Title:

MANUFACTURING PROCESS OF INTEGRATED SEMICONDUCTOR LIGHT SENSOR DEVICE

Document Type and Number:

United States Patent Application 20020019070

Kind Code:

Abstract:

A process for manufacturing a light sensor device in a standard CMOS process, including at least the following phases: implanting active areas on a semiconductor substrate to obtain at least a first, a second and a third integrated region of corresponding photosensors; forming a stack of layers of different thickness and refractive index layers over the photosensors to provide an interferential filter to said photosensors. The stack is obtained by a deposition of a first oxide stack including a first, a second and a third oxide layer over at least one photosensor; moreover, this third oxide layer is obtained by a deposition step of an protecting undoped premetal dielectric layer.

Inventors:

Laurin, Enrico (LISSONE, IT)
Bordogna, Matteo (BELLUSCO, IT)
Bernardi, Oreste (SANGIORGIO PIACENTINO, IT)

Plaque It!

FIELD OF THE INVENTION

[0001] The present invention relates to an integrated semiconductor light sensor device and to a corresponding manufacturing process.

[0002] More specifically, the invention relates to a process for manufacturing a matrix of integrated color sensitive photosensors for color images, for instance for color images or a color television camera.

BACKGROUND OF THE INVENTION

[0003] Optical light sensors based on semiconductor properties are widely used for several video image applications.

[0004] Various techniques may be used for optical to electrical conversion. One of the most effective is based on electron-hole generation due to the light absorption of a semiconductor reverse-biased photodiode.

[0005] Since the final effect of the electron-hole generation doesn't represent the wavelength of the absorbed light in the optical range, this physical mechanism cannot distinguish different colors.

[0006] To implement color sensitivity a series of colored filters is generally provided between the light source and the photosensitive device.

[0007] This is usually implemented by a deposition, of an organic colored resin over the finished semiconductor photosensitive device. This resin stops by absorption all the unwanted colors of the incident light and transmits to the light sensor just the light wavelengths to be selected. In this manner the electric signal generated in the semiconductor device is correlated to the selected color only.

[0008] The photodiodes are integrated on silicon to form a bidimensional matrix. From the top view each diode looks squared with sides of about 5μ. Each diode is electrically insulated from the other adjacent diodes by an isolation region, for instance field oxide.

[0009] To clearly detect color images, the semiconductor matrix includes at least three different kind of staggered diodes, which are sensible to blue, green and red light respectively.

[0010] The main drawback of the photodiodes covered by the organic resin is due to the fact that the manufacturing process step for the resin deposition is a further process step and that the filter absorbs a portion of the incident light reducing the diode sensibility. Moreover, long exposure to intense light and high temperature may reduce the ability of the organic resins to stop the unwanted colors.

[0011] One solution for providing color selectivity is disclosed in European Patent No. 0152353, which relates to a method and device for obtaining a color selecting effect based on the wave properties of the light. This method may be implemented during the semiconductor device manufacturing process instead of on the finished sensor.

[0012] Very briefly, this method provides the deposition of a stack of inorganic layers over the light sensor device. These layers have suitable thicknesses and indexes of refraction.

[0013] By a suitable definition of the stack structure it is possible to obtain the desired spectral transmission of the incident light toward the semiconductor sensor device.

[0014] Modulating the interference of the light waves reflected at all the layers interfaces of the stack it is possible to maximize or minimize the light intensity transmitted or reflected by the whole stack in pre-determined wavelength ranges, that is colors.

[0015] The method disclosed in the above-cited European patent is based on the construction of an optical resonant semiconductor stack formed by the following layers: Monosilicon-Oxide-Polysilicon with the oxide thickness equal to L/2, where L is a given wavelength of the incident light.

[0016] The incident light is reflected by the interface monosilicon/oxide and interferes with the light reflected by the other interface oxide/polysilicon. Significant reflection of these interfaces takes place due to the high step of refraction index: N_oxide=1.45/N_silicon=4.

[0017] Just the waves having wavelength L, which is the double of the oxide thickness d, exhibit a constructive interference. For wavelengths different from L the phase shift L/2 gradually changes causing reflection to increase and transmission to decrease. The result is a transmission curve of the type “pass-band filter” centered at the wavelength L.

[0018] For instance, interferential L/2 resonators selecting transmission for Blue, Green and Red light must have the following thicknesses of silicon oxide (which is the L/2 layer) deposited directly on the active areas of a monosilicon layer hosting the photosensitive diodes: 1



Blue		1500 Å
Green		1900 Å
Red		2300 Å

[0019] Above the oxide layer a thin polysilicon layer (200 Å) is deposited. Then a further layer of silicon nitride (500 Å) is provided over the polysilicon.

[0020] Above the nitride layer a standard isolation and passivation oxide layers may be deposited according to the usual CMOS process.

[0021] The nitride layer is used to eliminate an additional unwanted interference of reflected light that would occur between the polysilicon and isolation oxide interface. The intermediate nitride refraction index (N_nitride=2) makes negligible the fraction of light intensity reflected at its interfaces.

[0022] In a standard CMOS process flow the deposition of the three stacks (L/2 Oxide-Polysilicon-Nitride) is performed after the source/drain implantation of the photodiode active area, just before the poly to metal dielectric deposition.

[0023] The deposition of the first oxide layer for the interferential filter requires specific process steps since various oxide layers having different thickness must be defined to assure a filtering effect according to a specific light wavelength. To form the oxide oxide layers selecting the three wanted colors, at least a first, a second and a third oxide deposition are required.

SUMMARY OF THE INVENTION

[0024] The present invention reduces the complexity of the process steps required to obtain the interferential filter.

[0025] The invention provides a third oxide layer having a thickness multiple of the L/2 value; so a layer having a thickness of L may also be obtained.

[0026] The invention also provides a simpler final etching step allowing the use of a single etching apparatus just for the polysilicon layer etching step.

[0027] The invention uses a protecting dielectric, for instance a premetal dielectric, as the third layer of the interferential filter.

[0028] The invention relates to a process for manufacturing a light sensor device in a standard CMOS process, including at least the following phases:

[0029] implanting active areas on a semiconductor substrate to obtain at least a first, a second and a third integrated region of corresponding photosensors;

[0030] forming a stack of layers having different thickness and refractive index over said photosensors to provide an interferential filter for said photosensors;

[0031] wherein:

[0032] said stack of layers having different thickness and refractive index is obtained by a deposition of a first oxide stack including at least a first, a second and a third oxide layer over at least one photosensor;

[0033] said third oxide layer being obtained by a deposition step of an protecting premetal dielectric layer.

[0034] The features and advantages of the invention will become apparent from the following description of an embodiment thereof, given by way of non-limiting example with reference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

[0035] FIG. 1 is a schematic view of a vertical cross section of a semiconductor portion including a light sensor device manufactured according to the invention.

[0036] FIG. 2 is a schematic view of an electric equivalent of the device shown in FIG. 1 .

[0037] FIG. 3 is a schematic view of a vertical cross section of a semiconductor portion at the beginning of the manufacturing process.

[0038] FIG. 4 is a schematic view of a vertical cross section of a semiconductor portion during a further process step of the manufacturing process of the invention.

[0039] FIG. 5 is a schematic view of a vertical cross section of a semiconductor portion including at least three photodiodes obtained with the manufacturing process according to the invention.

DETAILED DESCRIPTION OF THE INVENTION

[0040] With reference to the Figures, generally and schematically shown in FIG. 1 is a light sensor device 1 including an interferential colored filter 9 according to the present invention.

[0041] The process steps and the structures described herein below do not form a complete process flow for manufacturing integrated circuits. In fact, this invention can be practiced jointly with integrated circuit manufacturing techniques currently used in the art, and only those common process steps will be discussed herein as are necessary to an understanding of the invention.

[0042] The Figures which show cross-sections through a semiconductor wafer are not drawn to scale but rather to highlight major features of the invention.

[0043] The light sensor device 1 is substantially an integrated photodiode which is realized over a semiconductor substrate 2 region of a first conductivity type, for instance a P doped semiconductor region.

[0044] This semiconductor substrate 2 hosts other CMOS circuitry, which is realized according to a standard CMOS process flow.

[0045] The substrate 2 is formed by monocristalline silicon and will be disclosed hereinafter as a monosilicon substrate.

[0046] The photodiode 1 comprises a region having an N type dopant concentration, opposite to the substrate.

[0047] Over the region 1 there is a stack formed by a multilayer structure including a high refractive index dielectric layer, such as a silicon oxide layer 4 , a conductive layer 5 , for instance a polysilicon layer, possibly conductive, and a further semiconductor layer 6 formed by a silicon nitride layer.

[0048] The stack, including the layers 4 , 5 and 6 above monosilicon 1 , has different thickness and refractive index and represents the interferential filter 9 .

[0049] The monosilicon and polysilicon layers 1 , 5 have a high refraction index, about 4 , while the silicon oxide layer 4 and the silicon nitride layer 6 have a low refraction index, about 1.5-2.0.

[0050] As known from EP 0152353, the thickness of the various layers must be defined to assure an anti-reflection effect and a filtering effect according to a specific light wavelength.

[0051] For instance, if the thickness of the layers 5 and 6 is 20 and 50 nm respectively, then the stack forms a filter for the Blue color if the thickness of the oxide layer 4 is chosen of about 150 nm.

[0052] A filter for the Green color may be formed choosing an oxide layer thickness of 190 nm, while a Red color filter may be formed with an oxide layer having a thickness of 230 nm.

[0053] A preferred embodiment of the invention provides for a P+ contact region 8 to allow an electric contact between the polysilicon layer 5 and the substrate 2 .

[0054] The equivalent circuit shown in FIG. 2 allows to identify the photodiode D cathode region 1 which is represented by a circuit node K. The photodiode anode is connected to a circuit node A connected to a ground reference potential; that is to the substrate potential.

[0055] If conductive polysilicon is used as layer 5 , a capacitor C may be connected in parallel to the photodiode D. A first plate of this capacitor C is the polysilicon layer 5 connected to the substrate, while a second plate of the capacitor corresponds to the cathode region 1 .

[0056] The presence of the capacitor C improves the photodiode charge storage capability.

[0057] With specific reference to the examples of the FIGS. from 3 to 5 , the process according to the present invention is now disclosed.

[0058] FIG. 3 shows a monosilicon semiconductor portion 2 comprising three different diode cathode regions 1 R, 1 G, 1 B, respectively. These regions will be sensible to Red, Green and Blue colors respectively.

[0059] These regions 1 R, 1 G, 1 B are defined by a photolithograffic process step that provided for a resist deposition and etching steps followed by a Source/Drain implantation of the diodes active areas uncovered by dielectric, as in a standard CMOS process.

[0060] According to the inventive process, silicon oxide layers having different thickness are deposited over these three regions 1 R, 1 G, 1 B.

[0061] A first process step shown in FIG. 3 provides for the deposition of a first oxide layer 4 - 1 just over the first cathode region 1 R.

[0062] More specifically, a blanket oxide deposition is performed over the substrate 2 surface. Then a mask is provided to protect the area of the cathode region 1 R where the Red photosensor must be formed. A subsequent oxide etching and resist mask removal clears the area out from region 1 R.

[0063] The oxide thickness is preferably of 400 Å (40nm).

[0064] A further process step is then performed to cover with a second oxide layer 4 - 2 the second cathode region 1 G and the first oxide layer 4 - 1 , as clearly shown in FIG. 4 ,

[0065] Again, a 400 Å (40 nm) blanket oxide deposition is performed over the semiconductor. A mask is provided to protect the area of the cathode regions 1 R and 1 G where the Red and the Green photosensors must be formed. A subsequent oxide etching and resist mask removal clears the area out from regions 1 R and 1 G.

[0066] The process proceeds with a further oxide deposition step to cover with a third oxide layer 4 - 3 the whole semiconductor portion shown in FIG. 5 .

[0067] Advantageously, this further oxide layer 4 - 3 is a protecting (undoped) dielectric layer, for instance a USG type layer, which is normally used as a premetal dielectric over a polysilicon layer. In standard CMOS processes the premetal dielectric (which is the insulator deposited before metal interconnections) is generally a stack of a first protecting dielectric, undoped and not planarizing, followed by a second planarizing dielectric (usually eloped).

[0068] This third oxide layer has a thickness of 1500 Å (150 nm) and is not etched between two adjacent photosensors. This allows obtaining a better planarized structure even if the USG oxide is a conformal layer.

[0069] Moreover, the thickness of this third oxide layer may be regulated according to the needs to bring the total thickness of the oxide stacks to a value multiple of the L/2. For instance, it's possible to obtain a layer thickness of nL/2, where n may be an integer ≧2.

[0070] Therefore, over the region 1 R the oxide thickness is 230 nm; over the region 1 G the oxide thickness is 190 nm; and over the region 1 B the oxide thickness is just 150 nm.

[0071] Then a thin polysilicon layer 5 is deposited over the third oxide layer 4 - 3 . Preferably, the thickness of this polysilicon layer is about 200 Å.

[0072] The process proceeds with a further deposition step of an optional silicon nitride layer 6 .

[0073] A 500 Å nitride blanket deposition is performed over the polysilicon layer 5 . Then a photoresist mask is provided to protect the Red, Green and Blue sensors regions 1 R, 1 G and 1 B.

[0074] An etching step is performed to remove the nitride layer 6 and the poly layer 5 out of the regions 1 R, 1 G and 1 B. Then the photoresist mask is removed too.

[0075] The third USG oxide layer 4 - 3 is not etched thus avoiding a possible overetch and related field oxide consumption with a possible active areas widening on the CMOS circuitry and the consequent reduction of the insulating capability of the field oxide.

[0076] At this point the three L/2 stacks are defined over the diode sensors while the active areas of other CMOS circuitry integrated on the same semiconductor substrate 2 remain already covered by the protecting (undoped) dielectric layer 4 - 3 which is not removed by the last etching step.

[0077] A final process step is then performed to provide a metal dielectric deposition of a BPSG planarizing layer to provide the second planarizing dielectric layer.

[0078] The process according to the present invention allows a reduction of a process step it compared with the current prior art solutions. The main advantage of the inventive process is given by the use of the protecting (undoped) premetal dielectric layer as the third layer of the interferential filter.

[0079] This also means that the final etching step is simpler since a single etching apparatus is needed just for the silicon nitride and the polysilicon layer etching step.

[0080] A further advantage is given by the possibility offered by the invention to realize a third oxide layer having a thickness multiple of the L/2 value; so a layer having a thickness of L may also be obtained.

[0081] A further advantage is given by the fact that the threshold of some parasitic component is increased thereby reducing their influence on the photosensor operation.

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