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US20090286383 TREATMENT OF WHISKERS  
A photo-curing or photosintering process is utilized to modify, reduce or eliminate whiskers or nanowires growing on a material surface.
US20140284500 SETTLING TIME ACQUISITION METHOD  
A settling time acquisition method includes writing at least one reference pattern formed by at least one shot of a charged particle beam, writing an evaluation pattern, which has been formed by...
US20080029823 Semiconductor Device Having a Dual Stress Liner and Light Exposure Apparatus for Forming the Dual Stress Liner  
In a semiconductor device having a dual stress liner for improving electron mobility, the dual stress liner includes a first liner portion formed on a PMOSFET and a second liner portion formed on...
US20070023692 Seamless stitching of patterns formed by interference lithography  
This invention addresses the scalability problem of periodic “nanostructured” surface treatments such as those formed by interference lithography. A novel but simple method is described that...
US20050271949 Reticle manipulations  
Slits and holes within a reticle for a local interconnect layer (LIL) are sized according to factors such as relative isolation and whether they are large or small. This helps overcome side-lobing...
US20130295695 System and Method for Rejuvenating an Imaging Sensor Degraded by Exposure to Extreme Ultraviolet or Deep Ultraviolet Light  
The present invention for imaging sensor rejuvenation may include a rejuvenation illumination system configured to selectably illuminate a portion of an imaging sensor of an imaging system with...
US20080299783 SYSTEMS AND METHODS FOR PROCESSING SEMICONDUCTOR STRUCTURES USING LASER PULSES LATERALLY DISTRIBUTED IN A SCANNING WINDOW  
Systems and methods process structures on or within a semiconductor substrate using a series of laser pulses. In one embodiment, a deflector is configured to selectively deflect the laser pulses...
US20100081259 DISLOCATION ENGINEERING USING A SCANNED LASER  
A method for generating patterned strained regions in a semiconductor device is provided. The method includes directing a light-emitting beam locally onto a surface portion of a semiconductor...
US20090026389 MULTI-BEAM SOURCE  
A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of...
US20090140582 PLANAR MOTOR AND STAGE USING THE SAME  
A planar motor includes a movable body and a stator configured to drive the movable body in a plane. The stator includes a first stator unit and a second stator unit. The movable body is moved in...
US20080044740 PHOTOMASK HAVING HAZE REDUCTION LAYER  
A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.
US20080175349 MASKLESS EUV PROJECTION OPTICS  
Various embodiments provide projection optics comprise a plurality of mirrors that provide high demagnification of, for example, about one hundred times or more. The projection optics may be used...
US20050250017 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank  
To provide a method for manufacturing a mask blank capable of manufacturing a high quality mask blank that suppresses generation of defects in a thin film for forming a mask pattern with high...
US20090127473 Electron Beam Irradiation Device  
An electron beam irradiation device of the present invention includes: a projector 8 for generating a two-dimensional light pattern 13; a microchannel plate 11 for (i) generating an electron beam...
US20080311762 Semiconductor device surface roughness reduction  
Methods and apparatus relating to surface roughness reduction are described. In one embodiment, a particle beam may be directed onto the surface roughness of a semiconductor device to reduce the...
US20120206723 DEVICE FOR DETECTING ELECTROMAGNETIC RADIATION COMPRISING A DIFFUSION JUNCTION AND A RESONANT GRATING IN A SINGLE LAYER  
A photodiode device including a photosensitive diffusion junction within a single layer. The photodiode device further includes a resonant grating located within the single layer. The...
US20080302980 Extreme ultra-violet lithographic apparatus and device manufacturing method  
An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation,...
US20100301233 ULTRAVIOLET IRRADIATION DEVICE  
Prior to applying of ultraviolet rays to a surface of a wafer with a protective tape joined thereto that is placed and held on a holding table, an illumination sensor moves to a position below an...
US20060033043 Stacked six degree-of-freedom table  
A table with six degrees of freedom, such as a wafer table for a lithography system, has an upper table stacked on top of a lower table. Each of these two stacked tables has three degrees of...
US20130320242 PROCESS FOR PRODUCING DOPED GALLIUM ARSENIDE SUBSTRATE WAFERS HAVING LOW OPTICAL ABSORPTION COEFFICIENT  
A process is disclosed for producing a doped gallium arsenide single crystal by melting a gallium arsenide starting material and subsequently solidifying the gallium arsenide melt, wherein the...
US20080299490 WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS  
A charged particle beam writing apparatus includes a stage on which a first mask substrate and a second mask substrate are arranged side by side, and a writing unit to write a first pattern on the...
US20090321633 NANOPILLAR ARRAYS FOR ELECTRON EMISSION  
The present invention provides systems, devices, device components and structures for modulating the intensity and/or energies of electrons, including a beam of incident electrons. In some...
US20110198509 ULTRAVIOLET LIGHT EXPOSURE CHAMBER FOR PHOTOVOLTAIC MODULES  
An apparatus for performing UV light exposure testing of solar panels, also known as PV modules, with superior exposure uniformity, equipment throughput, and floor space requirements, consisting...
US20100025588 DETERMINING DIFFUSION LENGTH OF MINORITY CARRIERS USING LUMINESCENCE  
Methods (200, 300), apparatuses and systems (100) for determining minority carrier diffusion lengths in a semi-conductor structure (130), which may be a solar cell or a unprocessed or partially...
US20150097126 ALIGNMENT SENSOR AND HEIGHT SENSOR  
One embodiment relates to a device that senses alignment and height of a work piece. The device may include both an alignment sensor and a height sensor. The alignment sensor generates a first...
US20080001103 Electron-beam lithography method and apparatus, and program thereof  
An electron-beam lithography apparatus, an electron-beam lithography method, and an electron-beam lithography program are provided that prevent any deformation in pattern dimension at a connection...
US20080315126 Laser light source apparatus, exposure method, and exposure apparatus  
Information on the side of the body of an exposure apparatus is effectively used on the side of the laser light source apparatus. There is provided a laser light source apparatus which supplies a...
US20060124866 Electron beam exposure method and system therefor  
A method of leading an electron beam radiated from an electron emitter through openings provided in a stencil mask to a sensitive sample and exposing it includes placing the electron beam under a...
US20090267003 SEMICONDUCTOR EXPOSURE DEVICE USING EXTREME ULTRA VIOLET RADIATION  
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided...
US20070235665 Charged particle beam system and method for manufacturing and inspecting LCD devices  
A layer on a large area substrate is patterned by providing a large area substrate in the optical path of a plurality of charged particle beams that are emitted from charged particle emitters....
US20080023639 Ultraviolet Irradiation Apparatus  
A semiconductor wafer is taken as an object to be irradiated, to which a protection sheet S is stuck via an ultraviolet cured adhesive layer, and an ultraviolet irradiation part 12 is disposed...
US20090180109 DEFECT INSPECTION METHOD AND DEFECT INSPECTION SYSTEM  
An object of the invention is to provide a defect inspection method which can prevent the failure in detecting a defect, caused by saturation of a pattern signal obtained by inspecting an...
US20090170010 High-resolution, patterned-media master mask  
A high-resolution, patterned-media master mask is disclosed. The high-resolution, patterned-media master mask includes an electron-absorption substrate for absorbing electrons from an electron...
US20090206280 CHARGED-BEAM EXPOSURE APPARATUS HAVING AN IMPROVED ALIGNMENT PRECISION AND EXPOSURE METHOD  
The first charged-beam optical system, which is one of the charged-beam optical systems, detects first marks provided on the chips formed in the wafer. The positions of the chips made in the wafer...
US20090214411 METHOD OF SELECTIVELY ELIMINATING METALLIC CARBON NANOTUBES, SEMICONDUCTING CARBON NANOTUBES AND PREPARATION METHOD THEREOF USING THE SAME  
Metallic carbon nanotubes (“CNTs”) may be selectively eliminated and semiconducting CNTs may be prepared using light-irradiation. The light provided by the light-irradiation may have a wavelength...
US20080299750 MULTIPLE MILLISECOND ANNEALS FOR SEMICONDUCTOR DEVICE FABRICATION  
A method of forming a doped region includes, in one embodiment, implanting a dopant into a region in a semiconductor substrate, recrystallizing the region by performing a first millisecond anneal,...
US20100096566 Reducing Line Edge Roughness by Particle Beam Exposure  
Reducing line edge roughness by particle beam exposure is generally described. In one example, a method includes forming one or more line structures on a surface of a semiconductor substrate,...
US20110117678 CARBON CONTAINING LOW-K DIELECTRIC CONSTANT RECOVERY USING UV TREATMENT  
A method for the ultraviolet (UV) treatment of carbon-containing low-k dielectric and associated apparatus enables process induced damage repair. The methods of the invention are particularly...
US20090084985 Cadmium sulfide quantum dot lasing in room temperature liquid solution  
Disclosed is a lasing complex comprising a room temperature solution containing cadmium sulfide (CdS) quantum dots. Optical gain has been observed in CdS nanocrystal quantum dots in strong...
US20130068970 UV Irradiation Apparatus Having UV Lamp-Shared Multiple Process Stations  
A UV irradiation apparatus for treating substrates includes: at least two process stations each provided with a UV transmissive window; at least one electric UV lamp using two electrodes in a gas...
US20090014666 OPTICAL SYSTEM HAVING A CLEARNING ARRANGEMENT  
A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants...
US20100006777 PROCESS FOR PRODUCING DOPED GALLIUM ARSENIDE SUBSTRATE WAFERS HAVING LOW OPTICAL ABSORPTION COEFFICIENT  
A process is disclosed for producing a doped gallium arsenide single crystal by melting a gallium arsenide starting material and subsequently solidifying the gallium arsenide melt, wherein the...
US20050035306 Focused charged particle beam apparatus  
In order to enable perpendicular processing of a slice in all directions about a lens optical axis, a focused charged particle beam of the present invention is provided with a tilt mechanism...
US20050254035 Multi-photon lithography  
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while...
US20080210887 Charged Particle System  
A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a...
US20080128638 Multi-Beam Modulator For a Particle Beam and Use of the Multi-Beam Modulator for the Maskless Structuring of a Substrate  
The invention discloses a multibeam modulator which generates a plurality of individual beams from a particle beam. The particle beam illuminates the multibeam modulator at least partially over...
US20060228634 Beam-induced etching  
A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is...
US20060071182 Method of processing semiconductor apparatus  
The present invention relates to a method (apparatus) of processing a semiconductor apparatus, wherein a processing beam is irradiated on a semiconductor apparatus comprising an insulation film...
US20100022102 LASER ANNEALING METHOD AND DEVICE  
A laser annealing method for executing laser annealing by irradiating a semiconductor film formed on a surface of a substrate with a laser beam, the method including the steps of, generating a...
US20080017810 Correction of spatial instability of an EUV source by laser beam steering  
A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an...

Matches 1 - 50 out of 229 1 2 3 4 5 >