|
Match
|
Document |
Document Title |
|
|
US20090314314 |
Aseptic, high pressure water cleaning chamber
There are disclosed systems and methods of debriding tissue. In an embodiment, a system includes a bone tube having an opening sized to receive a bone with tissue disposed thereon, the opening of...
|
|
|
US20090314316 |
Steam Cleaner
A steam cleaning apparatus comprises a chamber with at least one holder. A plurality of nozzles is incorporated in the holder and is adapted to disperse steam within the chamber.
|
|
|
US20090305612 |
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a...
|
|
|
US20090293913 |
Water-Powered Hand-Washing System and Method
A hand-washing system for washing fingernail beds and cuticular regions of human fingers and thumbs (collectively “digits”). The hand-washing system includes a work enclosure for containing...
|
|
|
US20090293909 |
ARRANGEMENT AND METHOD FOR REMOVING ALKALI- OR ALKALINE EARTH-METALS FROM A VACUUM COATING CHAMBER
The invention relates to a cleaning method in which from a vacuum coating chamber ( 3 ) of a coating installation ( 1 ) for the coating of substrates ( 2 ) with alkali- or alkaline earth-metals,...
|
|
|
US20090272412 |
High-Pressure Cleaner Having An Integrated Textile Flat Hose
A high-pressure cleaner having a housing and a high-pressure hose for connection to a spray fixture. The high-pressure cleaner includes a textile flat hose for connection to a water supply.
|
|
|
US20090275213 |
SEMICONDUCTOR WAFER PROCESSING METHOD AND APPARATUS
A processing method of a semiconductor wafer is provided. The method comprising the steps of: removing at least part of oxide film from a surface of the semiconductor wafer; removing liquid from...
|
|
|
US20090255560 |
NOZZLE SYSTEM
A cleaning machine, preferably a dishwasher is provided. The machine comprises at least one spray pipe, spray arm or spray arm blade being substantially of elongate extent which is provided with a...
|
|
|
US20090242000 |
HAND HELD SELF CONTAINED PACIFIER OR BABY BOTTLE NIPPLE SPRAY CLEANER
A hand held self contained cleaning apparatus includes a reservoir containing a single use cleaning and/or disinfecting liquid, a pump, and a nozzle for directing a spray of the cleaning and/or...
|
|
|
US20090217952 |
Paint Brush Cleaner
The present invention relates to a paint brush cleaner including an open ended cover ( 10 ) into which a paint brush (B) can be inserted handle end first. A connector ( 13 ) is provided for...
|
|
|
US20090205689 |
DISHWASHER
The present invention provides a dishwasher which permits cost reductions while enabling increased strength. A reinforcement member is mounted between pillars, which are erected in the corners of a...
|
|
|
US20090208367 |
AUTOCLAVABLE BUCKETLESS CLEANING SYSTEM
An autoclavable bucketless cleaning system. The system includes an autoclavable vessel with an inside for storing fluid under pressure and with a first connection point and a second connection...
|
|
|
US20090202951 |
CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM
A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second...
|
|
|
US20090199882 |
Method and device for cleaning welding torches
A device for cleaning welding torches includes a device for applying cleaning or wetting liquid to the tip of the welding torch and a coil with an opening for inserting the welding torch in order...
|
|
|
US20090188532 |
Reactor cleaning apparatus
In a reactor cleaning apparatus 1 which cleans an inner wall surface 72 of a reactor 70 which generates polycrystalline silicon, a bell jar of the reactor 70 has a dual structure, a through...
|
|
|
US20090178697 |
MULTI-DIRECTIONAL ACTUATOR FOR A PUMP
A steam mop having a main body including a water pump for pumping water from a water tank to a steam generator in response to any movement of the mop is provided. Movement of the mop causes a pump...
|
|
|
US20090174871 |
Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus
A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.
|
|
|
US20090151757 |
APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA
The embodiments of the present invention provide apparatus for cleaning patterned substrates with fine features with cleaning materials. The apparatus using the cleaning materials has advantages in...
|
|
|
US20090139656 |
Substrate processing apparatus
The present invention provides a substrate processing apparatus for processing substrates by immersing the substrates in a processing liquid. This substrate processing apparatus includes a...
|
|
|
US20090133714 |
METHOD FOR SURFACE TREATING SUBSTRATE AND PLASMA TREATMENT APPARATUS
A method for surface treating a substrate includes supplying first plasma generated by using nitrogen gas and oxygen gas toward a substrate surface to surface treat the substrate surface in air. In...
|
|
|
US20090107521 |
CHEMICAL SOLUTION OR PURE WATER FEEDER, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, OR SUBSTRATE PROCESSING METHOD
By adding a perfluoromonomer to PVDF being a fluororesin to soften it, the oxygen permeability can be significantly reduced and a flexible fluororesin tube can be obtained. The oxygen permeability...
|
|
|
US20090101166 |
APPARATUS AND METHODS FOR OPTIMIZING CLEANING OF PATTERNED SUBSTRATES
Methods and apparatus for cleaning wafer surfaces are provided, especially for cleaning surfaces of patterned wafers. The cleaning apparatus includes a cleaning head with channels on the surface...
|
|
|
US20090095334 |
SHOWERHEAD ASSEMBLY
A method and apparatus for removing native oxides from a substrate surface is provided. In one embodiment, the apparatus for removing native oxides from a substrate surface includes a showerhead...
|
|
|
US20090071503 |
METHOD AND DEVICE FOR TREATING SUBSTRATES AND NOZZLE UNIT THEREFOR
A method and device for treating substrates, and a nozzle unit therefore. A liquid film is formed on a local surface area of a substrate that is to be treated by means of a nozzle unit comprised of...
|
|
|
US20090065031 |
METHOD FOR CLEANING A BOILER OF A FURNACE
A method of cleaning a waste boiler, comprising mounting a robot adjacent an interior surface of a wall of the boiler, the robot operative to emit a high pressure jet of fluid against an interior...
|
|
|
US20090056741 |
Cleaning apparatus, cleaning method, pattern formation apparatus, and pattern formation method
A pattern formation apparatus has a drum-like intaglio rolling along a transferred medium. After the intaglio is charged by a charger, a pattern of toner particles is formed by supplying a liquid...
|
|
|
US20090056746 |
Methods For Treating Surfaces, And Apparatuses For Treating Surfaces
Some embodiments include methods of treating surfaces with aerosol particles. The aerosol particles may be formed as liquid particles, and then passed through a chamber under conditions which...
|
|
|
US20090056753 |
Device for Cleaning a Filter Element
A device ( 11 ) for cleaning a pleated filter element, the device having; a body, a fluid inlet ( 13 ), a work face ( 14 ) having at least one pleat separating projection ( 19 ) and at least one...
|
|
|
US20090056772 |
NOZZLE APPARATUS OF DISHWASHER
A nozzle apparatus of a dishwasher including a washing nozzle configured to inject washing water onto targets to be washed, a water supply passage part for allowing the flow of washing water...
|
|
|
US20090032060 |
BERNOULLI BLADE
An end effector for a transport robot arm for a wafer wet cleaning system has an arm with a chuck at an end of the arm to support a wafer. The chuck also includes a cavity to spray a bottom surface...
|
|
|
US20090025763 |
SUBTRATE TREATMENT APPARATUS
An inventive substrate treatment apparatus includes a substrate rotation unit which rotates a substrate, a brush to be brought into contact with at least a peripheral edge portion of a front...
|
|
|
US20090020144 |
METHOD AND APPARATUS FOR CLEANING A SUBSTRATE
An apparatus for wet processing individual substrates comprising; a means for holding the substrate; a means for providing acoustic energy to a non-device side of the substrate; and a means for...
|
|
|
US20090020135 |
COMBINED CLEANER APPARATUS, SYSTEM, AND METHOD OF USE THEREOF
The present invention relates to a combined cleaner apparatus, a combined cleaner method, and a cleaner system. The combined cleaner apparatus includes a housing element, said housing element...
|
|
|
US20090014037 |
Method and Apparatus for Cleaning or Descaling of Thin Slabs and Strips in a Hot Strip Rolling Mill Train, Strip Treatment Installations or the Like
The invention relates to a method of cleaning or descaling thin slabs and rolled strips in a hot strip rolling mill train and is characterized by use of cryogens such as oxygen or compound formed...
|
|
|
US20090000639 |
Method for Energy Coupling Especially Useful for Disinfecting, and Various Systems Using It
Method and system are disclosed for coupling energy from at least on energy source, e.g. UV light source, ultrasonic transducer, or combination thereof, to a target site, e.g. hazardous bacteria,...
|
|
|
US20080308125 |
Apparatus and Method for Cleaning a Sawn Wafer Block
An apparatus for cleaning a sawn wafer block includes a cleaning basin, a fixture for holding a sawn wafer block in the cleaning basin such that, when cleaning liquid is present in the cleaning...
|
|
|
US20080308129 |
MANUFACTURING METHOD OF EPITAXIAL SILICON WAFER AND SUBSTRATE CLEANING APPARATUS
A manufacturing method of an epitaxial silicon wafer is provided. The epitaxial silicon wafer includes: a substrate cut out from a silicon monocrystal that has been manufactured, doped with...
|
|
|
US20080276975 |
Spray Nozzle For a Dishwasher
A dishwasher ( 60 ) spray nozzle ( 20 ) is arranged on an outer surface ( 34 ) of a spray system ( 22 ) for discharging a spray jet ( 28 ). The outlet opening of the spray nozzle ( 20 ) has a...
|
|
|
US20080271763 |
Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids
Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a...
|
|
|
US20080257386 |
Water-Based Cleaning
A method of cleaning a surface, comprising applying de-gassed water (containing no more than 1 ppm gas) to the surface to disperse or dissolve dirt on the surface in the water. The method may also...
|
|
|
US20080245390 |
Method for cleaning semiconductor wafer surfaces by applying periodic shear stress to the cleaning solution
Systems and methods for cleaning particulate contaminants adhered to wafer surfaces are provided. A cleaning media including dispersed coupling elements suspended within the cleaning media is...
|
|
|
US20080245396 |
Inflatable splash washer and method
A method for discharging a fluid in an inflated assembly. The method includes inflating a roller assembly having a roller, rotatably coupling the inflated roller assembly to an inflated structure,...
|
|
|
US20080236634 |
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CLEANING APPARATUS
A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined...
|
|
|
US20080230100 |
Nozzle assembly
A nozzle assembly for use in cleaning tubular members of a tube-type heat exchange having a protective coating. A metal nozzle core for communicating with a source of high-pressure water is covered...
|
|
|
US20080223408 |
SYSTEM & METHOD FOR PREVENTING SCALING IN A FLUE GAS DESULPHURIZATION SYSTEM
A system & Method for Preventing Scaling in a Flue Gas Desulphurization System is provided. The system includes an injector configured to direct a barrier fluid toward a surface that is otherwise...
|
|
|
US20080216878 |
Material-removal system
A material-removal system can include a spray-head assembly with a plurality of rotatable fluid bars arranged in a single shroud with overlapping sweeps. A gear-box assembly can index the rotations...
|
|
|
US20080216879 |
Sanitizer cleaning system for shopping carts
A self-contained, fogging/atomizing sanitizer cleaning system for multiple grocery/shopping carts is manufactured and retro-fit for any size room which is used to hold shopping/grocery carts before...
|
|
|
US20080210278 |
Substrate processing apparatus
A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate...
|
|
|
US20080210277 |
Warewasher and Associated Door Construction
A warewasher for washing wares including a housing defining an internal space with at least one spray zone for washing wares. The housing includes an opening defined in part by a lower shelf. A...
|
|
|
US20080210276 |
Multipurpose Aqueous Parts Washer
The present disclosure relates generally to a multipurpose parts washer used to remove grease, oil, and dirt from mechanical parts, and more particularly, to an apparatus for washing parts within a...
|