Mixture of polyamide, polystyrene, and polyamide-styrene graft copolymer
United States Patent 3334153
US Patent References:
Graft polymerization of a vinyl monomer to a polymeric substrate by low temperature irradiation
- - 3088791
Blends of epsilon caprolactam polymer and graft copolymer alkenyl cyanide and alkenyl substituted aromatic hydrocarbon on polybutadiene
- - 3134746
Blends of (1) epsilon caprolactam, (2) rubbery butadiene-acrylonitrile copolymers, and (3) resinous styrene-acrylonitrile copolymers
- - 3218371
Method for rendering polymers compatible
- - 3236914
Mixture comprising polyamide and styrene acrylonitrile copolymer
- - 3243478
Graft polymerization of a vinyl monomer to a polymeric substrate by low temperature irradiation
- - 3088791
Blends of epsilon caprolactam polymer and graft copolymer alkenyl cyanide and alkenyl substituted aromatic hydrocarbon on polybutadiene
- - 3134746
Blends of (1) epsilon caprolactam, (2) rubbery butadiene-acrylonitrile copolymers, and (3) resinous styrene-acrylonitrile copolymers
- - 3218371
Method for rendering polymers compatible
- - 3236914
Mixture comprising polyamide and styrene acrylonitrile copolymer
- - 3243478
Inventors:
Osamu, Fukushima
Shigekazu, Onishi
Ryuichi, Otsubo
Hiroshi, Hayanami
Shigekazu, Onishi
Ryuichi, Otsubo
Hiroshi, Hayanami
Publication Date:
08/01/1967
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Export Citation:
Assignee:
KURASHIKI RAYON CO
Primary Class:
Other Classes:
528/312, 525/179, 528/323, 522/135, 525/70, 525/184, 525/426, 525/186, 525/181
International Classes:
C08F283/04; C08L25/06; C08L77/00; D01F6/20; D01F6/60; D01F6/90; D01F8/12; C08L51/08; C08F283/00; C08L25/00; D01F6/02; D01F6/88; C08L51/00
Foreign References:
| DE1131883B | ||||
| GB872515A | ||||
| GB899567A |