CATHODIC SPUTTERING FROM A CATHODICALLY BIASED TARGET ELECTRODE HAVING AN RF POTENTIAL SUPERIMPOSED ON THE CATHODIC BIAS
United States Patent 3461054
US Patent References:
Method for the fabrication of tantalum film resistors
- - 3258413
Rf sputtering apparatus including a capacitive lead-in for an rf potential
- - 3347772
Deposition of insulating films by cathode sputtering in an rf-supported discharge
- - 3287243
Method for the fabrication of tantalum film resistors
- - 3258413
Rf sputtering apparatus including a capacitive lead-in for an rf potential
- - 3347772
Deposition of insulating films by cathode sputtering in an rf-supported discharge
- - 3287243
Inventors:
Vratny, Frederick
Publication Date:
08/12/1969
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Assignee:
BELL TELEPHONE LABOR INC
Primary Class:
Other Classes:
204/192.120, 204/298.080
International Classes:
C23C14/34; H01J37/34; H01J37/32; C23C15/00