Title:
High current duoplasmatron having an apertured anode positioned in the low pressure region
United States Patent 3408283
US Patent References:
Ion source
- - 2934665
Production of thin film metallic patterns
- - 3133874
High output duoplasmatron-type ion source
- - 3238414
High-power ion and electron sources in cascade arrangement
- - 3315125
Ion source
- - 2934665
Production of thin film metallic patterns
- - 3133874
High output duoplasmatron-type ion source
- - 3238414
High-power ion and electron sources in cascade arrangement
- - 3315125
Inventors:
Chopra, Kasturi L.
Ronald, Randlett Myron
Ronald, Randlett Myron
Publication Date:
10/29/1968
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Export Citation:
Assignee:
KENNECOTT COPPER CORP
Primary Class:
Other Classes:
373/18, 422/186.300, 313/161, 313/231.010, 422/906, 250/426
International Classes:
C23C14/46; H01J27/10; H01J37/08; H01J37/305; H01J27/02
Foreign References:
| FR1372240A |