Matches 1 - 12 out of 12
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US20090288593 ELECTROLESS DEPOSITION SYSTEM  
An electroless deposition system includes a deposition solution, and saturating the deposition solution with an oxygen concentration in a range from about two thousand parts per million to about...
US20090288594 ELECTROLESS DEPOSITION CHEMICAL SYSTEM LIMITING STRONGLY ADSORBED SPECIES  
An electroless deposition chemical system includes an electroless solution including a metal component, and a strongly adsorbed species component having a concentration less than a concentration of...
US20090253262 ELECTROLESS PLATING SYSTEM  
An electroless plating system includes a plating solution, and controlling reducing agents in the plating solution for deposition over outlier features smaller than about five hundred nanometers...
US20090130315 Method for Continuously Operating Acid or Alkaline Zinc or Zinc Alloy Baths  
The invention provides a process for depositing metallic layers from acidic or alkaline zinc or zinc alloy baths containing organic additives selected from brighteners, surfactants and complexing...
US20090101170 SYSTEM FOR SOAKING ROLLS OF ABSORBING MATERIAL TO BE USED IN PRINTING MACHINE CLEANING  
System for soaking absorbing material rolls or sheets ( 1 b, 2 b ) with a solvent ( 1 a, 2 a ), such a solvent being contained into a bag made of plastic divided into two separated partitions,...
US20080224314 Method and Apparatus for Forming a Noble Metal Layer, Notably on Inlaid Metal Features  
A cap layer for a metal feature such as a copper interconnect on a semiconductor wafer is formed by immersion plating a more noble metal (e.g. Pd) onto the copper interconnect and breaking up,...
US20080160204 Spontaneous copper seed deposition process for metal interconnects  
A method for depositing a copper seed layer onto a semiconductor substrate comprises applying a SCuD plating bath onto a surface of a substrate, rinsing the surface with an organic solvent,...
US20080141933 Semiconductor plating system for plating semiconductor object  
Provided is a semiconductor plating system for plating a semiconductor object with a desired layer. The semiconductor plating system include a plating tank configured to accommodate a plating...
US20080085370 ELECTROLESS PLATING METHOD AND APPARATUS  
An electroless plating system is provided. The system includes a first vacuum chuck supporting a first wafer and a second vacuum chuck supporting a second wafer such that a top surface of the...
US20080073402 WEB GUIDING ROLLER AND WEB CONVEYING APPARATUS  
A web conveying apparatus is provided with a plurality of web guiding rollers. The web guiding rollers convey a web on which a functional material has just been coated in a coating section. Concave...
US20080057211 METHODS FOR PLATING AND FABRICATION APPARATUS THEREOF  
A method for plating includes positioning a substrate facing a plating solution. The method also includes immersing the substrate into the plating solution while plating a layer of material over a...
US20080003372 Method for Curing Radically Curable Compounds in a Protective Atmosphere and Device for Carrying Out Said Method  
A method of curing free-radically curable compositions under an inert gas atmosphere, where the curing, which proceeds in accordance with a free-radical mechanism, is initiated, or initiated and...
Matches 1 - 12 out of 12