METHOD AND APPARATUS FOR FORMING DEPOSITS ON A SUBSTRATE BY CATHODE SPUTTERING USING A FOCUSSED ION BEAM
United States Patent 3472751
Inventors:
King, William J.
Publication Date:
10/14/1969
Assignee:
ION PHYSICS CORP
Other Classes:
313/363.100, 204/298.040, 148/DIG.084
International Classes:
C23C14/46; H01J37/08; H01J37/34; H01J37/32; C23C15/00