Matches 201 - 219 out of 219 < 1 2 3 4 5


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US20140302443 DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE  
The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam, including a transmission unit including a plurality of channels and...
US20140264086 CHARGED PARTICLE LITHOGRAPHY SYSTEM  
A charged particle lithography system for exposing a wafer according to pattern data. The system comprises an electron optical column for generating a plurality of electron beamlets for exposing...
US20140168629 DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD  
Provided is a drawing apparatus including a plurality of drawing devices each of which is configured to draw a pattern on a substrate with a plurality of charged particle beams, the plurality of...
US20140168628 DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE  
The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a first member in which an aperture, through which...
US20140097362 System and Method for Compressed Data Transmission in a Maskless Lithography System  
Compression, transmission and decompression of gray-tone imagery data includes receiving a gray-tone image suitable for printing at least a portion of a pattern onto a substrate by operation of an...
US20130316289 Electron Beam Data Storage System and Method for High Volume Manufacturing  
The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality...
US20130316273 Method For Fracturing And Forming A Pattern Using Shaped Beam Charged Particle Beam Lithography  
In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed,...
US20130164692 DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE  
The present invention provides a drawing apparatus which performs drawing on a substrate with a charged particle beam based on drawing data generated from pattern data representing a circuit...
US20130146780 SYSTEMS AND METHODS PROVIDING ELECTRON BEAM WRITING TO A MEDIUM  
A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The...
US20130082195 METHOD AND APPARATUS FOR IRRADIATING A SEMICONDUCTOR MATERIAL SURFACE BY LASER ENERGY  
An apparatus for irradiating semiconductor material is disclosed having, a laser generating a primary laser beam, an optical system and a means for shaping the primary laser beam, comprising a...
US20130022929 METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING SHAPED CHARGED PARTICLE BEAM LITHOGRAPHY  
In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single...
US20120292536 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD  
A charged particle beam writing apparatus includes a unit to divide a chip region into first data processing blocks, a unit to, in each block, extract a cell whose reference position is located in...
US20120193553 CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD  
A charged-particle beam writing apparatus used for writing a predetermined pattern on a sample placed on a stage with a charged-particle beam. The apparatus comprises a height measuring unit that...
US20120012760 Laser irradiation apparatus  
A laser irradiation apparatus provides a laser beam along a scan direction to a semiconductor layer including a plurality of pixel areas. The laser irradiation apparatus includes at least one...
US20110287345 ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING TEMPLATE MANUFACTURING METHOD  
According to one embodiment, there is provided a electron beam drawing apparatus includes an irradiation module which irradiates a resist coated onto a substrate with a electron beam, and a...
US20110226970 SYSTEM AND METHOD FOR GENERATING DIRECT-WRITE PATTERN  
A direct-write system is provided which includes a stage for holding a substrate, a processing module for processing pattern data and generating instructions associated with the pattern data, and...
US20110140007 SEMICONDUCTOR MANUFACTURING APPARATUS  
To project a rectangular laser spot having a predetermined size and a high laser power density onto the surface of an object, a semiconductor manufacturing apparatus comprises a control unit for...
US20110089345 METHOD AND SYSTEM FOR MANUFACTURING A SURFACE USING CHARGED PARTICLE BEAM LITHOGRAPHY  
In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single...
US20110042588 Semiconductor manufacturing apparatus  
Disclosed herein is a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus precisely adjusts the position and size of a light spot formed on a substrate, enabling...

Matches 201 - 219 out of 219 < 1 2 3 4 5