United States Patent 3440050
Publication Date:
04/22/1969
Assignee:
POLYCHROME CORP
Other Classes:
430/168, 430/276.100, 430/302, 430/155, 430/278.100, 205/201
International Classes:
B41N3/03; G03C1/94; B41N1/04
US Patent References:
| 3169065 | Method of making resist and deep etch lithographic printing plates with ferric ammonium compound sensitized plates | | | |