Title:
High current duoplasmatron having an apertured anode positioned in the low pressure region
United States Patent 3408283
Inventors:
Chopra, Kasturi L.
Ronald, Randlett Myron
Publication Date:
10/29/1968
Export Citation:
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Assignee:
KENNECOTT COPPER CORP
Primary Class:
204/298.04
Other Classes:
250/426, 313/161, 313/231.01, 373/18, 422/186.3, 422/906
International Classes:
C23C14/46; H01J27/10; H01J37/08; H01J37/305; C23C14/46; H01J27/02; H01J37/08; H01J37/305
View Patent Images:
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US Patent References:
3315125High-power ion and electron sources in cascade arrangement
3238414High output duoplasmatron-type ion source
3133874Production of thin film metallic patterns
2934665Ion source
Foreign References:
FR1372240A




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