METHOD OF MAKING A WORKPIECE AT A UNIFORM POTENTIAL DURING CATHODE SPUTTERING
United States Patent 3423303
US Patent References:
Deposition of thin film by sputtering
- - 3278407
Magnetic control of film deposition
- - 3282815
Deposition of thin film by sputtering
- - 3278407
Magnetic control of film deposition
- - 3282815
Inventors:
Davidse, Pieter D.
Koster, Lawrence R.
Himes, Walter
Koster, Lawrence R.
Himes, Walter
Publication Date:
01/21/1969
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Assignee:
IBM
Primary Class:
Other Classes:
204/192.220, 422/906, 204/192.120
International Classes:
H01J37/34; H01J37/32; A23C15/00