...
US20120026474 Reticle Cooling in a Lithographic Apparatus  
An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an...
US20070279605 Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the like  
Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a...
US20090296055 LENS HEATING COMPENSATION SYSTEMS AND METHODS  
Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a...
US20070211232 Thermophoretic Techniques for Protecting Reticles from Contaminants  
Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a...
US20120154771 IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS  
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
US20110236809 METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM  
A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses...
US20080311529 IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS  
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
US20110181848 EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CONTAMINATION CAPTOR  
The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.
US20120127440 OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY  
An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent...
US20150138520 Holding Device for an Optical Element in an Objective  
A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged...
US20120281189 Evaporative thermal management of grazing incidence collectors for EUV lithography  
Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a...
US20120236273 TARGET SUPPLY UNIT  
A target supply unit may include: a reservoir for storing a target material; a heater provided inside the reservoir for heating the target material stored in the reservoir; a heater power supply...
US20090027637 Debris prevention system and lithographic apparatus  
A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic...
US20150077729 MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION  
A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an...
US20110261335 SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN IMMERSION LITHOGRAPHY  
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration...
US20070153247 Exposure apparatus, exposure method, projection optical system and device producing method  
An exposure apparatus includes an optical unit which defines a first exposure area and a second exposure area at different positions in a first direction and which radiates exposure light beams...
US20140253887 CONTAMINATION PREVENTION FOR PHOTOMASK IN EXTREME ULTRAVIOLET LITHOGRAPHY APPLICATION  
Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. In one embodiment, an apparatus for removing debris particles...
US20090021706 Immersion fluid containment system and method for immersion lithogtraphy  
A ferrofluid is provided adjacent to the immersion area between a projection optical system (PL) and substrate and receives a magnetic force so as to form a ferrofluidic seal (100) adjacent to the...
US20080239258 Residual Pupil Asymmetry Compensator for a Lithography Scanner  
A uniformity correction system may be used as an actuator for the correction of asymmetry scan-integrated illumination pupil fill that varies in the non-scanning direction of a lithography system....
US20080259291 Pellicle, lithographic apparatus and device manufacturing method  
A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb...
US20120141928 METHOS AND DEVICE FOR KEEPING MASK DIMENSIONS CONSTANT  
The present application describes a method and a device for keeping the mask dimensions of a mask (6) constant in the mask plane in lithography. The mask (6) is heated due to the exposure during...
US20090213343 RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY  
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further,...
US20100053574 Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate  
A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead...
US20150262831 LITHOGRAPHY TOOL WITH BACKSIDE POLISHER  
Methods for processing a substrate having a structure formed thereon and a system for processing a substrate are provided. A substrate is received from first processing equipment, where the first...
US20150138519 Contamination Trap for a Lithographic Apparatus  
Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme...
US20060256305 Exposure apparatus and method for reducing thermal deformity of reticles  
Disclosed is an exposure apparatus and method thereof able to prevent thermal deformity of reticles. The exposure apparatus may includes a reticle container including a plurality of reticles and a...