Title:
METHOD OF MAKING A WORKPIECE AT A UNIFORM POTENTIAL DURING CATHODE SPUTTERING
United States Patent 3423303
Inventors:
Davidse, Pieter D.
Koster, Lawrence R.
Himes, Walter
Publication Date:
01/21/1969
Export Citation:
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Assignee:
IBM
Primary Class:
204/192.25
Other Classes:
204/192.12, 204/192.22, 422/906
International Classes:
H01J37/34; H01J37/32; (IPC1-7): A23C15/00
View Patent Images:
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US Patent References:
3282815Magnetic control of film deposition
3278407Deposition of thin film by sputtering




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