Matches 1 - 50 out of 219 1 2 3 4 5 >


Match Document Document Title
US20150212429 Using Wafer Geometry to Improve Scanner Correction Effectiveness for Overlay Control  
Systems and methods for providing improved scanner corrections are disclosed. Scanner corrections provided in accordance with the present disclosure may be referred to as wafer geometry aware...
US20140353527 Using Wafer Geometry to Improve Scanner Correction Effectiveness for Overlay Control  
Systems and methods for providing improved scanner corrections are disclosed. Scanner corrections provided in accordance with the present disclosure may be referred to as wafer geometry aware...
US20140218714 SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE  
A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber...
US20090187878 DATA GENERATION METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRON BEAM EXPOSURE SYSTEM  
A method includes: generating electron beam exposure data, used for electron beam exposure, from design data of a semiconductor device; extracting differential information indicating a difference...
US20120286170 DUAL PASS SCANNING  
A method for exposing a wafer using a plurality of charged particle beamlets. The method comprises identifying non-functional beamlets among the beamlets, allocating a first subset of the beamlets...
US20150243481 PROXIMITY EFFECT CORRECTION IN A CHARGED PARTICLE LITHOGRAPHY SYSTEM  
The invention relates to a method for performing charged particle beam proximity effect correction, comprising the steps of: receiving a digital layout pattern to be patterned onto a target using...
US20070125967 System and method pf electron beam writing  
A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an...
US20050271949 Reticle manipulations  
Slits and holes within a reticle for a local interconnect layer (LIL) are sized according to factors such as relative isolation and whether they are large or small. This helps overcome side-lobing...
US20050035308 Pattern writing equipment  
Pattern-writing equipment for writing a pattern on the surface of an substrate (S) by electron beam lithography comprises electron beam generating means, such as an electron source (10) and anode...
US20110138342 Retargeting for Electrical Yield Enhancement  
A mechanism is provided for electrical yield enhancement retargeting of photolithographic layouts. Optical proximity correction is performed on a set of target patterns in order to produce a set...
US20060151721 Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program  
According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section...
US20060033050 Electron-beam drawing apparatus and electron-beam drawing method  
In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to...
US20090200495 PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM  
In a charged-particle exposure apparatus for exposure of a target with a beam of electrically charged particles, the illumination system includes a deflector device adapted to vary the direction...
US20090057575 CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BEAM LITHOGRAPHY METHOD  
A charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of...
US20090084989 BEAM IRRADIATION APPARATUS WITH DEEP ULTRAVIOLET LIGHT EMISSION DEVICE FOR LITHOGRAPHIC PATTERN INSPECTION SYSTEM  
An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The...
US20090146082 Pattern Lock System for Particle-Beam Exposure Apparatus  
In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are...
US20080135754 Charged-Particle Beam System  
A charged-particle beam system capable of reliably detecting defects in an interconnect pattern, which is formed, for example, on a semiconductor device. The system uses an electron source for...
US20080302980 Extreme ultra-violet lithographic apparatus and device manufacturing method  
An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation,...
US20120292537 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD OF SAME  
A charged particle beam writing apparatus, includes a unit to input information about a stripe region height, and to judge, when a write region is divided into stripe regions in a thin rectangular...
US20060076513 Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method  
A variable rectangle-type electron beam exposure apparatus for forming rectangular beams of different angles is provided which is capable of highly finely conducting exposure with respect to a...
US20050202326 OPTIMIZED PLACEMENT OF SUB-RESOLUTION ASSIST FEATURES WITHIN TWO-DIMENSIONAL ENVIRONMENTS  
A method of creating a photomask layout for projecting an image of an integrated circuit design comprises creating a layout of spaced integrated circuit shapes to be projected via the photomask,...
US20070145303 Protecting Aperture for Charged Particle Emitter  
A charged particle beam apparatus and a method are provided. The apparatus comprises a charged particle emitter located within a gun chamber, the gun chamber being adapted to encompass a first...
US20080001103 Electron-beam lithography method and apparatus, and program thereof  
An electron-beam lithography apparatus, an electron-beam lithography method, and an electron-beam lithography program are provided that prevent any deformation in pattern dimension at a connection...
US20090108215 MASK AND METHOD FOR FORMING A SEMICONDUCTOR DEVICE USING THE SAME  
A mask is formed with first contact patterns in first columns and second contact patterns in second columns. Each first column is formed between adjacent second columns. The first contact pattern...
US20090267003 SEMICONDUCTOR EXPOSURE DEVICE USING EXTREME ULTRA VIOLET RADIATION  
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided...
US20070138413 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS  
A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an...
US20100038554 COMPENSATION OF DOSE INHOMOGENEITY AND IMAGE DISTORTION  
An improved aperture arrangement in a device for defining a pattern on a target, for use in a particle-beam exposure apparatus, by being irradiated with a beam of electrically charged particles...
US20080245975 Electrically Programmable Reticle and System  
An electrically programmable reticle is made using at least one electrochromatic layer that changes its optical transmissibility in response to applied voltages. Transparent conductor layers are...
US20110068281 CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF  
A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each...
US20100062349 Stencil, Stencil Design System and Method for Cell Projection Particle Beam Lithography  
Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them...
US20140299790 INSPECTION METHOD AND AN INSPECTION SYSTEM EXHIBITING SPECKLE REDUCTION CHARACTERISTICS  
A method and an inspection system that exhibiting speckle reduction characteristics includes a light source arranged to generate input light pulses, and diffuser-free speckle reduction optics that...
US20090242787 CHARGED-PARTICLE BEAM WRITING METHOD AND CHARGED-PARTICLE BEAM WRITING APPARATUS  
A pattern density distribution and a dose distribution calculated using the pattern density distribution are multiplied by each other to calculate an exposure distribution. A fogging electron...
US20080090396 LIGHT EXPOSURE APPARATUS AND METHOD FOR MAKING SEMICONDUCTOR DEVICE FORMED USING THE SAME  
An object of the present invention is to reduce variation in light exposure on an irradiation surface through a mask when the surface is exposed to laser light emitted from a laser source, whereby...
US20100155625 Methods for concealing surface defects  
Methods for removing random or uncontrolled surface defects from a work piece surface are provided, by applying a plurality of induced controlled defects over the random defects to alter the...
US20090084990 CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM WRITING METHOD  
A timing control circuit controls the timing for applying a voltage to a sub deflector when changing a position to be irradiated with the charged-particle beam. A control computer compares a...
US20090230330 METHOD OF REPAIRING A SPECIMEN INTENDED TO BE ANALYSED BY ELECTRON MICROSCOPY  
The invention relates to a method of repairing crystal defects buried within a specimen (10) deriving from a semiconductor device. This specimen (10) is prepared by the use of a focused ion beam...
US20090141750 SYSTEMS AND METHODS FOR LINK PROCESSING WITH ULTRAFAST AND NANOSECOND LASER PULSES  
Systems and methods for processing an electrically conductive link in an integrated circuit use a series of laser pulses having different pulse widths to remove different portions of a target...
US20090032738 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF  
A charged particle beam writing apparatus includes a dividing unit configured to virtually divide a writing region of a target workpiece into a plurality of small regions along a writing...
US20090134343 TRACKING CONTROL METHOD AND ELECTRON BEAM WRITING SYSTEM  
Control data for a main deflector is calculated based on position data that specifies the position of a region to be irradiated with the electron beam on the subfield, data on the number of all...
US20070148558 Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto  
A photo mask having at least 2 mask pattern layers disposed to collimate light patterns passing through the mask. An improved optical photo lithographic system utilizing light collimating photo...
US20050254035 Multi-photon lithography  
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while...
US20080308751 MULTI-FUNCTION MODULE FOR AN ELECTRON BEAM COLUMN  
A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting,...
US20120001097 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF  
A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing...
US20070178402 Laser irradiation device and method of fabricating organic light emitting display device using the same  
A laser irradiation device and a method of fabricating an organic light emitting display device (OLED) using the same are disclosed. The laser irradiation device includes: a laser source...
US20070267582 SUBSTRATE EDGE EXPOSURE APPARATUS  
Prior to edge exposure, the type of a photo resist that has been coated on a semiconductor wafer is identified. Then, the sensitivity of this resist is determined based on the information of the...
US20060228634 Beam-induced etching  
A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is...
US20080237460 METHOD FOR MASKLESS PARTICLE-BEAM EXPOSURE  
For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern...
US20090001293 CHARGED PARTICLE BEAM WRITING METHOD  
A charged particle beam writing method includes writing a pattern on a first target object by using a charged particle beam in a writing apparatus; and conveying a second target object after...
US20090001292 EXPOSURE DEVICE  
The present invention relates to an exposure device for forming circuit patterns onto a surface of an object. The exposure device includes at least one spatial light modulator which includes a...
US20080099673 Electron Beam Apparatus and Electron Beam Inspection Method  
The present invention provides a charged-particle beam inspection technology that enables to acquire a shadow contrast enhanced image, and to detect a shallow roughness with sufficient...

Matches 1 - 50 out of 219 1 2 3 4 5 >